Immersion exposure apparatus and device manufacturing method with measuring device to measure specific resistance of liquid
First Claim
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1. An exposure apparatus in which a substrate is exposed to an exposure beam through an immersion liquid, the apparatus comprising:
- a projection system having a plurality of optical elements including a final element;
a holding structure which holds the plurality of optical elements, the holding structure having a flange provided at an outer periphery thereof;
a supporting structure which supports the holding structure, the supporting structure having a supporting portion on which the flange of the holding structure is mounted;
a nozzle member having an aperture through which the exposure beam passes, the nozzle member having a supply opening facing downwardly and from which the immersion liquid is supplied, and a recovery opening facing downwardly and from which the supplied immersion liquid is collected, the supply opening being arranged between the aperture and the recovery opening;
an anti-vibration device disposed between the supporting structure and the nozzle member, and which prevents vibrations of the supporting structure caused by the nozzle member; and
a measuring device that measures at least one of a property and a composition of the immersion liquid in a flow path disposed downstream of the recovery opening, while the immersion liquid is in the exposure apparatus, the measuring device including at least one of;
a resistivity meter that measures a specific resistance value;
a TOC meter that measures total organic carbon,a particle counter that measures an amount of a foreign matter,a DO meter that measures a dissolved oxygen concentration,a DN meter that measures a dissolved nitrogen concentration,a silica meter that measures a silica concentration, andan analyzer that analyzes a type and an amount of a live bacteria.
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Abstract
An exposure apparatus is capable of accurately performing an exposure process and a measurement process based on a liquid immersion method. The exposure apparatus, which forms a liquid immersion area of a liquid on an image surface side of a projection optical system, and exposes a substrate via the projection optical system and the liquid of the immersion area, includes a measuring device which measures at least one of a property and composition of the liquid for forming the liquid immersion area.
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Citations
24 Claims
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1. An exposure apparatus in which a substrate is exposed to an exposure beam through an immersion liquid, the apparatus comprising:
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a projection system having a plurality of optical elements including a final element; a holding structure which holds the plurality of optical elements, the holding structure having a flange provided at an outer periphery thereof; a supporting structure which supports the holding structure, the supporting structure having a supporting portion on which the flange of the holding structure is mounted; a nozzle member having an aperture through which the exposure beam passes, the nozzle member having a supply opening facing downwardly and from which the immersion liquid is supplied, and a recovery opening facing downwardly and from which the supplied immersion liquid is collected, the supply opening being arranged between the aperture and the recovery opening; an anti-vibration device disposed between the supporting structure and the nozzle member, and which prevents vibrations of the supporting structure caused by the nozzle member; and a measuring device that measures at least one of a property and a composition of the immersion liquid in a flow path disposed downstream of the recovery opening, while the immersion liquid is in the exposure apparatus, the measuring device including at least one of; a resistivity meter that measures a specific resistance value; a TOC meter that measures total organic carbon, a particle counter that measures an amount of a foreign matter, a DO meter that measures a dissolved oxygen concentration, a DN meter that measures a dissolved nitrogen concentration, a silica meter that measures a silica concentration, and an analyzer that analyzes a type and an amount of a live bacteria. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An exposure method comprising:
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exposing a substrate to an exposure beam through a projection system and an immersion liquid in an exposure apparatus, the projection system having a plurality of optical elements including a final element, the plurality of optical elements being held by a holding structure, the holding structure having a flange provided at an outer periphery thereof; supporting the holding structure by a supporting structure, the supporting structure having a supporting portion on which the flange of the holding structure is mounted; supplying and recovering the immersion liquid with a nozzle member having an aperture through which the exposure beam passes, the nozzle member having a supply opening facing downwardly and from which the immersion liquid is supplied, and a recovery opening facing downwardly and from which the supplied immersion liquid is collected, the supply opening being arranged between the aperture and the recovery opening; preventing, with an anti-vibration device disposed between the supporting structure and the nozzle member, vibrations of the supporting structure caused by the nozzle member; and measuring at least one of a property and a composition of the immersion liquid in a flow path disposed downstream of the recovery opening, while the immersion liquid is in the exposure apparatus, wherein the at least one of the property and the composition of the immersion liquid includes at least one of; a specific resistance value; total organic carbon, an amount of foreign matter, an oxygen concentration dissolved in the immersion liquid, a nitrogen concentration dissolved in the immersion liquid, a silica concentration, and an amount of live bacteria in the immersion liquid. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
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Specification