×

High infrared reflection coatings, thin film coating deposition methods and associated technologies

  • US 9,663,984 B2
  • Filed: 12/29/2011
  • Issued: 05/30/2017
  • Est. Priority Date: 10/11/2005
  • Status: Active Grant
First Claim
Patent Images

1. A coated substrate comprising a substrate and a low-emissivity coating, the substrate having a major surface that bears the low-emissivity coating, the low-emissivity coating comprising a first infrared-reflection film region having a thickness, a second infrared-reflection film region having a thickness, and a third infrared-reflection film region having a thickness, the low-emissivity coating comprising, from said major surface outwardly:

  • a) a first transparent dielectric film region;

    b) the first infrared-reflection film region;

    c) a first blocker film region deposited as an oxynitride directly on and contiguous to the first infrared-reflection film region;

    d) a second transparent dielectric film region;

    e) the second infrared-reflection film region;

    f) a second blocker film region deposited as an oxynitride directly on and contiguous to the second infrared-reflection film region;

    g) a third transparent dielectric film region;

    h) the third infrared-reflection film region;

    i) a third blocker film region deposited as an oxynitride directly on and contiguous to the first infrared-reflection film region; and

    j) a fourth transparent dielectric film region,wherein the first, second, and third blocker film regions each have a thickness in the range of 3-25 angstroms.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×