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Plasma processing apparatus and shower plate

  • US 9,663,856 B2
  • Filed: 03/19/2014
  • Issued: 05/30/2017
  • Est. Priority Date: 03/21/2013
  • Status: Active Grant
First Claim
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1. A plasma processing apparatus including a processing vessel in which a plasma process is performed and a plasma generation antenna having a shower plate which supplies a first gas and a second gas into the processing vessel, the plasma processing apparatus performing the plasma process on a substrate with plasma generated by a surface wave formed on a surface of the shower plate through a supply of a microwave,wherein the shower plate has a plurality of gas holes configured to supply the first gas into the processing vessel and a plurality of supply nozzles configured to supply the second gas into the processing vessel,the supply nozzles are protruded vertically downwards from a bottom surface of the shower plate and are provided at different positions from the gas holes,the supply nozzles are configured to pass through a region having an electron temperature higher in the vicinity of the shower plate than in any other region under the vicinity of the shower plate, anda distance from the bottom surface of the shower plate to a lower end of each supply nozzle is equivalent to about 1/16 to about 3/16 of a wavelength of the supplied microwave.

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