Film bulk acoustic wave resonator (FBAR) having stress-relief

• US 9,608,592 B2
• Filed: 01/21/2014
• Issued: 03/28/2017
• Est. Priority Date: 01/21/2014
• Status: Active Grant

• Current Assignee: Avago Technologies International Sales Pte Limited (Broadcom, Inc.)
• Original Assignee: Avago Technologies General IP PTE Limited (Broadcom, Inc.)
• Inventors: Bi, Frank, Small, Martha K., Sridaran, Suresh, Ruby, Richard C.
• Primary Examiner(s): Dougherty, Thomas
• Application Number:
  US14/159,518
• Publication Number:
  US 20150207489A1
• Time in Patent Office: 1,162 Days
• Field of Search: 310311-371, 333186-193
• US Class Current: 1/1
• CPC Class Codes: H03H 9/132 characterized by a particular shape
• CPC Class Codes: H03H 9/171 implemented with thin-film techniques, i.e. of the film bulk acoustic resonator [FBAR] type
• CPC Class Codes: H03H 9/173 Air-gaps
• CPC Class Codes: H03H 9/54 comprising resonators of piezoelectric or electrostrictive material H03H9/64 takes precedence

Abstract

An acoustic resonator structure comprises: a substrate having a cavity, which has a plurality of sides; a first electrode disposed over the cavity; a piezoelectric layer disposed over a portion of the first electrode and extending over at least one of the sides; and a second electrode disposed over the piezoelectric layer, an overlap of the first electrode, the piezoelectric layer and the second electrode forming an active area of the FBAR. The active area of the FBAR is completely suspended over the cavity.

Claims

1. A film bulk acoustic resonator (FBAR) structure, comprising:

a substrate comprising a cavity having a plurality of sides;

a first electrode disposed over the cavity, the first electrode extending over at least one but not all of the plurality of sides of the cavity;

a piezoelectric layer disposed over at least a portion of the first electrode, and extending over the at least one of the sides having the first electrode extending thereover;

a second electrode disposed over the piezoelectric layer, a contacting overlap of the first electrode, the piezoelectric layer and the second electrode forming an active area of the FBAR; and

a bridge connecting the second electrode to one of the sides, wherein a space exists beneath the bridge.

2. The FBAR structure of claim 1, wherein the active area is suspended over the cavity and does not extend over any of the sides.

3. The FBAR structure of claim 1, wherein the second electrode extends over only one of the sides.

4. The FBAR structure of claim 3, wherein the first electrode does not extend over the only one of the sides.

5. The FBAR structure of claim 1, wherein the space is filled with a non-etchable borosilicate glass (NEBSG).

6. The FBAR structure of claim 1, wherein the space is filled with air.

7. The FBAR structure of claim 1, wherein the piezoelectric layer and the first electrode each extend over the at least one side.

8. The FBAR structure of claim 7, wherein the piezoelectric layer and the first electrode each extend over a second side.

9. The FBAR structure of claim 1, wherein the piezoelectric layer extends over an edge of the first electrode.

10. The FBAR structure of claim 1, wherein the second electrode comprises a first surface disposed substantially at a first height, and the bridge comprises a second surface disposed substantially at a second height, which is higher than the first height.

13. The FBAR structure of claim 9, further comprising a first bridge and a second bridge disposed in tandem with one another, and connecting the second electrode to one of the sides.

15. The FBAR structure of claim 13, wherein the second electrode comprises a first surface disposed substantially at a first height, the first bridge comprises a second surface disposed substantially at a second height, which is higher than the first height, and the second bridge comprises a third surface at a third height, which is higher than the first height.

11. A film bulk acoustic resonator (FBAR) structure, comprising:

a substrate comprising a cavity having a plurality of sides, the plurality of sides providing a perimeter of the cavity;

a first electrode disposed over the cavity;

a piezoelectric layer disposed over a portion of the first electrode and extending over one of the sides;

a second electrode disposed over the piezoelectric layer, a contacting overlap of the first electrode, the piezoelectric layer and the second electrode forming an active area of the FBAR, wherein the active area of the FBAR is completely suspended over the cavity; and

a region where a gap exists between an end of the active area and a portion of the perimeter of the cavity.

12. The FBAR structure of claim 11, further comprising a bridge connecting the second electrode to one of the sides.

14. The FBAR structure of claim 12, wherein the second electrode comprises a first surface disposed substantially at a first height, and the bridge comprises a second surface disposed substantially at a second height, which is higher than the first height.

16. The FBAR structure of claim 11, wherein the first electrode extends over only two of the sides.

17. The FBAR structure of claim 16, wherein the piezoelectric layer extends over one of the two sides.

18. The FBAR structure of claim 16, wherein the piezoelectric layer extends over the two sides.

19. The FBAR structure of claim 11, wherein the first electrode is not disposed over each one of the plurality of sides.

20. The FBAR structure of claim 11, wherein the piezoelectric layer extends over an edge of the first electrode.

21. A film bulk acoustic resonator (FBAR) structure, comprising:

a substrate comprising a cavity having a plurality of sides;

a first electrode disposed over the cavity;

a piezoelectric layer disposed over a portion of the first electrode, the piezoelectric layer extending over an edge of the first electrode, and over at least one of the sides;

a second electrode disposed over the piezoelectric layer, a contacting overlap of the first electrode, the piezoelectric layer and the second electrode forming an active area of the FBAR, wherein the active area of the FBAR is completely suspended over the cavity; and

a bridge connecting the second electrode to one of the sides, wherein a space exists beneath the bridge.

22. The FBAR structure of claim 21, wherein the space is filled with a non-etchable borosilicate glass (NEBSG).

23. The FBAR structure of claim 21, wherein the space is filled with air.

24. The FBAR structure of claim 21, wherein the first electrode extends over only two of the sides.

25. The FBAR structure of claim 24, wherein the piezoelectric layer extends over one of the two sides.

26. The FBAR structure of claim 24, wherein the piezoelectric layer extends over the two sides.

27. The FBAR structure of claim 21, wherein the piezoelectric layer is disposed over only one of the plurality of sides.

28. The FBAR structure of claim 21, wherein the first electrode is not disposed over each one of the plurality of sides.

29. The FBAR structure of claim 21, wherein the piezoelectric layer extends over an edge of the first electrode.

30. The FBAR structure of claim 21, wherein the second electrode comprises a first surface disposed substantially at a first height, and the bridge comprises a second surface disposed substantially at a second height, which is higher than the first height.

31. A film bulk acoustic resonator (FBAR) structure, comprising:

a substrate comprising a cavity having a plurality of sides;

a first electrode disposed over the cavity;

a piezoelectric layer disposed over a portion of the first electrode and extending over at least one of the sides;

a second electrode disposed over the piezoelectric layer, a contacting overlap of the first electrode, the piezoelectric layer and the second electrode forming an active area of the FBAR, wherein the active area of the FBAR is completely suspended over the cavity; and

a first bridge and a second bridge disposed in tandem with one another, and connecting the second electrode to one of the sides.

32. The FBAR structure of claim 31, wherein the first electrode extends over only two of the sides.

33. The FBAR structure of claim 32, wherein the piezoelectric layer extends over one of the two sides.

34. The FBAR structure of claim 32, wherein the piezoelectric layer extends over the two sides.

35. The FBAR structure of claim 31, wherein the first electrode is not disposed over each one of the plurality of sides.

36. The FBAR structure of claim 31, wherein the piezoelectric layer is disposed over only one of the plurality of sides.

37. The FBAR structure of claim 31, wherein the piezoelectric layer extends over an edge of the first electrode.

38. The FBAR structure of claim 31, wherein the second electrode comprises a first surface disposed substantially at a first height, the first bridge comprises a second surface disposed substantially at a second height, which is higher than the first height, and the second bridge comprises a third surface at a third height, which is higher than the first height.