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Tuning a parameter associated with plasma impedance

  • US 9,627,182 B2
  • Filed: 03/07/2016
  • Issued: 04/18/2017
  • Est. Priority Date: 01/11/2013
  • Status: Active Grant
First Claim
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1. A system for tuning a parameter associated with plasma impedance, comprising:

  • a radio frequency (RF) generator configured to generate an RF signal;

    a line connected to the RF generator;

    an impedance matching circuit connected to the line; and

    one or more processors coupled to the RF generator, the one or more processors configured to;

    receive information to determine a variable, the information measured at the line, the information measured when the parameter has a first value;

    determine whether the variable is at a local minima when the parameter has the first value;

    provide the first value to generate the RF signal upon determining that the variable is at the local minima; and

    change the first value to a second value of the parameter upon determining that the variable is not at the local minima.

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