Glass sealing with transparent materials having transient absorption properties
First Claim
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1. A method of protecting a workpiece comprising:
- forming a low Tg glass sealing layer over a major surface of a first substrate;
arranging a workpiece to be protected between the first substrate and a second substrate where the sealing layer is in contact with the second substrate;
locally heating the glass sealing layer with laser radiation to a sealing temperature sufficient to melt the sealing layer; and
inducing transient absorption of the laser radiation by the first substrate to melt at least a portion of the first substrate and form a glass seal between the first and second substrates,wherein the first substrate is a glass substrate having (a) an absorption of the laser radiation that is less than 15% at room temperature and (b) an induced transient absorption of the laser radiation that is greater than 15% at the sealing temperature.
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Abstract
Transparent glass-to-glass hermetic seals are formed by providing a low melting temperature sealing glass along a sealing interface between two glass substrates and irradiating the interface with laser radiation. Absorption by the sealing glass and induced transient absorption by the glass substrates along the sealing interface causes localized heating and melting of both the sealing glass layer and the substrate materials, which results in the formation of a glass-to-glass weld. Due to the transient absorption by the substrate material, the sealed region is transparent upon cooling.
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Citations
27 Claims
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1. A method of protecting a workpiece comprising:
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forming a low Tg glass sealing layer over a major surface of a first substrate; arranging a workpiece to be protected between the first substrate and a second substrate where the sealing layer is in contact with the second substrate; locally heating the glass sealing layer with laser radiation to a sealing temperature sufficient to melt the sealing layer; and inducing transient absorption of the laser radiation by the first substrate to melt at least a portion of the first substrate and form a glass seal between the first and second substrates, wherein the first substrate is a glass substrate having (a) an absorption of the laser radiation that is less than 15% at room temperature and (b) an induced transient absorption of the laser radiation that is greater than 15% at the sealing temperature. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16)
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17. A method of sealing a device comprising the steps of:
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forming a non-frit, low Tg glass sealing layer over a surface of a first substrate; arranging a device to be sealed between the first substrate and a second substrate where the sealing layer is in contact with the second substrate and the device, thereby forming an interface between the first substrate, sealing layer and second substrate; locally heating the interface using laser radiation to cause a local increase in temperature at the interface and to melt the sealing layer at the interface; inducing transient absorption of the laser radiation in portions of the first substrate and second substrate adjacent the interface as a function of the local increase in temperature at the interface; melting the portions of the first substrate and second substrate as a function of the induced transient absorption; and sealing the device between the first and second substrates by the melted sealing layer and melted portions of the first and second substrates. - View Dependent Claims (18, 19, 20, 21, 22, 23)
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24. A method of protecting a workpiece comprising:
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forming a non-frit, low Tg glass sealing layer over substantially all of a major surface of a first glass substrate; arranging a workpiece to be protected between the first glass substrate and a second glass substrate where the sealing layer is in contact with the second glass substrate; and locally heating the glass sealing layer and the glass substrates with laser radiation to a sealing temperature to melt the sealing layer and the glass substrates to form an optically transparent glass seal between the glass substrates, wherein at least one of the first or second glass substrates has (a) an absorption of the laser radiation that is less than 15% at room temperature and (b) an induced transient absorption of the laser radiation that is greater than 15% at the sealing temperature, and wherein the non-frit low Tg glass comprises; 35-50 mol % SnO; 30-40 mol % SnF2; 15-25 mol % P2O5; and 1.5 to 3 mol % of a dopant oxide. - View Dependent Claims (25, 26)
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27. A method of protecting a workpiece comprising:
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forming a low Tg glass sealing layer over substantially all of a major surface of a first glass substrate; arranging a workpiece to be protected between the first substrate and a second glass substrate where the sealing layer is in contact with the second glass substrate; and locally heating the glass sealing layer and the glass substrates with laser radiation to a sealing temperature to melt the sealing layer and the glass substrates to form an optically transparent glass seal between the glass substrates, wherein at least one of the first or second glass substrates has (a) an absorption of the laser radiation that is less than 15% at room temperature and (b) an induced transient absorption of the laser radiation that is greater than 15% at the sealing temperature.
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Specification