Method for manufacturing a compound film
First Claim
1. An apparatus for forming a compound film layer that comprises a CIGS material, comprising:
- a deposition chamber comprising a deposition zone;
a flexible substrate having a deposition surface and a non-deposition surface, wherein the flexible substrate comprises a metal-containing layer that has a surface that forms at least part of the deposition surface;
a substrate transport device that is configured to transfer the flexible substrate in a first direction through the deposition zone of the deposition chamber when forming the compound film layer;
a deposition source block disposed in the deposition zone, comprising;
a first deposition source that is configured to deliver a flux of a first material to the deposition surface of the flexible substrate as the flexible substrate is transferred through the deposition zone, wherein a heated region of the first deposition source contains the first material which consists essentially of gallium (Ga); and
a second deposition source that is configured to deliver a flux of a second material to the deposition surface of the flexible substrate as the flexible substrate is transferred through the deposition zone, wherein the first and second deposition sources are disposed a distance apart along the first direction, and a heated region of the second deposition source contains the second material which consists essentially of indium (In);
a measurement device having an x-ray detector and either an x-ray source or an electron source that are positioned over the non-deposition surface of the flexible substrate and directly over the deposition source block within the deposition zone, wherein the non-deposition surface is opposed to the deposition surface of the flexible substrate, and the flexible substrate is disposed between the measurement device and the deposition source block; and
a controller that is configured to;
determine a ratio of the first material to the second material deposited on the deposition surface of the flexible substrate based on information received from the x-ray detector of the measurement device, wherein the x-ray detector is configured to detect K-line fluorescence radiation only or K-line and L-line fluorescence radiation, and the determined ratio is generated by analyzing the detected fluorescent radiation wavelengths, andadjust an amount of the first material provided by the first deposition source or an amount of the second material provided by the second deposition source to the deposition surface-based on the determined ratio.
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Accused Products
Abstract
A method for manufacturing a compound film comprising a substrate and at least one additional layer is disclosed. The method comprising the steps of depositing at least two chemical elements on the substrate and/or on the at least one additional layer using depositions sources, maintaining depositing of the at least two chemical elements while the substrate and the deposition sources are being moved relative to each other, measuring the compound film properties, particularly being compound film thickness, compound-film overall composition, and compound-film composition in one or several positions of the compound film, comparing the predefined values for the compound film properties to the measured compound film properties, and adjusting the deposition of the at least two chemical elements in case the measured compound film properties do not match the predefined compound film properties.
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Citations
22 Claims
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1. An apparatus for forming a compound film layer that comprises a CIGS material, comprising:
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a deposition chamber comprising a deposition zone; a flexible substrate having a deposition surface and a non-deposition surface, wherein the flexible substrate comprises a metal-containing layer that has a surface that forms at least part of the deposition surface; a substrate transport device that is configured to transfer the flexible substrate in a first direction through the deposition zone of the deposition chamber when forming the compound film layer; a deposition source block disposed in the deposition zone, comprising; a first deposition source that is configured to deliver a flux of a first material to the deposition surface of the flexible substrate as the flexible substrate is transferred through the deposition zone, wherein a heated region of the first deposition source contains the first material which consists essentially of gallium (Ga); and a second deposition source that is configured to deliver a flux of a second material to the deposition surface of the flexible substrate as the flexible substrate is transferred through the deposition zone, wherein the first and second deposition sources are disposed a distance apart along the first direction, and a heated region of the second deposition source contains the second material which consists essentially of indium (In); a measurement device having an x-ray detector and either an x-ray source or an electron source that are positioned over the non-deposition surface of the flexible substrate and directly over the deposition source block within the deposition zone, wherein the non-deposition surface is opposed to the deposition surface of the flexible substrate, and the flexible substrate is disposed between the measurement device and the deposition source block; and a controller that is configured to; determine a ratio of the first material to the second material deposited on the deposition surface of the flexible substrate based on information received from the x-ray detector of the measurement device, wherein the x-ray detector is configured to detect K-line fluorescence radiation only or K-line and L-line fluorescence radiation, and the determined ratio is generated by analyzing the detected fluorescent radiation wavelengths, and adjust an amount of the first material provided by the first deposition source or an amount of the second material provided by the second deposition source to the deposition surface-based on the determined ratio. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. An apparatus for forming a compound film layer that comprises a CIGS material, comprising:
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a deposition chamber comprising a deposition zone; a first deposition source block disposed in the deposition zone of the deposition chamber, the first deposition source block comprising; a first deposition source comprising a heating element and a heated region that contains an amount of a first material, wherein the heating element is positioned to heat an amount of the first material disposed within the heated region of the first deposition source and the first material consists essentially of gallium (Ga); a second deposition source comprising a heating element and a heated region that contains an amount of a second material;
wherein the heating element is positioned to heat an amount of the second material disposed within the heated region of the second deposition source, and the second material consists essentially of indium (In); anda third deposition source comprising a heating element and a heated region that contains an amount of the first material;
wherein the heating element is positioned to heat an amount of the first material disposed within the heated region of the third deposition source, and the first, second and third deposition sources are serially disposed a distance apart along a first direction;a flexible substrate that extends from an input roll to an output roll and through the deposition zone of the deposition chamber, wherein the flexible substrate comprises a flexible body and a metal-containing layer, and a surface of the metal-containing layer forms at least part of a deposition surface of the flexible substrate; a substrate transport device that is configured to transfer the flexible substrate, relative to the first deposition source block, in the first direction from the input roll to the output roll, wherein the first, second and third deposition sources are positioned to deliver a flux of either of the first or the second material to the surface of the metal-containing layer disposed over the flexible substrate during processing; a measurement device that is fixedly positioned within the deposition zone of the deposition chamber and having an x-ray detector and an x-ray source that are positioned over a non-deposition surface of the flexible substrate and directly over the first deposition source block, wherein the non-deposition surface is opposed to the deposition surface of the flexible substrate, and the flexible substrate is disposed between the measurement device and the first deposition source block; and a controller that is configured to; determine a ratio of the first material to the second material deposited on the deposition surface of the flexible substrate based on information received from the x-ray detector of the measurement device, wherein the x-ray detector is configured to detect K-line fluorescence radiation only or K-line and L-line fluorescence radiation, and the determined ratio is generated by analyzing the detected fluorescent radiation wavelengths, and adjust an amount of energy generated by the heating element in the first, second or third deposition sources based on the determined ratio. - View Dependent Claims (13, 14, 15, 16, 17, 18, 19, 20, 21, 22)
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Specification