Lithographic apparatus, device manufacturing method and computer program
First Claim
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1. An exposure apparatus, comprising:
- a radiation source configured to produce a plurality of radiation beams having individually controllable intensities;
a projection system configured to project each of the radiation beams onto a respective location on a target; and
a controller configured to calculate a target intensity value for each of the radiation beams to expose the target to a desired pattern and to control the radiation source to emit beams with the target intensity values, wherein the controller calculates the target intensity values using a calculated or measured value of the position and/or rotation of each of the locations relative to the projection system and the controller calculates the target intensity values using a function for each radiation beam that models radiation coupling to that beam from a neighboring beam.
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Abstract
The invention relates to intensity values for a plurality of beams used to irradiate a plurality of locations on a target are determined with reference to the position and/or rotation of the locations. Also provided is an associated lithographic or exposure apparatus, an associated device manufacturing method and an associated computer program.
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20 Claims
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1. An exposure apparatus, comprising:
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a radiation source configured to produce a plurality of radiation beams having individually controllable intensities; a projection system configured to project each of the radiation beams onto a respective location on a target; and a controller configured to calculate a target intensity value for each of the radiation beams to expose the target to a desired pattern and to control the radiation source to emit beams with the target intensity values, wherein the controller calculates the target intensity values using a calculated or measured value of the position and/or rotation of each of the locations relative to the projection system and the controller calculates the target intensity values using a function for each radiation beam that models radiation coupling to that beam from a neighboring beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A device manufacturing method in which a target is to be irradiated with a desired pattern, the method comprising:
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calculating an intensity value for each of a plurality of radiation beams to be used to irradiate the target, the calculation being performed based on a calculated or measured value of a position and/or rotation relative to a projection system of a plurality of locations on the target and the calculation using a function for each radiation beam that models radiation coupling to that beam from a neighboring beam; and projecting the radiation beams having the calculated intensity values onto respective ones of the locations using the projection system. - View Dependent Claims (14, 15)
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- 16. A non-transitory data storage medium comprising a computer program stored therein to calculate an intensity value for each of a plurality of radiation beams to be used to irradiate a target, the computer program comprising code to instruct a processor to perform the calculation using a calculated or measured value of a position and/or rotation relative to a projection system of each of a plurality of locations on the target and to perform the calculation using a function for each radiation beam that models radiation coupling to that beam from a neighboring beam.
Specification