Manufacturing method of semiconductor device

• US 9,646,829 B2
• Filed: 02/23/2012
• Issued: 05/09/2017
• Est. Priority Date: 03/04/2011
• Status: Active Grant

• Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Original Assignee: Semiconductor Energy Laboratory Co., Ltd.
• Inventors: Ohno, Shinji, Sato, Yuichi, Koezuka, Junichi
• Primary Examiner(s): Garber, Charles
• Assistant Examiner(s): MUSTAPHA, ABDULFATTAH B
• Application Number:
  US13/402,940
• Publication Number:
  US 20120225543A1
• Time in Patent Office: 1,902 Days
• Field of Search: 438102-104, 438479, 438795, 257411, 257E2109, 257E21347, 257E21349, 257E21461
• CPC Class Codes: H01L 21/02554 Oxides
• CPC Class Codes: H01L 21/02565 Oxide semiconducting materials not being Group 12/16 materials, e.g. ternary compounds
• CPC Class Codes: H01L 21/02631 Physical deposition at reduced pressure, e.g. MBE, sputtering, evaporation
• CPC Class Codes: H01L 29/7869 having a semiconductor body comprising an oxide semiconductor material, e.g. zinc oxide, copper aluminium oxide, cadmium stannate

Abstract

A method for manufacturing a highly reliable semiconductor device with less change in threshold voltage is provided. An insulating film from which oxygen can be released by heating is formed in contact with an oxide semiconductor layer, and light irradiation treatment is performed on a gate electrode or a metal layer formed in a region which overlaps with the gate electrode, so that oxygen is added into the oxide semiconductor layer in a region which overlaps with the gate electrode. Accordingly, oxygen vacancies or interface states in the oxide semiconductor layer in a region which overlaps with the gate electrode can be reduced.

Claims

1. A method for manufacturing a semiconductor device, comprising the steps of:

forming a gate electrode over a substrate having an insulating surface;

forming an anti-oxidation layer on and in contact with the gate electrode, the anti-oxidation layer containing at least one of molybdenum nitride, tungsten nitride, titanium nitride, tantalum nitride, and aluminum nitride;

forming an insulating layer over the gate electrode and the anti-oxidation layer;

forming an oxide semiconductor layer in contact with the insulating layer; and

performing a light irradiation treatment on at least the gate electrode, whereby oxygen released from the insulating layer is added to the oxide semiconductor layer.

2. The method for manufacturing a semiconductor device according to claim 1, wherein the insulating layer is formed by a sputtering method using oxygen or a mixed gas of oxygen and argon.

11. The method for manufacturing a semiconductor device according to claim 1, wherein the insulating layer is a single film or a stacked-layer film containing silicon oxide, aluminum oxide, hafnium oxide, hafnium silicate, hafnium aluminate, zirconium oxide, yttrium oxide, lanthanum oxide, or cerium oxide.

15. The method for manufacturing a semiconductor device according to claim 1, wherein the insulating layer is formed by a sputtering method using oxygen-excess silicon oxide, SiO_X with X greater than 2, as a target.

3. A method for manufacturing a semiconductor device, comprising the steps of:

forming an oxide semiconductor layer over a substrate having an insulating surface;

forming an insulating layer in contact with the oxide semiconductor layer;

forming an anti-oxidation layer over the insulating layer, the anti-oxidation layer containing at least one of molybdenum nitride, tungsten nitride, titanium nitride, tantalum nitride, and aluminum nitride;

forming a gate electrode over the insulating layer and on and in contact with the anti-oxidation layer; and

performing a light irradiation treatment on at least the gate electrode, whereby oxygen released from the insulating layer is added to the oxide semiconductor layer.

4. The method for manufacturing a semiconductor device according to claim 3, wherein the insulating layer is formed by a sputtering method using oxygen or a mixed gas of oxygen and argon.

12. The method for manufacturing a semiconductor device according to claim 3, wherein the insulating layer is a single film or a stacked-layer film containing silicon oxide, aluminum oxide, hafnium oxide, hafnium silicate, hafnium aluminate, zirconium oxide, yttrium oxide, lanthanum oxide, or cerium oxide.

16. The method for manufacturing a semiconductor device according to claim 3, wherein the insulating layer is formed by a sputtering method using oxygen-excess silicon oxide, SiO_X with X greater than 2, as a target.

5. A method for manufacturing a semiconductor device, comprising the steps of:

forming a gate electrode over a substrate having an insulating surface;

forming an anti-oxidation layer on and in contact with the gate electrode, the anti-oxidation layer containing at least one of molybdenum nitride, tungsten nitride, titanium nitride, tantalum nitride, and aluminum nitride;

forming a gate insulating layer over the substrate and the anti-oxidation layer;

forming an oxide semiconductor layer over the gate insulating layer;

forming an insulating layer in contact with the oxide semiconductor layer to overlap with the gate electrode;

forming a metal layer over the insulating layer to overlap with the insulating layer and the gate electrode;

forming a source electrode and a drain electrode in electrical contact with the oxide semiconductor layer; and

performing a light irradiation treatment on at least the metal layer, whereby oxygen released from the insulating layer is added to the oxide semiconductor layer.

6. The method for manufacturing a semiconductor device according to claim 5, wherein a layer having an optical absorptance of 60% or more in a wavelength region from 400 nm to 1000 nm both inclusive, is formed as the metal layer.

7. The method for manufacturing a semiconductor device according to claim 5, wherein the insulating layer is formed by a sputtering method using oxygen or a mixed gas of oxygen and argon.

13. The method for manufacturing a semiconductor device according to claim 5, wherein the insulating layer is a single film or a stacked-layer film containing silicon oxide, aluminum oxide, hafnium oxide, hafnium silicate, hafnium aluminate, zirconium oxide, yttrium oxide, lanthanum oxide, or cerium oxide.

17. The method for manufacturing a semiconductor device according to claim 5, wherein the insulating layer is formed by a sputtering method using oxygen-excess silicon oxide, SiO_X with X greater than 2, as a target.

8. A method for manufacturing a semiconductor device, comprising the steps of:

forming an island-shaped metal layer over a substrate having an insulating surface;

forming an insulating layer over the island-shaped metal layer;

forming an oxide semiconductor layer in contact with the insulating layer;

forming a gate insulating layer over the oxide semiconductor layer;

forming an anti-oxidation layer over the gate insulating layer, the anti-oxidation layer containing at least one of molybdenum nitride, tungsten nitride, titanium nitride, tantalum nitride, and aluminum nitride;

forming a gate electrode over the gate insulating layer and on and in contact with the anti-oxidation layer, so as to overlap with the island-shaped metal layer and the insulating layer;

forming a source electrode and a drain electrode in electrical contact with the oxide semiconductor layer; and

performing a light irradiation treatment on at least the island-shaped metal layer, whereby oxygen released from the insulating layer is added to the oxide semiconductor layer.

9. The method for manufacturing a semiconductor device according to claim 8, wherein a layer having an optical absorptance of 60% or more in a wavelength region from 400 nm to 1000 nm both inclusive, is formed as the island-shaped metal layer.

10. The method for manufacturing a semiconductor device according to claim 8, wherein the insulating layer is formed by a sputtering method using oxygen or a mixed gas of oxygen and argon.

14. The method for manufacturing a semiconductor device according to claim 8, wherein the insulating layer is a single film or a stacked-layer film containing silicon oxide, aluminum oxide, hafnium oxide, hafnium silicate, hafnium aluminate, zirconium oxide, yttrium oxide, lanthanum oxide, or cerium oxide.

18. The method for manufacturing a semiconductor device according to claim 8, wherein the insulating layer is formed by a sputtering method using oxygen-excess silicon oxide, SiO_X with X greater than 2, as a target.