Correction of errors of a photolithographic mask using a joint optimization process
First Claim
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1. A method for correcting a plurality of errors of a photolithographic mask;
- the method comprising;
determining optimized first and optimized second parameters in a joint optimization process by simultaneously optimizing first parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask; and
correcting the plurality of errors by performing an imaging transformation by a stepper or a scanner, in which the imaging transformation is described by the optimized first parameters, and performing at least one of a local density modification or an optical transmission distribution modification of a substrate of the photolithographic mask by locally directing the laser beam onto the photolithographic mask, in which the at least one of the local density modification or the optical transmission distribution modification is described by the optimized second parameters.
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Abstract
A method for correcting a plurality of errors of a photolithographic mask is provided. First parameters of a imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask are optimized, and the plurality of errors are corrected by applying an imaging transformation using optimized first parameters and locally directing the laser beam onto the photolithographic mask using optimized second parameters. The first and the second parameters are simultaneously optimized in a joint optimization process.
29 Citations
25 Claims
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1. A method for correcting a plurality of errors of a photolithographic mask;
- the method comprising;
determining optimized first and optimized second parameters in a joint optimization process by simultaneously optimizing first parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask; and correcting the plurality of errors by performing an imaging transformation by a stepper or a scanner, in which the imaging transformation is described by the optimized first parameters, and performing at least one of a local density modification or an optical transmission distribution modification of a substrate of the photolithographic mask by locally directing the laser beam onto the photolithographic mask, in which the at least one of the local density modification or the optical transmission distribution modification is described by the optimized second parameters. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24)
- the method comprising;
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25. An apparatus for correcting a plurality of errors of a photolithographic mask, comprising:
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at least one computing means configured to simultaneously optimize first imaging parameters of an imaging transformation of the photolithographic mask and second parameters of a laser beam locally directed onto the photolithographic mask; at least one laser source for generating the laser beam of light pulses according to optimized second laser beam parameters, the light pulses generated according to optimized second laser beam parameters to perform at least one of a density modification or an optical transmission distribution modification of a substrateof the photolithographic mask by locally directing the laser beam onto the photolithographic mask; and at least one stepper or scanner for performing an imaging transformation according to optimized first imaging parameters, in which a combined action of the laser beam of light pulses generated according to optimized second laser beam parameters and the imaging transformation performed according to the optimized first imaging parameters correct the plurality of errors of the photolithographic mask.
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Specification