Plating method and plating apparatus
First Claim
1. A method of plating a substrate while holding the substrate by a substrate holder having a first holding member and a second holding member which has an opening, said method comprising:
- holding the substrate with the substrate holder by supporting one surface of the substrate with the first holding member while placing the second holding member in contact with other surface of the substrate, with the other surface of the substrate exposed through the opening of the second holding member;
sealing a gap between the first holding member and the second holding member by a first protruding portion of the second holding member while sealing a peripheral portion of the substrate by a second protruding portion of the second holding member when the substrate is held by the substrate holder, thereby forming an internal space in the substrate holder by the first holding member, the second holding member, and the substrate;
covering with a seal case the other surface of the substrate exposed through the opening;
sealing a gap between the first holding member and the seal case to form a hermetic space between the substrate holder and the seal case; and
performing a leakage test by supplying a tracer gas into the hermetic space while evacuating air from the internal space and checking whether the air evacuated from the internal space contains the tracer gas.
1 Assignment
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Accused Products
Abstract
A plating method includes holding a substrate with a substrate holder while bringing a sealing member into pressure contact with a peripheral portion of the substrate to form an enclosed internal space in the substrate holder; performing a first-stage leakage test of the substrate holder by producing a vacuum in the internal space and checking whether pressure in the internal space reaches a predetermined vacuum pressure within a certain period of time; and if the substrate holder has passed the first-stage leakage test, performing a second-stage leakage test of the substrate holder by closing off the internal space after producing the vacuum therein and checking whether a change in the pressure in the internal space reaches a predetermined value within a certain period of time.
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Citations
7 Claims
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1. A method of plating a substrate while holding the substrate by a substrate holder having a first holding member and a second holding member which has an opening, said method comprising:
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holding the substrate with the substrate holder by supporting one surface of the substrate with the first holding member while placing the second holding member in contact with other surface of the substrate, with the other surface of the substrate exposed through the opening of the second holding member; sealing a gap between the first holding member and the second holding member by a first protruding portion of the second holding member while sealing a peripheral portion of the substrate by a second protruding portion of the second holding member when the substrate is held by the substrate holder, thereby forming an internal space in the substrate holder by the first holding member, the second holding member, and the substrate; covering with a seal case the other surface of the substrate exposed through the opening; sealing a gap between the first holding member and the seal case to form a hermetic space between the substrate holder and the seal case; and performing a leakage test by supplying a tracer gas into the hermetic space while evacuating air from the internal space and checking whether the air evacuated from the internal space contains the tracer gas. - View Dependent Claims (2, 3)
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4. An apparatus for plating a substrate, comprising:
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a substrate holder including a first holding member and a second holding member which has an opening, the substrate holder being configured to hold a substrate by supporting one surface of the substrate with the first holding member while placing the second holding member in contact with other surface of the substrate, with the other surface of the substrate exposed through the opening of the second holding member, the second holding member having a first protruding portion configured to seal a gap between the first holding member and the second holding member and a second protruding portion configured to seal a peripheral portion of the substrate when the substrate is held by the substrate holder to form an internal space in the substrate holder by the first holding member, the second holding member, and the substrate, the substrate holder having an internal passage communicating with the internal space; a suction coupling coupled to a suction line extending from a vacuum source and detachably mounted to the substrate holder so as to communicate with the internal passage; a pressure sensor configured to check whether pressure in the internal space reaches a predetermined vacuum pressure within a certain period of time when producing a vacuum in the internal space through the suction line; a pressure change detection section configured to detect a change in the pressure in the internal space after the vacuum is produced in the internal space and the internal space is closed off; a seal case capable of covering the other surface of the substrate exposed through the opening of the second holding member; a tracer gas sealing member configured to seal a gap between the first holding member and the seal case to form a hermetic space between the substrate holder and the seal case; a tracer gas introduction device configured to introduce a tracer gas into the hermetic space; and a tracer gas tester configured to detect whether the tracer gas is contained in a gas flowing through the suction line. - View Dependent Claims (5, 6, 7)
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Specification