Organosilane precursors for ALD/CVD silicon-containing film applications
First Claim
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1. A Si-containing thin film forming precursor having the following formula:
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Abstract
Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.
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15 Claims
- 1. A Si-containing thin film forming precursor having the following formula:
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