Cleaning composition
First Claim
Patent Images
1. A hard surface cleaning composition comprising:
- from about 1% to about 60% by weight of the composition of a surfactant system wherein said surfactant system comprises an anionic and amphoteric/zwitterionic system wherein the amphoteric to zwitterionic weight ratio is from about 2;
1 to about 1;
2; and
from about 0.1% to about 10% by weight of the composition of a cleaning amine of formula;
a.
1 Assignment
0 Petitions
Accused Products
Abstract
A hard surface cleaning composition comprising:
- a) from 1% to 60% by weight of the composition of a surfactant system; and
- b) from 0.1% to 10% by weight of the composition of a cleaning amine of formula:
-
-
- wherein R1 and R4 are independently selected from —H, linear, branched or cyclic alkyl or alkenyl having from 1 to 10 carbon atoms; and R2 is a linear, branched or cyclic alkyl or alkenyl having from 3 to 10 carbon atoms, R3 is a linear or branched alkyl from 3 to 6 carbon atoms, R5 is H, methyl or ethyl and n=0-3.
-
17 Citations
13 Claims
-
1. A hard surface cleaning composition comprising:
-
from about 1% to about 60% by weight of the composition of a surfactant system wherein said surfactant system comprises an anionic and amphoteric/zwitterionic system wherein the amphoteric to zwitterionic weight ratio is from about 2;
1 to about 1;
2; andfrom about 0.1% to about 10% by weight of the composition of a cleaning amine of formula; a. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
Specification