Plasma modified medical devices and methods
First Claim
1. A method of making a medical device adapted for implantation into a human or animal host wherein the medical device comprises at least one contacting surface for contacting a bodily fluid or tissue, the method comprising:
- (a) depositing a plasma coating of less than 100 nm thickness on the at least one contacting surface using a silicon-containing monomer selected from trimethylsilane (TMS), vinyltrichlorosilane, tetraethoxysilane, vinyltriethoxysilane, hexamethyldisilazane, tetramethylsilane, vinyldimethylethoxysilane, vinyltrimethoxysilane, tetravinylsilane, vinyltriacetoxysilane, or methyltrimethoxysilane to produce a plasma surface; and
(b) covalently bonding nitric oxide functional groups to the plasma surface using a plasma comprising a mixture of ammonia and oxygen.
0 Assignments
0 Petitions
Accused Products
Abstract
Coatings, devices and methods are provided, wherein the contacting surface of a medical device with at least one contacting surface for contacting a bodily fluid or tissue, wherein long-lasting and durable bioactive agents or functional groups are deposited on the contacting surface through a unique two-step plasma coating process with deposition of a thin layer of plasma coating using a silicon-containing monomer in the first step and plasma surface modification using a mixture of nitrogen-containing molecules and oxygen-containing molecules in the second step. The two-step plasma coating process enables the implantable medical device to prevent both restenosis and thrombosis under clinical conditions. The invention also relates to surface treatment of metallic and polymeric biomaterials used for making of medical devices with significantly improved clinical performance and durability.
-
Citations
12 Claims
-
1. A method of making a medical device adapted for implantation into a human or animal host wherein the medical device comprises at least one contacting surface for contacting a bodily fluid or tissue, the method comprising:
-
(a) depositing a plasma coating of less than 100 nm thickness on the at least one contacting surface using a silicon-containing monomer selected from trimethylsilane (TMS), vinyltrichlorosilane, tetraethoxysilane, vinyltriethoxysilane, hexamethyldisilazane, tetramethylsilane, vinyldimethylethoxysilane, vinyltrimethoxysilane, tetravinylsilane, vinyltriacetoxysilane, or methyltrimethoxysilane to produce a plasma surface; and (b) covalently bonding nitric oxide functional groups to the plasma surface using a plasma comprising a mixture of ammonia and oxygen. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
-
Specification