Tuning a parameter associated with plasma impedance
First Claim
1. A system for tuning a parameter associated with plasma impedance, comprising:
- a radio frequency (RF) generator configured to generate an RF signal;
a line connected to the RF generator;
an impedance matching circuit connected to the line; and
one or more processors coupled to the RF generator, the one or more processors configured to;
receive information to determine a variable, the information measured at the line, the information measured when the parameter has a first value;
determine whether the variable is at a local minima when the parameter has the first value;
provide the first value to generate the RF signal upon determining that the variable is at the local minima; and
change the first value to a second value of the parameter upon determining that the variable is not at the local minima.
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Accused Products
Abstract
Systems and methods for tuning a parameter associated with plasma impedance are described. One of the methods includes receiving information to determine a variable. The information is measured at a transmission line and is measured when the parameter has a first value. The transmission line is used to provide power to a plasma chamber. The method further includes determining whether the variable is at a local minima and providing the first value to tune the impedance matching circuit upon determining that the variable is at the local minima. The method includes changing the first value to a second value of the parameter upon determining that the variable is not at the local minima and determining whether the variable is at a local minima when the parameter has the second value.
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Citations
21 Claims
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1. A system for tuning a parameter associated with plasma impedance, comprising:
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a radio frequency (RF) generator configured to generate an RF signal; a line connected to the RF generator; an impedance matching circuit connected to the line; and one or more processors coupled to the RF generator, the one or more processors configured to; receive information to determine a variable, the information measured at the line, the information measured when the parameter has a first value; determine whether the variable is at a local minima when the parameter has the first value; provide the first value to generate the RF signal upon determining that the variable is at the local minima; and change the first value to a second value of the parameter upon determining that the variable is not at the local minima. - View Dependent Claims (2, 3, 4, 5)
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6. A system for tuning a parameter associated with plasma impedance, comprising:
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a radio frequency (RF) generator configured to generate an RF signal; a line connected to the RF generator; an impedance matching circuit connected to the line; and one or more processors coupled to the RF generator, the one or more processors configured to; receive information to determine a variable, the information measured at the line, the information measured when the parameter has a first value; determine whether the variable is at a local minima when the parameter has the first value; determine whether the first value of the parameter is within a limit of a learned value upon determining that the variable is at the local minima, the learned value determined during a learning routine; provide the learned value to generate the RF signal upon determining that the first value of the parameter is within the limit; and change the first value to a second value of the parameter upon determining that the parameter has the first value that is outside the limit. - View Dependent Claims (7, 8, 9, 10, 11, 12)
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13. A system for tuning a parameter associated with plasma impedance, comprising:
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a radio frequency (RF) generator configured to generate an RF signal; a line connected to the RF generator; an impedance matching circuit connected to the line; and one or more processors coupled to the RF generator, the one or more processors configured to; receive information to determine a variable, the information measured at the line, the information measured when the parameter has a first value; determine a local minima of the variable, the local minima achieved when the parameter has the first value; tune the parameter by changing the first value to one or more other values of the parameter; determine a number of events for which the variable is unstable when the parameter has the one or more other values; determine whether the number of events exceeds a boundary; reverse a direction of tuning the parameter upon determining that the number of events exceeds the boundary; and discontinue further tuning of the parameter upon determining that the number of events does not exceed the boundary. - View Dependent Claims (14, 15, 16, 17)
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18. A system for tuning a parameter associated with plasma impedance, comprising:
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a radio frequency (RF) generator configured to generate an RF signal; a line connected to the RF generator; an impedance matching circuit connected to the line; and one or more processors coupled to the RF generator, the one or more processors configured to; receive information to determine a variable, the information measured at the line, the information measured when the parameter has a first value; determine whether the variable is at a local minima when the parameter has the first value; control the impedance matching circuit using the first value upon determining that the variable is at the local minima; and change the first value to a second value of the parameter upon determining that the variable is not at the local minima. - View Dependent Claims (19, 20, 21)
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Specification