Scanner model representation with transmission cross coefficients
First Claim
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1. A method for simulating aspects of a lithographic process, comprising:
- securing data regarding characteristics of a lithographic apparatus;
providing non-secure data about the lithographic process, wherein the non-secure data are not hidden;
generating mathematical models representing the secured data and the non-secure data, wherein the secure data are encapsulated using a transformation function; and
providing the mathematical models to a simulation process while keeping the secured data hidden to the simulation process, thereby allowing the simulation process to be performed using the mathematical models and without the simulation process having access to the secured data which is kept hidden from the simulation process by having been encapsulated using the transformation function into the mathematical models,wherein the transformation function includes computing one or more transmission cross coefficients (TCCs) comprising a plurality of eigen-systems representing the lithographic apparatus, andwherein the simulation process uses the mathematical models to form a simulated image corresponding to an actual image of the lithographic process, the actual image being an image as if produced by projecting a portion of a mask layout onto a substrate using the lithographic apparatus.
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Abstract
The present invention relates to a method for simulating aspects of a lithographic process. According to certain aspects, the present invention uses transmission cross coefficients to represent the scanner data and models. According to other aspects, the present invention enables sensitive data regarding various scanner subsystems to be hidden from third party view, while providing data and models useful for accurate lithographic simulation.
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Citations
19 Claims
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1. A method for simulating aspects of a lithographic process, comprising:
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securing data regarding characteristics of a lithographic apparatus; providing non-secure data about the lithographic process, wherein the non-secure data are not hidden; generating mathematical models representing the secured data and the non-secure data, wherein the secure data are encapsulated using a transformation function; and providing the mathematical models to a simulation process while keeping the secured data hidden to the simulation process, thereby allowing the simulation process to be performed using the mathematical models and without the simulation process having access to the secured data which is kept hidden from the simulation process by having been encapsulated using the transformation function into the mathematical models, wherein the transformation function includes computing one or more transmission cross coefficients (TCCs) comprising a plurality of eigen-systems representing the lithographic apparatus, and wherein the simulation process uses the mathematical models to form a simulated image corresponding to an actual image of the lithographic process, the actual image being an image as if produced by projecting a portion of a mask layout onto a substrate using the lithographic apparatus. - View Dependent Claims (2, 3, 4)
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5. A method for simulating aspects of a lithographic process, comprising:
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providing information on one or more optical components, one or more optical properties, or both of a lithographic apparatus; encapsulating the information of the one or more optical components by using a transformation function, wherein the transformation function secures the information on the one or more optical components; providing further information about the lithographic process; and providing the encapsulated information and the further information to a simulation process to simulate the lithographic process, thereby allowing the simulation process to be performed using the encapsulated information and without the simulation process having access to the secured information on the one or more optical components which is kept hidden from the simulation process by having been encapsulated using the transformation function into the encapsulated information, wherein the transformation function includes computing one or more transmission cross coefficients (TCCs) comprising a plurality of eigen-systems representing the lithographic apparatus, and wherein the simulation process uses the encapsulated information and the further information to form a simulated image corresponding to an actual image of the lithographic process, the actual image being an image as if produced by projecting a portion of a mask layout onto a substrate using the lithographic apparatus. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12)
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13. A method for simulating aspects of a lithographic process, comprising:
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generating a model for simulating the aspects of the lithographic process; inputting information about a plurality of characteristics of a lithographic apparatus used in the lithographic process to the model; and using the model to transform the information into transformed information with a transformation function of which the inverse is indeterminate given the transformed information only, wherein the model allows obtaining the simulated aspects based on the transformed information and further information about other aspects of the lithographic process, thereby allowing the simulation to be performed using the model and without the simulation process having access to the information about the plurality of characteristics of the lithographic process which is kept hidden from the simulation process by having been transformed using the transformation function into the model, and wherein the transformation function includes computing transmission cross coefficients (TCCs) comprising a plurality of eigen-systems representing the lithographic apparatus, and wherein the simulation process uses the model to form a simulated image corresponding to an actual image of the lithographic process, the actual image being an image as if produced by projecting a portion of a mask layout onto a substrate using the lithographic apparatus. - View Dependent Claims (14, 15, 16, 17, 18, 19)
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Specification