Damping arrangement for dissipating oscillating energy of an element in a system, more particularly in a microlithographic projection exposure apparatus

• US 9,593,733 B2
• Filed: 12/30/2013
• Issued: 03/14/2017
• Est. Priority Date: 08/03/2011
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Hauf, Markus
• Primary Examiner(s): SICONOLFI, ROBERT
• Assistant Examiner(s): Rashid, Mahbubur
• Application Number:
  US14/144,101
• Publication Number:
  US 20140202812A1
• Time in Patent Office: 1,170 Days
• Field of Search: 188/267, 188/378, 188/380
• US Class Current: 1/1
• CPC Class Codes: F16F 7/1011 by electromagnetic means
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

The invention relates to a damping arrangement for dissipating oscillation energy of an element in a system, more particularly in a microlithographic projection exposure apparatus, comprising an absorber mass, which is mounted via a stable mounting with respect to the element, wherein the absorber mass is arranged in a cavity present within the element and is at least partly surrounded by a fluid situated in the cavity, wherein a mass-spring system is formed by the absorber mass, the system damping a translational movement component of an oscillation of the element that exists at the linking point of the absorber mass, and wherein the stable mounting is formed by a rheological fluid that is electrically controllable or controllable via electric or magnetic fields.

Claims

1. An arrangement, comprising:

a mirror having a cavity;

a rheological fluid in the cavity of the mirror; and

an absorber mass in the cavity of the mirror,

wherein;

the absorber mass is at least partly surrounded by the rheological fluid so that the absorber mass and the rheological fluid define a mass-spring system that is configured to dampen a translational movement component of an oscillation of the mirror that exists at a linking point of the absorber mass; and

the arrangement is configured to be used in a microlithographic projection exposure apparatus.

2. The arrangement of claim 1, wherein a resonant frequency of the mass-spring system differs by a maximum of one frequency decade from a resonant frequency of the mirror.

3. The arrangement of claim 1, wherein a resonant frequency of the mass-spring system differs by a maximum of a half frequency decade from a resonant frequency of the mirror.

4. The arrangement of claim 1, wherein the rheological fluid comprises a ferrofluid.

5. The arrangement of claim 4, wherein the ferrofluid stably mounts the absorber mass to the mirror.

6. The arrangement of claim 1, wherein the absorber mass is a magnet, and the absorber mass is movably suspended within the cavity of the mirror.

7. The arrangement of claim 1, further comprising a magnet.

8. The arrangement of claim 7, wherein the magnet is fixedly linked to the mirror.

9. The arrangement of claim 8, wherein the absorber mass comprises a nonmagnetic material.

10. The arrangement of claim 1, wherein the stable mounting of the absorber mass has a resonant frequency corresponding to a resonant frequency of the mirror.

11. The arrangement of claim 1, wherein the stable mounting comprises two separate bearings configured to elastically suspend the mirror in different degrees of freedom.

12. The arrangement of claim 11, wherein, for at least two different degrees of freedom, the mass-spring system has different resonant frequencies of damping and/or different degrees of damping.

13. The arrangement of claim 12, wherein a first bearing is configured to act in an axial direction relative to an axis of the mirror, and second bearing is configured to act in a radial direction relative to the axis of the mirror.

14. The arrangement of claim 1, wherein the rheological fluid comprises an electrically controllable rheological fluid.

15. The arrangement of claim 1, wherein the rheological fluid comprises a rheological fluid that is controllable by an electric field.

16. The arrangement of claim 1, wherein the rheological fluid comprises a rheological fluid that is controllable by a magnetic field.

17. The arrangement of claim 1, wherein the rheological fluid is completely contained within the cavity of the mirror, and the absorber mass is completely contained within the cavity in the mirror.

18. The arrangement of claim 1, further comprising a carrying structure configured so that the mirror and carrying structure define a second spring-mass system.

19. The arrangement of claim 1, wherein the mass-spring system is completely confined within the cavity of the mirror.

20. An apparatus, comprising:

an arrangement, comprising;

mirror having a cavity;

a rheological fluid that is in the cavity of the mirror; and

an absorber mass stably in the cavity of the mirror,

wherein;

the absorber mass is at least partly surrounded by the rheological fluid so that the absorber mass and the rheological fluid define a mass-spring system that is configured to dampen a translational movement component of an oscillation of the mirror that exists at a linking point of the absorber mass; and

the apparatus is a microlithographic projection exposure apparatus.

21. The apparatus of claim 20, wherein the arrangement comprises a magnet.

22. The apparatus of claim 20, wherein the projection exposure apparatus is designed for operation at an operating wavelength of less than 200 nm.

23. The apparatus of claim 20, wherein the projection exposure apparatus is designed for operation at an operating wavelength of less than 15 nm.