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Lithographic apparatus, device manufacturing method and computer program

  • US 9,696,636 B2
  • Filed: 11/06/2012
  • Issued: 07/04/2017
  • Est. Priority Date: 11/29/2011
  • Status: Active Grant
First Claim
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1. An exposure apparatus, comprising:

  • a radiation source configured to produce a plurality of radiation beams having individually controllable intensities;

    a projection system configured to project each of the radiation beams onto a respective location on a target; and

    a controller configured to calculate a target intensity value for each of the radiation beams to expose the target to a desired pattern and to control the radiation source to emit beams with the target intensity values, wherein the controller calculates the target intensity values using a calculated or measured value of the position and/or rotation of each of the locations relative to the projection system and the controller calculates the target intensity values using a function for each radiation beam that models radiation coupling to that beam from a neighboring beam.

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