Transparent laminate, capacitance type input device, and image display device
First Claim
1. A transparent laminatecomprising a region where a transparent substrate;
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
a transparent electrode pattern; and
a second transparent film which contains 5 mass % to 80 mass % of metal oxide particles and has a film thickness of 55 nm to 110 nm are laminated in this order;
wherein the region is included in a plane.
1 Assignment
0 Petitions
Accused Products
Abstract
Provided is a transparent laminate which does not have a problem in which a transparent electrode pattern is visually recognized, a capacitance type input device having the transparent laminate, and an image display device provided with the capacitance type input device as a constituent element. The transparent laminate of the invention includes a region where a transparent substrate, a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm, a transparent electrode pattern, and a second transparent film which contains 5 mass % to 80 mass % of metal oxide particles and has a film thickness of 55 nm to 110 nm are laminated in this order in a plane.
6 Citations
26 Claims
-
1. A transparent laminate
comprising a region where a transparent substrate; - a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
a transparent electrode pattern; and
a second transparent film which contains 5 mass % to 80 mass % of metal oxide particles and has a film thickness of 55 nm to 110 nm are laminated in this order;wherein the region is included in a plane. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23)
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
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2. A transparent laminate
comprising a region where a transparent substrate; - a first transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm;
a transparent electrode pattern; and
a second transparent film which contains 5 mass % to 80 mass % of metal oxide particles and has a film thickness of 55 nm to 110 nm are laminated in this order,wherein the region is included in a plane.
- a first transparent film which has a refractive index of 1.6 to 1.78 and a film thickness of 55 nm to 110 nm;
-
24. A transparent laminate comprising a region where a transparent substrate;
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
a transparent electrode pattern; and
a second transparent film which contains 5 mass % to 80 mass % of metal oxide particles and has a film thickness of 55 nm to 110 nm are laminated in this order,wherein the region is included in a plane, and wherein the first transparent film and the transparent electrode pattern are directly adjacent to each other.
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
-
25. A transparent laminate comprising a region where a transparent substrate;
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
a transparent electrode pattern; and
a second transparent film which contains 5 mass % to 80 mass % of metal oxide particles and has a film thickness of 55 nm to 110 nm are laminated in this order,wherein the region is included in a plane, and wherein the transparent electrode pattern and the second transparent film are directly adjacent to each other.
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
-
26. A transparent laminate comprising a region where a transparent substrate;
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
a transparent electrode pattern; and
a second transparent film which contains 5 mass % to 80 mass % of metal oxide particles and has a film thickness of 55 nm to 110 nm are laminated in this order,wherein the region is included in a plane, wherein a transparent protective film is formed on a surface of the second transparent film opposite a surface on which the transparent electrode pattern is formed, wherein the transparent protective film is obtained by curing a photosensitive layer, wherein a thickness of the transparent protective film is 0.1 μ
m to 10 μ
m, andwherein the second transparent film and the transparent protective film are directly adjacent to each other.
- a first transparent film which contains a metal oxide and has a film thickness of 55 nm to 110 nm;
Specification