Structure and method for FinFET device
First Claim
1. A method comprising:
- forming a fin structure over a substrate;
after forming the fin structure over a substrate, forming an oxide feature around the fin structure such that a first portion of the fin structure is positioned above the oxide feature and a second portion of the fin structure is positioned below the oxide feature;
forming a liner layer directly on the second portion of the fin structure, the oxide feature and the first portion of the fin structure;
forming a dielectric layer on the liner layer;
removing a portion of the liner layer and a portion of the dielectric layer to expose the fin structure;
forming a gate dielectric layer on the fin structure, a remaining portion of the liner layer, and a remaining portion of the dielectric layer; and
forming a gate electrode on the gate dielectric layer.
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Abstract
The present disclosure provides an embodiment of a fin-like field-effect transistor (FinFET) device. The device includes a substrate having a first gate region, a first fin structure over the substrate in the first gate region. The first fin structure includes an upper semiconductor material member, a lower semiconductor material member, surrounded by an oxide feature and a liner wrapping around the oxide feature of the lower semiconductor material member, and extending upwards to wrap around a lower portion of the upper semiconductor material member. The device also includes a dielectric layer laterally proximate to an upper portion of the upper semiconductor material member. Therefore the upper semiconductor material member includes a middle portion that is neither laterally proximate to the dielectric layer nor wrapped by the liner.
99 Citations
20 Claims
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1. A method comprising:
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forming a fin structure over a substrate; after forming the fin structure over a substrate, forming an oxide feature around the fin structure such that a first portion of the fin structure is positioned above the oxide feature and a second portion of the fin structure is positioned below the oxide feature; forming a liner layer directly on the second portion of the fin structure, the oxide feature and the first portion of the fin structure; forming a dielectric layer on the liner layer; removing a portion of the liner layer and a portion of the dielectric layer to expose the fin structure; forming a gate dielectric layer on the fin structure, a remaining portion of the liner layer, and a remaining portion of the dielectric layer; and forming a gate electrode on the gate dielectric layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A method comprising:
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forming a first fin structure over a substrate, the first fin structure including; a first semiconductor material layer; and a second semiconductor material layer disposed over the first semiconductor material layer, the second semiconductor material layer being different than the first semiconductor material layer; forming a liner layer extending along a sidewall of the first semiconductor material layer and along a sidewall of the second semiconductor material layer; forming a dielectric isolation feature adjacent the first and second semiconductor material layers, wherein after forming the dielectric isolation feature, a first portion of the sidewall of the second semiconductor material layer is covered by the dielectric isolation feature and a second portion of the sidewall of the second semiconductor material layer is exposed; forming a gate dielectric layer on the exposed second portion of the sidewall of the second semiconductor material layer; forming a gate electrode layer over the gate dielectric; forming a second fin structure over a substrate, the second fin structure including; the first semiconductor material layer; and the second semiconductor material layer disposed over the first semiconductor material layer; and performing an oxidation process to form an oxide feature around the first semiconductor material layer of the second fin structure, wherein the first fin structure is protected during the performing of the oxidation process thereby preventing oxide from forming around the first semiconductor material layer of the first fin structure. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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18. A method comprising:
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providing a substrate having an n-type fin-like field-effect transistor (NFET) region and a p-type fin-like field-effect transistor (PFET) region; forming first fin structures in the NFET region and the PFET region, the first fin structure includes; a first epitaxial semiconductor material layer as its upper portion; a second epitaxial semiconductor material layer, with a semiconductor oxide feature at its outer layer, as its middle portion; and a third semiconductor material layer as its bottom portion; forming a patterned oxidation-hard-mask (OHM) over the NFET region and PFET region to expose the first fin structure in a first gate region of the NFET region; applying annealing to form a semiconductor oxide feature out of the second epitaxial semiconductor material layer in the first fin structure in the first gate region; forming a liner wrapping over the first fin structures in both of the NFET region and the PFET region; depositing a dielectric layer between the first fin structures; recessing the liner in the PFET region after covering the NFET region with a hard mask layer; forming a second fin structure in the PFET region while covering the NFET region with the hard mask layer; recessing the liner in the NFET region after removing the hard mask layer; and recessing the dielectric layer in both of the NFET region and the PFET region. - View Dependent Claims (19, 20)
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Specification