Nanoscale apertures having islands of functionality

• US 9,637,380 B2
• Filed: 04/27/2011
• Issued: 05/02/2017
• Est. Priority Date: 03/31/2008
• Status: Active Grant

• Current Assignee: Pacific Bioscience of California Incorporated (L'Oreal SA)
• Original Assignee: Pacific Bioscience of California Incorporated (L'Oreal SA)
• Inventors: Turner, Stephen, Kuse, Ron, Kearns, Gregory, Monadgemi, Pezhman, Foquet, Mathieu, Martinez, Drew
• Primary Examiner(s): Gross, Christopher M
• Application Number:
  US13/095,021
• Publication Number:
  US 20110257040A1
• Time in Patent Office: 2,197 Days
• Field of Search: None
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00317 Microwell devices, i.e. having large numbers of wells
• CPC Class Codes: B01J 2219/00509 Microcolumns
• CPC Class Codes: B01J 2219/00637 by coating it with another layer
• CPC Class Codes: B01J 2219/00725 Peptides
• CPC Class Codes: B01J 2219/0074 Biological products
• CPC Class Codes: B01L 2200/0668 Trapping microscopic beads
• CPC Class Codes: B01L 2200/12 Specific details about manufacturing devices
• CPC Class Codes: B01L 2300/0819 Microarrays; Biochips
• CPC Class Codes: B01L 2300/0896 Nanoscaled
• CPC Class Codes: B01L 3/5085 for multiple samples, e.g. microtitration plates
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites

Abstract

Methods, compositions and arrays for non-random loading of single analyte molecules into array structures are provided. Arrays of confined regions are produced wherein each confined region comprises a single island within the confined region. The island can be selectively functionalized with a coupling agent to couple a single molecule of interest within the confined region.

Claims

1. An array of nanoscale apertures comprising:

a transparent substrate having a cladding layer deposited on its surface, the cladding layer having a plurality of nanoscale apertures extending therethrough;

each nanoscale aperture having walls and a base and each nanoscale aperture having an island of island material on the base of the aperture, wherein the island does not contact the walls of the nanoscale aperture, and wherein the island material is a metallic, dielectric, or semiconductor material.

2. The array of claim 1 wherein the substrate comprises a transparent material.

3. The array of claim 1 wherein the substrate comprises a silica based material.

4. The array of claim 1 wherein the substrate comprises a fused silica.

5. The array of claim 1 wherein the island material is a metallic material.

6. The array of claim 1 wherein the metallic material comprises gold.

7. The array of claim 1 wherein the substrate comprises more than 10,000 nanoscale apertures.

8. The array of claim 1 wherein the nanoscale apertures comprise holes having a circular lateral profile.

9. The array of claim 1 wherein the apertures have a cross sectional dimension between 1 nm and 500 nm.

10. The array of claim 1 wherein at least some of the plurality of nanoscale apertures comprise a single molecule of interest attached to the island in the nanoscale aperture.

11. The array of claim 10 wherein the single molecule of interest comprises an enzyme attached to the island in the nanoscale aperture.

12. The array of claim 1 wherein at least some of the plurality of nanoscale apertures comprise a single active polymerase enzyme, a single active template nucleic acid, or a single active primer attached to the island.

13. The array of claim 1 wherein the island of island material is formed by a process comprising:

providing a substrate having a cladding layer, the cladding layer having a plurality of nanoscale apertures extending therethrough;

conformally depositing a sacrificial layer onto the top of the cladding layer;

directionally etching the sacrificial layer such that the sacrificial layer remains on the walls of the nanoscale apertures, and the sacrificial layer is removed from the region of the nanoscale aperture between the sacrificial layer on the walls;

depositing an island material onto the substrate;

etching the island material such that a portion of the island material remains in the region between the sacrificial layer between the walls;

removing the sacrificial layer on the walls thereby producing an island of island material within the nanoscale aperture.

14. The array of claim 1 wherein the island of island material is formed by a process comprising:

providing a substrate having a cladding layer, the cladding layer having a plurality of nanoscale apertures;

conformally depositing a first sacrificial layer onto the top of the cladding layer;

directionally etching the sacrificial layer such that the sacrificial layer remains on the walls of the nanoscale apertures, and the sacrificial layer is removed from the region of the nanoscale aperture between the sacrificial layer on the walls;

directionally depositing an island material onto the substrate;

depositing a second sacrificial layer on top of the island material;

etching the second sacrificial layer so as to leave a portion of the second sacrificial layer on top of the island material within the nanoscale aperture, thereby protecting it from the subsequent etching step;

etching the island material from the top of the cladding such that a portion of the island material remains in the region between the sacrificial layer between the walls; and

removing the first sacrificial layer on the walls and the second sacrificial layer, thereby producing an island of island material within the nanoscale aperture.

15. The array of claim 1 wherein the island of island material is formed by a process comprising:

providing a stack of materials comprising from bottom to top, a transparent substrate, an island material layer, a sacrificial layer, and a hard mask;

patterning and etching the hard mask layer to form a plurality of nanoscale features;

etching the sacrificial layer to expose regions of the island material layer such that the etch of the sacrificial layer extends underneath the hard mask layer, producing and undercut;

directionally depositing a cladding layer, leaving portions of the island material layer under the hard mask layer exposed;

etching the exposed portions of the island material layer; and

removing the remaining portions of the sacrificial layer, hard mask, and portions of the cladding layer on top of the hard mask;

thereby producing nanoscale apertures comprising islands of island material within the nanoscale apertures surrounded by regions of transparent substrate surface.

16. The array of claim 1 wherein the lateral dimensions of the islands are about 40% to about 10% of the corresponding lateral dimension of the nanoscale aperture in which the islands are present.