Transparent laminate, capacitance type input device, and image display device
First Claim
1. A transparent laminate,wherein a region where a transparent substrate, a first transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm, a transparent electrode pattern, and a second transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm are laminated in this order is included in a plane,wherein the first transparent film and the transparent electrode pattern are directly adjacent to each other, andwherein the transparent electrode pattern and the second transparent film are directly adjacent to each other.
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Abstract
Provided is a transparent laminate which does not have a problem in which a transparent electrode pattern is visually recognized, a capacitance type input device having the transparent laminate, and an image display device provided with the capacitance type input device as a constituent element. The transparent laminate of the invention includes a region where a transparent substrate, a first transparent film having a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm, a transparent electrode pattern, and a second transparent film having a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm are laminated in this order in a plane.
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Citations
20 Claims
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1. A transparent laminate,
wherein a region where a transparent substrate, a first transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm, a transparent electrode pattern, and a second transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm are laminated in this order is included in a plane, wherein the first transparent film and the transparent electrode pattern are directly adjacent to each other, and wherein the transparent electrode pattern and the second transparent film are directly adjacent to each other.
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20. A transparent laminate,
wherein a region where a transparent substrate, a first transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm, a transparent electrode pattern, and a second transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm are laminated in this order is included in a plane, wherein a transparent protective film is formed on a surface of the second transparent film opposite a surface on which the transparent electrode pattern is formed, wherein the transparent protective film is obtained by curing a photosensitive layer, wherein a thickness of the transparent protective film is 0.1 μ - m to 10 μ
m, andwherein the second transparent film and the transparent protective film are directly adjacent to each other.
- m to 10 μ
Specification