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Direct metalization of electrical circuit structures

  • US 9,603,249 B2
  • Filed: 09/06/2012
  • Issued: 03/21/2017
  • Est. Priority Date: 06/02/2009
  • Status: Active Grant
First Claim
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1. A method of making an electrical interconnect comprising the steps of:

  • providing a first circuitry layer comprising a first surface and a second surface;

    printing at least a first dielectric layer on the first surface of the first circuitry layer to include a plurality of first recesses;

    depositing a conductive material on surfaces of a plurality of the first recesses comprising a plurality of first conductive structures electrically coupled to, and extending perpendicular to, the first circuitry layer;

    printing a filler material in the first conductive structures;

    printing at least a second dielectric layer on the first dielectric layer to include a plurality of second recesses at least partially aligned with a plurality of the first conductive structures;

    depositing a conductive material on surfaces of a plurality of the second recesses comprising a plurality of second conductive structures electrically coupled to, and extending parallel to the first conductive structures; and

    printing a dielectric material in one or more of the first and second recesses to surround one or more of the first and second conductive structures.

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