Uses of electromagnetic interference patterns

• US 9,618,369 B2
• Filed: 08/25/2009
• Issued: 04/11/2017
• Est. Priority Date: 08/26/2008
• Status: Active Grant

• Current Assignee: University Court of the University of Glasgow (University of Glasgow)
• Original Assignee: University Court of the University of Glasgow (University of Glasgow)
• Inventors: Weaver, Jonathan Mark Ralph, Dobson, Phillip Stephen, Burt, David Paul, Thoms, Stephen, Docherty, Kevin Edward, Zhang, Yuan
• Primary Examiner(s): Geisel, Kara E
• Assistant Examiner(s): PHILLIPS, RUFUS L
• Application Number:
  US13/060,033
• Publication Number:
  US 20110157599A1
• Time in Patent Office: 2,786 Days
• Field of Search: 356454, 356484, 356502
• CPC Class Codes: G01D 11/00 Component parts of measuring arrangements not specially adapted for a specific variable G01D13/00, G01D15/00 take precedence
• CPC Class Codes: G01D 5/266 by interferometric means G01D5/353 takes precedence
• CPC Class Codes: G01D 5/38 by diffraction gratings
• CPC Class Codes: G01J 2009/0234 Measurement of the fringe pattern
• CPC Class Codes: G01J 9/0246 Measuring optical wavelength
• CPC Class Codes: G01N 21/45 using interferometric methods; using Schlieren methods
• CPC Class Codes: G03H 1/0005 Adaptation of holography to specific applications holographic optical element G02B5/32; holographic scanner G02B26/106; recognition using holographic mask G06V10/88; holographic memories G11B7/0065, G11C13/042

Abstract

Various uses of visible light interference patterns are provided. Suitable interference patterns are those formed by diffraction from patterns of apertures. Typical uses disclosed herein relate to spatial metrology, such as a translational and/or angular position determination system. Further uses include the analysis of properties of the light itself (such as the determination of the wavelength of the electromagnetic radiation). Still further uses include the analysis of one or more properties (e.g. refractive index) of the matter through which the light passes. Part of the interference pattern is captured at a pixellated detector, such as a CCD chip, and the captured pattern compared with a calculated pattern. Very precise measurements of the spacing between maxima is possible, thus allowing very precise measurements of position of the detector in the interference pattern.

Claims

1. A measurement system comprising:

an electromagnetic radiation diffraction pattern generator for generating a diffraction pattern including intensity maxima and intensity minima, wherein the diffraction pattern generator includes an arrangement of light-transmitting apertures for the transmission and diffraction of light to generate the diffraction pattern; and

an electromagnetic radiation detector, operable to detect at least a part of the diffraction pattern produced by said generator, the detector having an array of detection elements arranged to detect a location of each of a plurality of the intensity maxima and/or intensity minima of the diffraction pattern substantially simultaneously;

wherein the electromagnetic radiation diffraction pattern generator comprises a laser attached to a pinhole array;

wherein the arrangement of light-transmitting apertures comprises five pinholes arranged on the vertices of a regular pentagon or a ring of nineteen pinholes;

wherein the detected locations of the plurality of the intensity maxima and/or intensity minima are substantially translationally aperiodic;

wherein the diffraction pattern is a two dimensional diffraction pattern;

wherein the detection elements are arranged in a two dimensional array at the detector;

wherein the maxima of the diffraction pattern are spaced apart at a pitch equal to at least twice the pitch of the detection elements;

wherein the detector intercepts at least 10 maxima and/or minima in a single detection event;

wherein the detector has at least 10,000 pixels; and

wherein the system is capable of determining a physical property of the system, or a change in a physical property of the system, based on the detected locations of the plurality of the intensity maxima and/or intensity minima.

2. The measurement system according to claim 1, further comprising an object whose position is to be measured, wherein the object whose position is to be measured is the physical property to be determined by the system.

3. The measurement system according to claim 2 wherein the object whose position is to be determined has a fixed spatial relationship with either:

(i) the electromagnetic radiation diffraction pattern generator, or

(ii) the electromagnetic radiation detector.

4. The measurement system according to claim 3 wherein in use, movement of the object from a first to a second position causes a change of the diffraction pattern captured at the detector, and

wherein the object is movable by:

(i) a movement corresponding to translation along at least one of three orthogonal translational axes;

or

(ii) a movement corresponding to rotation about at least one of three orthogonal rotational axes,

said movement of the object, or any combination of said movements providing a variation in the diffraction pattern or the part of the diffraction pattern detected by the detector.

5. The measurement system according to claim 1, wherein the diffraction pattern generator comprises a light source, the electromagnetic radiation provided by the diffraction pattern generator being spatially coherent.

6. The measurement system according to claim 1, wherein the system further comprises a second detector, the second detector being for detecting a different part of the diffraction pattern than the first detector.

7. The measurement system according to claim 6 wherein the first detector and the second detector are parts of a single main detector.

8. The measurement system according to claim 1, wherein the system further comprises a second electromagnetic radiation detector, the first and second detectors each being operable to detect a respective part of the diffraction pattern produced by said generator, and wherein the refractive index of the respective optical paths between the generator and the first and second detectors is deliberately made to be different by a known amount, the patterns detected by the first and second detectors being usable to determine the wavelength of the electromagnetic radiation.

9. The measurement system according to claim 1, further comprising path modification means to provide at least two different path lengths for the electromagnetic radiation from the generator to the detector, so as to provide at least two diffraction patterns at the detector, corresponding to the at least two different path lengths.

10. The measurement system according to claim 9, wherein the path modification means provides a difference in reflection of the electromagnetic radiation along the respective path lengths.

11. The measurement system according to claim 10 wherein an etalon is provided between the generator and the detector, the different path length being provided in use by different numbers of transits of the electromagnetic radiation across the etalon before reaching the detector.

12. A position determination apparatus comprising a measurement system comprising:

an electromagnetic radiation diffraction pattern generator for generating an diffraction pattern including intensity maxima and intensity minima, wherein the diffraction pattern generator includes an arrangement of light-transmitting apertures for the transmission and diffraction of light to generate the diffraction pattern; and

an electromagnetic radiation detector, operable to detect at least a part of the diffraction pattern produced by said generator, the detector having an array of detection elements arranged to detect a location of each of a plurality of the intensity maxima and/or intensity minima of the diffraction pattern substantially simultaneously;

wherein the electromagnetic radiation diffraction pattern generator comprises a laser attached to a pinhole array;

wherein the arrangement of light-transmitting apertures comprises five pinholes arranged on the vertices of a regular pentagon or a ring of nineteen pinholes;

wherein the detected locations of the plurality of the intensity maxima and/or intensity minima are substantially translationally aperiodic diffraction pattern;

wherein the diffraction pattern is a two dimensional diffraction pattern;

wherein the detection elements are arranged in a two dimensional array at the detector;

wherein the maxima of the diffraction pattern are spaced apart at a pitch equal to at least twice the pitch of the detection elements;

wherein the detector intercepts at least 10 maxima and/or minima in a single detection event;

wherein the detector has at least 10,000 pixels; and

wherein and the system is capable of determining a physical property of the system, or a change in a physical property of the system, based on the detected locations of the plurality of the intensity maxima and/or intensity minima.

13. A wavelength determination apparatus comprising a measurement system comprising:

an electromagnetic radiation diffraction pattern generator for generating an diffraction pattern including intensity maxima and intensity minima, wherein the diffraction pattern generator includes an arrangement of light-transmitting apertures for the transmission and diffraction of light to generate the diffraction pattern; and

an electromagnetic radiation detector, operable to detect at least a part of the diffraction pattern produced by said generator, the detector having an array of detection elements arranged to detect a location of a plurality of the intensity maxima and/or intensity minima of the diffraction pattern substantially simultaneously,

wherein the electromagnetic radiation diffraction pattern generator comprises a laser attached to a pinhole array;

wherein the arrangement of light-transmitting apertures comprises five pinholes arranged on the vertices of a regular pentagon or a ring of nineteen pinholes;

wherein the detected locations of the plurality of the intensity maxima and/or intensity minima are substantially translationally aperiodic;

wherein the diffraction pattern is a two dimensional diffraction pattern;

wherein the detection elements are arranged in a two dimensional array at the detector;

wherein the maxima of the diffraction pattern are spaced apart at a pitch equal to at least twice the pitch of the detection elements;

wherein the detector intercepts at least 10 maxima and/or minima in a single detection event;

wherein the detector has at least 10,000 pixels; and

wherein the system is capable of determining a physical property of the system, or a change in a physical property of the system, based on the detected locations of the plurality of the intensity maxima and/or intensity minima.

14. A refractive index determination apparatus comprising a measurement system comprising:

an electromagnetic radiation diffraction pattern generator for generating an diffraction pattern including intensity maxima and intensity minima, wherein the diffraction pattern generator includes an arrangement of light-transmitting apertures for the transmission and diffraction of light to generate the diffraction pattern; and

an electromagnetic radiation detector, operable to detect at least a part of the diffraction pattern produced by said generator, the detector having an array of detection elements arranged to detect a location of each of a plurality of the intensity maxima and/or intensity minima of the diffraction pattern substantially simultaneously,

wherein the electromagnetic radiation diffraction pattern generator comprises a laser attached to a pinhole array;

wherein the arrangement of light-transmitting apertures comprises five pinholes arranged on the vertices of a regular pentagon or a ring of nineteen pinholes;

wherein the detected locations of the plurality of the intensity maxima and/or intensity minima are substantially translationally aperiodic;

wherein the diffraction pattern is a two dimensional diffraction pattern;

wherein the detection elements are arranged in a two dimensional array at the detector;

wherein the maxima of the diffraction pattern are spaced apart at a pitch equal to at least twice the pitch of the detection elements;

wherein the detector intercepts at least 10 maxima and/or minima in a single detection event;

wherein the detector has at least 10,000 pixels; and

wherein the system is capable of determining a physical property of the system, or a change in a physical property of the system, based on the detected locations of the plurality of the intensity maxima and/or intensity minima.