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Adjustment of VUV emission of a plasma via collisional resonant energy transfer to an energy absorber gas

  • US 9,609,730 B2
  • Filed: 11/12/2014
  • Issued: 03/28/2017
  • Est. Priority Date: 11/12/2014
  • Status: Active Grant
First Claim
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1. A method of adjusting the emission of vacuum ultraviolet (VUV) radiation from a plasma in a semiconductor processing chamber, the method comprising:

  • generating a plasma in the processing chamber, the plasma comprising a VUV-emitter gas comprising He and a collisional energy absorber gas comprising Ne, the plasma emitting VUV radiation; and

    adjusting the emission of VUV radiation from the plasma by altering the concentration ratio of the VUV-emitter gas to collisional energy absorber gas in the plasma.

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