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Direct bandgap substrates and methods of making and using

  • US 9,666,600 B2
  • Filed: 01/28/2016
  • Issued: 05/30/2017
  • Est. Priority Date: 08/16/2007
  • Status: Active Grant
First Claim
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1. A method comprising:

  • providing an inorganic substrate with a substantially direct bandgap for light emission or absorption, including forming a metal contact to the substrate;

    forming an insulating layer on a first side of the substrate;

    forming a direct bandgap semiconductor layer on the insulating layer;

    selectively heating and crystallizing an active region of the direct bandgap semiconductor layer formed on the insulating layer;

    forming an electrical contact to the crystallized active region in the direct bandgap semiconductor layer; and

    forming an electrical contact to the substrate.

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