Target supply device

• US 9,648,715 B2
• Filed: 04/29/2016
• Issued: 05/09/2017
• Est. Priority Date: 12/13/2013
• Status: Active Grant

• Current Assignee: Gigaphoton, Inc. (Komatsu)
• Original Assignee: Gigaphoton, Inc. (Komatsu)
• Inventors: Shiraishi, Yutaka, Hirashita, Toshiyuki, Ikesaka, Shinya
• Primary Examiner(s): Smith, David E
• Application Number:
  US15/143,066
• Publication Number:
  US 20160249443A1
• Time in Patent Office: 375 Days
• CPC Class Codes: G03F 7/70033 by plasma extreme ultraviolet [EUV] sources
• CPC Class Codes: H05G 2/005 containing a metal as principal radiation generating component
• CPC Class Codes: H05G 2/006 details of the ejection system, e.g. constructional details of the nozzle
• CPC Class Codes: H05G 2/008 involving an energy-carrying beam in the process of plasma generation

Abstract

A target supply device may include: a target generator configured to accommodate a liquid target material and having a nozzle with a nozzle hole from which the liquid target material is outputted; and a filter disposed in the target generator and made of glass, the glass reacting with the liquid target material, so that a solid reaction product is generated. The filter may include a first through-hole configured to allow the liquid target material to pass therethrough, and an inner surface of the first through-hole may be coated with a material which is not easy to react with the liquid target material.

Claims

1. A target supply device comprising:

a target generator configured to accommodate a liquid target material and having a nozzle with a nozzle hole from which the liquid target material is outputted; and

a filter disposed in the target generator and made of glass, the glass reacting with the liquid target material, so that a solid reaction product is generated, wherein;

the filter includes a first through-hole configured to allow the liquid target material to pass therethrough; and

an inner surface of the first through-hole is coated with a material which is not easy to react with the liquid target material.

2. The target supply device according to claim 1, wherein the filter is made of the glass containing lead.

3. The target supply device according to claim 2, wherein the material includes Al₂O₃ (aluminium oxide), Cr₂O₃ (chromium (III) oxide), Y₂O₃ (yttrium oxide), or TiB₂ (titanium boride).

4. The target supply device according to claim 2, wherein the material includes Al₂O₃ (aluminium oxide), Y₂O₃ (yttrium oxide), SiO₂ (silicon dioxide), AlN (aluminum nitride) or ZrO₂ (zirconium oxide).

5. The target supply device according to claim 1, further comprising:

a support member configured to abut on a surface of the filter in the nozzle hole side so as to support the filter; and

a positioning part configured to position the filter and the support member in the target generator,

wherein the support member includes a second through-hole having a bore diameter greater than a bore diameter of the first through-hole to allow the liquid target material flowing out of the first through-hole to flow therethrough.

6. A target supply device comprising:

a target generator configured to accommodate a liquid target material and having a nozzle with a nozzle hole from which the liquid target material is outputted;

a filter disposed in the target generator and made of glass or a ceramic;

a support member configured to abut on a surface of the filter in the nozzle hole side so as to support the filter; and

a positioning part configured to position the filter and the support member in the target generator, wherein;

the filter includes a first through-hole configured to allow the liquid target material to flow therethrough; and

the support member includes a second through-hole having a bore diameter greater than a bore diameter of the first through-hole to allow the liquid target material flowing out of the first through-hole to flow therethrough.

7. The target supply device according to claim 6, wherein the support member is made of molybdenum, quartz glass, or sapphire.