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Antenna, dielectric window, plasma processing apparatus and plasma processing method

  • US 9,595,425 B2
  • Filed: 07/05/2012
  • Issued: 03/14/2017
  • Est. Priority Date: 07/06/2011
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus comprising:

  • an antenna including a dielectric window and a slot plate which has a plurality of slots;

    a central inlet unit having a central inlet opening positioned at a central portion of the dielectric window and above a central portion of a processing target substrate, the central inlet unit being configured to introduce a first processing gas into a plasma exciting region directly under the dielectric window;

    a peripheral inlet unit arranged along a circumferential direction of a plasma diffusing region under the plasma exciting region and directly above the processing target substrate, the peripheral inlet unit being configured to introduce a second processing gas into the plasma diffusing region;

    a processing chamber for accommodating the antenna therein;

    a table, provided within the processing chamber so as to face a bottom surface of the dielectric window, for mounting the processing target substrate thereon;

    a microwave inlet path that connects a microwave generator with the slot plate,wherein the slot plate is provided on a top surface of the dielectric window, the dielectric window and the slot plate have circular plate shapes, and centers of the dielectric window and the slot plate have a same axis,wherein the dielectric window comprises;

    a ring shaped first recess formed on the bottom surface of the dielectric window and having a tapered shape inwardly in a plate thickness direction of the dielectric window, anda plurality of second recesses formed on a flat surface surrounded by the ring shaped first recess and having circular shapes at a regular interval in a circumferential direction thereof, andwherein a diameter of each second recess and a distance from a bottom surface of each second recess to the top surface of the dielectric window are set to be about ¼

    of a wavelength of a microwave introduced to the dielectric window,when viewed from a thickness direction of the slot plate, a center of each second recess is matched with a center of a corresponding slot of the slot plate, andwherein the first processing gas includes a plasma excitation gas, and the second processing gas includes the plasma excitation gas and an etching gas,wherein the central inlet unit includes a first through hole formed in the dielectric window and an injector having a plurality of second through holes, and the injector is formed as a single body with the dielectric window, andwherein the plurality of second through holes of the injector communicate with the first through hole formed in the dielectric window,an electric field shield member enclosing the injector and disposed completely inside the dielectric window, wherein the electric field shield member is extended downwardly to a position that is closer to a processing space than a bottom surface of the injector; and

    a pipeline member being positioned above the injector and connected to an upper portion of the electric field shield member.

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