System for discharging an area that is scanned by an electron beam

• US 9,673,023 B2
• Filed: 05/12/2015
• Issued: 06/06/2017
• Est. Priority Date: 05/12/2015
• Status: Active Grant

• Current Assignee: Applied Materials Israel Limited (Applied Materials Incorporated)
• Original Assignee: Applied Materials Israel Limited (Applied Materials Incorporated)
• Inventors: Goldenshtein, Alex
• Primary Examiner(s): STOFFA, WYATT A
• Application Number:
  US14/710,297
• Publication Number:
  US 20160336146A1
• Time in Patent Office: 756 Days
• CPC Class Codes: H01J 2237/0047 using electromagnetic radiations, e.g. UV, X-rays, light
• CPC Class Codes: H01J 2237/04 Means for controlling the discharge
• CPC Class Codes: H01J 2237/063 Electron sources
• CPC Class Codes: H01J 2237/2801 Details
• CPC Class Codes: H01J 2237/2817 Pattern inspection
• CPC Class Codes: H01J 37/026 Means for avoiding or neutralising unwanted electrical charges on tube components
• CPC Class Codes: H01J 37/073 Electron guns using field emission, photo emission, or secondary emission electron sources
• CPC Class Codes: H01J 37/226 Optical arrangements for illuminating the object; optical arrangements for collecting light from the object
• CPC Class Codes: H01J 37/28 with scanning beams H01J37/268, H01J37/292, H01J37/2955 take precedence

Abstract

A method and a system for imaging an object, the system may include electron optics that may be configured to scan a first area of the object with at least one electron beam; wherein the electron optics may include a first electrode; and light optics that may be configured to illuminate at least one target of (a) the first electrode and (b) the object, thereby causing an emission of electrons between the first electrode and the object.

Claims

1. A system for imaging an object, the system comprising:

electron optics configured to scan a first area of the object with at least one electron beam;

wherein the electron optics comprise a first electrode;

a metal mirror coupled to the first electrode; and

light optics configured to illuminate at least the metal mirror with a beam of light, the metal mirror arranged to direct the beam of light towards the object, thereby causing an emission of electrons between the first electrode and the object.

2. The system according to claim 1, wherein the metal mirror is arranged to direct the beam of light towards the first area, thereby causing an emission of electrons between the first electrode and the first area.

3. The system according to claim 1, wherein the light optics are configured to illuminate both the metal mirror and the object.

4. The system according to claim 1, wherein the electrode comprises a first target and the object comprises a second target, the system further comprising a controller configured to determine which target of the first target and the second target to illuminate by the light optics.

5. The system according to claim 1, wherein the metal mirror is configured to direct the beam of light towards the first area.

6. The system according to claim 1, wherein the light optics are configured to illuminate the first area and the metal mirror simultaneously.

7. The system according to claim 1, wherein the light optics are configured to illuminate the first area and the metal mirror at different points in time during a scan period during which the first area is scanned.

8. The system according to claim 1, further comprising biasing circuits for providing a same biasing voltage to the first electrode and to the object.

9. The system according to claim 1, wherein the metal mirror is electrically coupled to the first electrode.

10. The system according to claim 1, wherein the first electrode is closer to the object than any other electrode of the electron optics.

11. The system according to claim 1, wherein the electron optics comprise a column and wherein the first electrode is spaced apart from the column.

12. A system for imaging an object, the system comprising:

electron optics configured to scan a first area of the object with at least one electron beam;

wherein the electron optics comprise a first electrode;

a metal mirror electrically coupled to the first electrode; and

light optics configured to illuminate the metal mirror with a beam of light, the metal mirror arranged to direct the beam of light towards the object, thereby causing the metal mirror to emit electrons towards the object when the object is more positive than the first electrode.

13. The system according to claim 12, wherein the light optics are further configured to illuminate the first area thereby causing the first area to emit electrons towards the first electrode when the first area is more negative than the first electrode.

14. The system according to claim 12, wherein the metal mirror is configured to direct the beam of light towards the first area.

15. The system according to claim 12, further comprising biasing circuits for providing different biasing voltages to the first electrode and to the object.

16. The system according to claim 12, wherein the first electrode is closer to the object than any other electrode of the electron optics.

17. The system according to claim 12, wherein the electron optics comprise a column and wherein the first electrode is spaced apart from the column.

18. A system for imaging an object, the system comprising:

electron optics configured to scan a first area of the object with at least one electron beam;

wherein the electron optics comprise a first electrode;

a metal mirror coupled to the first electrode; and

light optics configured to illuminate the first electrode and the object at the same time using the metal mirror, thereby causing (i) an emission of electrons from the first electrode towards the object when the object is more positive than the first electrode; and

(ii) an emission of electrons from the object towards the first electrode when the object is more negative than the first electrode.

19. The system according to claim 18 wherein the first electrode is closer to the object than any other electrode of the electron optics.

20. The system according to claim 18 wherein the electron optics comprise a column and wherein the first electrode is spaced apart from the column.