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Lithographic apparatus and device manufacturing method

  • US 9,690,210 B2
  • Filed: 07/20/2012
  • Issued: 06/27/2017
  • Est. Priority Date: 08/18/2011
  • Status: Active Grant
First Claim
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1. A lithographic apparatus, configured to project an exposure beam of radiation onto a substrate, the apparatus comprising:

  • a measurement system, configured to provide measurement data related to a thickness of a resist layer on a first region of the substrate, and configured to measure intensity of radiation derived from the exposure beam of radiation to expose the resist layer of the first region of the substrate, that is redirected back from the layer of resist to generate the measurement data; and

    a controller, configured to control the operation of the lithographic apparatus such that a radiation intensity level in an exposure beam to be subsequently projected onto a different second region of the same substrate is controlled based on the measurement data.

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