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Optimization of source, mask and projection optics

  • US 9,619,603 B2
  • Filed: 11/17/2014
  • Issued: 04/11/2017
  • Est. Priority Date: 11/10/2010
  • Status: Active Grant
First Claim
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1. A method for configuring a lithographic process, the method comprising:

  • obtaining a cost function of design variables that affect characteristics of the lithographic process, the design variables comprising a design variable of projection optics used in the lithographic process, wherein the cost function characterizes a result of the lithographic process, the result including an effect of the design variable of the projection optics; and

    configuring, by a hardware computer, one or more of the characteristics of the lithographic process by adjusting at least some of the design variables including the design variable of the projection optics, until a termination condition for the cost function is satisfied.

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