Apparatus for measuring overlay errors

• US 9,702,693 B2
• Filed: 04/22/2016
• Issued: 07/11/2017
• Est. Priority Date: 08/30/2000
• Status: Expired due to Term

• Current Assignee: KLA-Tencor Corporation
• Original Assignee: KLA-Tencor Corporation
• Inventors: Levy, Ady, Wack, Dan, Adel, Michael, Mieher, Walter D., Ghinovker, Mark
• Primary Examiner(s): STARK, JARRETT J
• Application Number:
  US15/136,855
• Publication Number:
  US 20160313116A1
• Time in Patent Office: 445 Days
• CPC Class Codes: G01B 11/272 using photoelectric detection means
• CPC Class Codes: G01N 21/4785 Standardising light scatter apparatus; Standards therefor
• CPC Class Codes: G01N 21/9501 Semiconductor wafers manufacturing processes per se of semiconductor devices implementing a measuring step H01L22/10
• CPC Class Codes: G03F 7/70633 Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
• CPC Class Codes: H01L 21/68 for positioning, orientation or alignment
• CPC Class Codes: H01L 21/682 Mask-wafer alignment in general G03F7/70, G03F9/70
• CPC Class Codes: H01L 23/544 Marks applied to semiconductor devices or parts, e.g. registration marks, alignment structures, wafer maps test patterns for characterising or monitoring manufacturing processes H01L22/00
• CPC Class Codes: Y10S 438/975 Substrate or mask aligning feature

Abstract

A metrology system for determining overlay is disclosed. The system includes an optical assembly for capturing images of an overlay mark and a computer for analyzing the captured images to determine whether there is an overlay error. The mark comprises first and second regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a first direction, and include a periodic structure having coarsely segmented elements. The mark comprises third and fourth regions that each include at least two separately generated working zones, juxtaposed relative to one another, configured to provide overlay information in a second direction, and include a periodic structure having coarsely segmented elements. Working zones of the first and second regions are diagonally opposed and spatially offset relative to one another, and the working zones of the third and fourth regions are diagonally opposed and spatially offset relative to one another.

Claims

1. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of a multidirectional overlay mark comprising;

a first region having at least two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in a first direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein,

a second region having at least two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in the first direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein,

a third region having at least two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in a second direction that differs from the first direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein,

a fourth region having at least two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in the second direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein,

wherein the working zones of the first and second regions that were generated together are diagonally opposed and spatially offset relative to one another, and

wherein the working zones of the third and fourth regions that were generated together are diagonally opposed and spatially offset relative to one another; and

a computer for analyzing the captured images to determine whether the multidirectional overlay mark has an overlay error.

2. The system as recited in claim 1, wherein the first and second regions are positioned in an opposed relationship on opposite sides of a first axis of the multidirectional overlay mark and wherein the third and fourth regions are positioned in an opposed relationship on opposite sides of a second axis of the multidirectional overlay mark.

3. The system as recited in claim 2, wherein the first axis is a horizontal axis and wherein the second axis is a vertical axis.

4. The system as recited in claim 2, wherein the center of the first and second regions are aligned with one another on the second axis and wherein the center of the third and fourth regions are aligned with one another on the first axis.

5. The system as recited in claim 1 wherein the multidirectional overlay mark is configured for determining the overlay between three separately generated patterns on a single or successive layers of a substrate.

6. The system as recited in claim 1, wherein the first region is disposed above a horizontal axis of the multidirectional overlay mark, wherein the second region is disposed below the horizontal axis of the multidirectional overlay mark, wherein the third region is disposed to the left of a vertical axis of the multidirectional overlay mark, and wherein the fourth region is disposed to the right of the vertical axis of the multidirectional overlay mark.

7. The system as recited in claim 6, wherein the separately generated working zones include a first working zone generated via a first process and a second working zone generated via a second process, and wherein the first region includes the first working zone positioned on a first side and the second working zone positioned on a second side, the second region includes the second working zone positioned on the first side and the first working zone positioned on the second side, the third region includes the first working zone positioned on a first side and the second working zone positioned on a second side, and the fourth region includes the second working zone positioned on a first side and the first working zone positioned on a second side.

8. The system as recited in claim 1, the first and second regions lie crosswise relative to the third and fourth regions.

9. The system as recited in claim 1, wherein the arrangement of working zones in the first, second, third and fourth regions is rotational symmetric at 0, 90, 180, 270 and 360degrees about the center of the multidirectional overlay mark.

10. The system as recited in claim 9, wherein the arrangement of working zones between the first and second regions does not have reflection symmetry, and wherein the arrangement of working zones between the third and fourth regions does not have reflection symmetry.

11. The system as recited in claim 1, wherein each of the four regions includes three separately generated working zones.

12. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of an overlay mark comprising;

a first set of working zones being formed from a first process and having at least two working zones that are diagonally opposed and spatially offset relative to each other, each of the first set of working zones including a periodic structure comprising a plurality of coarsely segmented elements that are each formed from a plurality of finely segmented elements that are evenly divided over the entire coarsely segmented elements of the first set of working zones, and

a second set of working zones being formed from a second process and having at least two working zones that are diagonally opposed and spatially offset relative to each other, each of the second set of working zones including a periodic structure comprising a plurality of coarsely segmented elements that are each formed from a plurality of finely segmented elements that are evenly divided over the entire coarsely segmented elements of the second set of working zones; and

a computer for analyzing the captured images to determine whether the overlay mark has an overlay error.

13. The system of claim 12, wherein the coarsely segmented elements within each periodic structure have substantially the same size and shape and equal spacings.

14. The system of claim 12, wherein the finely segmented elements are etched or deposited vias.

15. The system of claim 12, wherein the finely segmented elements within each of the coarsely segmented elements have substantially the same size and shape and equal spacings.

16. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of a multidirectional overlay mark comprising;

a plurality of first periodic structures formed via a first process and having a first orientation and comprised of a plurality of coarsely segmented elements, wherein the first periodic structures comprise at least two working zones that are diagonally opposed and spatially offset relative to each other;

a plurality of second periodic structures formed via a second process and having the first orientation and comprised of a plurality of coarsely segmented elements, wherein the second periodic structures comprise at least two working zones that are diagonally opposed and spatially offset relative to each other;

a plurality of third periodic structures formed via the first process and having a second orientation and comprised of a plurality of coarsely segmented elements, wherein the third periodic structures comprise at least two working zones that are diagonally opposed and spatially offset relative to each other; and

a plurality of fourth periodic structures formed via the second process and having the second orientation and comprised of a plurality of coarsely segmented elements, wherein the fourth periodic structures comprise at least two working zones that are diagonally opposed and spatially offset relative to each other,

wherein each of the working zones of the first plurality of periodic structures is adjacent to one of the working zones of the second plurality of periodic structures, and

wherein each of the working zones of the third plurality of periodic structures is adjacent to one of the working zones of the fourth plurality of periodic structures; and

a computer for analyzing the captured images to determine whether the multidirectional overlay mark has an overlay error.

17. The system of claim 16, wherein at least one first periodic structure and at least one second periodic structure is positioned on a first side of a first axis of the overlay mark, and at least one first periodic structure and at least one second periodic structure is positioned on a second side of the first axis of the overlay mark, and wherein at least one third periodic structure and at least one fourth periodic structure is positioned on a first side of a second axis of the overlay mark, and at least one third periodic structure and at least one fourth periodic structure is positioned on a second side of the second axis of the overlay mark, the first and second axis being perpendicular to one another and intersecting at the center of the multidirectional overlay mark.

18. The system of claim 17, wherein the first and second periodic structures on opposing sides of the first axis are rotationally symmetric 180 degrees about the center of the multidirectional overlay mark, and wherein the third and fourth periodic structures on opposing sides of the second axis are rotationally symmetric 180 degrees about the center of the multidirectional overlay mark.

19. The system of claim 17, wherein the first and second periodic structures are aligned and juxtaposed next to each other, and wherein the third and fourth periodic structures are aligned and juxtaposed next to each other.

20. The system of claim 19, wherein the first periodic structures on opposing sides of the first axis are diagonally situated relative to each other, the second periodic structures on opposing sides of the first axis are diagonally situated relative to each other, the third periodic structures on opposing sides of the second axis are diagonally situated relative to each other, and the fourth periodic structures on opposing sides of the second axis are diagonally situated relative to each other.

21. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of a multidirectional overlay mark comprising;

a first set of working zones being formed from a first process, and each first set of working zones including a periodic structure of a plurality of elements that are spaced apart within a plurality of lines and configured to convey overlay information in a first direction and a second direction that differs from the first direction; and

a second set of working zones being formed from a second process, and each second set of working zones including a periodic structure of a plurality of elements that are spaced apart within a plurality of lines and configured to convey overlay information in the first direction and the second direction,

wherein the first set, of working zones and second set of working zones are diagonally opposed and spatially offset relative to one another, and

wherein the elements are substantially distributed over an area of the overlay mark; and

a computer for analyzing the captured images to determine whether the multidirectional overlay mark has an overlay error.

22. A system as recited in claim 21, wherein the configuration of the elements in each layer is designed to be rotationally symmetric at 0, 90, 180, 270, and 360 degrees around the center of the overlay mark when there is no overlay error.

23. A system as recited in claim 22, further comprising a center structure positioned in the center of the multidirectional overlay mark.

24. A system as recited in claim 21, wherein the area of the mark corresponds to a field of view of the metrology system.

25. A system recited in claim 21, wherein the multidirectional overlay mark further comprises:

a third set of working zones being formed from a third process, and including a periodic structure of a plurality of elements that are spaced apart within a plurality of lines and configured to convey overlay information in the first direction and the second direction; and

a fourth set of working zones being formed from a fourth process, and including a periodic structure of a plurality of elements that are spaced apart within a plurality of lines and configured to convey overlay information in the first direction and the second direction,

wherein the third set of working zones and fourth set of working zones are diagonally opposed and spatially offset relative to one another and

wherein the elements of the first, second, third, and fourth working zones are substantially distributed over an area of the multidirectional overlay mark.

26. A system as recited in claim 21, wherein the multidirectional overlay mark further comprises a plurality of sets of working zones formed by a plurality of other processes that differ from the first and second processes and are configured to provide overlay information in the first and second directions, wherein the plurality of working zones are each comprised of a plurality of segmented elements that are spaced apart within a plurality of lines and are each arranged in at least four working zones that are juxtaposed in relation to each other and wherein the plurality of working zones of the segmented elements each include pairs of working zones that lie crosswise to each other, wherein the plurality of working zones of the plurality of segmented element sets are distributed across an area of the multidirectional overlay mark.

27. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of a multidirectional overlay mark comprising;

a first quadrant having only two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in a first direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein, and that together substantially fill their quadrant,

a second quadrant having only two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in the first direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein, and that together substantially fill their quadrant,

a third quadrant having only two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in a second direction that differs from the first direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein, and that together substantially fill their quadrant, and

a fourth quadrant having only two separately generated working zones, that are juxtaposed relative to one another, and are configured to provide overlay information in the second direction, and each include a periodic structure comprised of a plurality of coarsely segmented elements positioned therein, and that together substantially fill their quadrant,

wherein each quadrant includes an inner working zone and an outer working zone, the inner working zone being positioned towards the center of the multidirectional overlay mark, the outer working zone being positioned toward the periphery of the multidirectional overlay mark,

wherein the coarsely segmented elements are finely segmented in order to control the contrast of the resultant image in the metrology system; and

a computer for analyzing the captured images to determine whether the multidirectional mark has an overlay error.

28. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of an overlay mark that is separated into four quadrants, each of the four quadrants including only two separately generated working zones that together substantially fill their quadrant, each of the working zones including a periodic structure comprised of a plurality of coarsely segmented elements positioned therein, the two separately generated working zones being juxtaposed relative to one another, and configured to provide overlay information in the same direction, each quadrant including an inner working zone and an outer working zone, the inner working zone being positioned towards the center of the overlay mark, the outer working zone being positioned towards the periphery of the overlay mark; and

a computer for analyzing the captured images to determine whether the overlay mark has an overlay error.

29. The system as recited in claim 28 wherein the working zones substantially fill the perimeter of the overlay mark.

30. The system as recited in claim 28 wherein the working zones are spatially separated from one another so that they do not overlap portions of an adjacent working zone.

32. The system as recited in claim 28 wherein the coarsely segmented elements are parallel lines.

33. The system as recited in claim 28 wherein the plurality of coarsely segmented elements are formed from a plurality of finely segmented elements.

34. The system as recited in claim 33 wherein the finely segmented elements are configured to provide shift information that more closely matches the relative shift between patterns of an integrated circuit formed on each of the two layers of the substrate.

35. The system as recited in claim 28 wherein the first direction corresponds to the X-direction and the second direction corresponds to the Y-direction.

36. The system as recited in claim 28 wherein the coarsely segmented elements located within juxtaposed pairs of working zones within each quadrant are aligned with one another.

37. The system as recited in claim 28 wherein the inner working zone is disposed on a first layer, and wherein the outer working zone is disposed on a second layer.

38. The system as recited in claim 37 wherein the first layer is disposed directly above or below the second layer.

39. The system as recited in claim 28 wherein within the quadrants, the working zones located closer to a center of the overlay mark were generated concurrently with one another and the working zones located further from the center of the overlay mark were generated concurrently with one another.

40. The system as recited in claim 28 wherein the overlay mark has a center and wherein the configuration of the working zones within each quadrant is rotationally symmetric at 0, 90, 180, 270 and 360 degrees around the center of the overlay mark.

41. The system as recited in claim 28 wherein the coarsely segmented lines are formed from a plurality of finely segmented elements configured to mimic one or more device features formed concurrently with the finely segmented elements, the finely segmented elements being symmetrically positioned within each of the coarsely segmented lines.

42. The system as recited in claim 28 wherein the working zones in each quadrant are configured to provide overlay information in the same direction.

43. The system as recited in claim 42 wherein the working zones in opposed quadrants provide overlay information in the same direction.

44. The system as recited in claim 28 wherein the working zones are square shaped.

45. The system as recited in claim 28 wherein the working zones are rectangular shaped.

46. The system as recited in claim 28 wherein the working zones are triangular shaped.

47. The system as recited in claim 28 wherein the working zones within each quadrant are separated by exclusion zones.

48. The system as recited in claim 28 wherein the working zones within each quadrant are adjacent to one another.

49. The system as recited in claim 28 wherein the center of the overlay mark includes a grating pattern.

50. The system as recited in claim 28 wherein the four quadrants include an upper left quadrant, an upper right quadrant, a lower left quadrant and a lower right quadrant, the upper left quadrant including working zones configured to provide overlay information in a first direction, the upper right quadrant including working zones configured to provide overlay information in a second direction that is different than the first direction, the lower right quadrant including working zones configured to provide overlay information in the first direction, the lower left quadrant including working zones configured to provide overlay information in the second direction.

51. The system as recited in claim 28 wherein each quadrant includes only four working zones, at least one providing overlay information in a first direction, at least one providing overlay information in a second direction, the other working zones providing overlay information in either direction.

31. The system as recited in claim rein the working zones are configured to diminish an impact of non-uniformities across the overlay mark on tool and wafer induced shifts.

52. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of an overlay mark that is separated into four quadrants, each of the four quadrants including at least four working zones that together substantially fill their quadrant, each quadrant including a first and second set of working zones and wherein the first set of the working zones are configured to provide overlay in a first direction, and a second set of working zones are configured to provide overlay information in a second direction, the first set of working zones being diagonally opposed with one another, the second set of working zones being diagonally opposed with one another and lying crosswise relative the first set of working zones, each of the working zones including a periodic structure comprised of a plurality of coarsely segmented elements positioned therein; and

a computer for analyzing the captured images to determine whether the overlay mark has an overlay error.

53. The system as recited in claim 52 wherein at least one of the working zones within each quadrant is generated separately from the other working zones in the quadrant.

54. The system as recited in claim 52 wherein at least two of the working zones within each quadrant e generated together, but separately from the other working zones in the quadrant.

55. The system as recited in claim 52 wherein the working zones in each set of working zones are separately generated.

56. The system as recited in claim 52 wherein the working zones in each set of working zones are generated together, but separately from other set of working zones.

57. The system as recited in claim 52 wherein the configuration of working zones in at least two of the quadrants is the same.

58. The system as recited in claim 52 wherein the configuration of working zones between all of the quadrants is different.

59. The system as recited in claim 52 wherein the overlay mark has a center and wherein the configuration of the working zones within each quadrant is rotationally symmetric at 0, 90, 180, 270 and 360 degrees around the center of the overlay mark.

60. The system as recited in claim 52 wherein the overlay mark has a center and wherein the configuration of the working zones within each quadrant is rotationally symmetric at 180 degrees around the center of the overlay mark.

61. A metrology system for determining the overlay between at least two separately generated patterns on a single or successive layers of a substrate, the system comprising:

an optical assembly for capturing images of a multidirectional overlay mark that is separated into four quadrants, each of the four quadrants including at least three separately generated working zones that are juxtaposed relative to one another and that together substantially fill the quadrant, the upper left quadrant including working zones configured to provide overlay information in a first direction, the upper right quadrant including working zones configured to provide overlay information in a second direction that is different than the first direction, the lower right quadrant including working zones configured to provide overlay information in the first direction, and the lower left quadrant including working zones configured to provide overlay information in the second direction, each of the working zones including a periodic structure comprised of a plurality of coarsely segmented elements positioned therein; and

a computer for analyzing the captured images to determine whether the multidirectional overlay mark has an overlay error.

62. The system as recited in claim 61 wherein the coarsely segmented elements of the periodic structures located within working zones of the same quadrant are aligned with one another.

63. The system as recited in claim 61 wherein the coarsely segmented elements are formed from a plurality of finely segmented elements configured to mimic one or more device features formed on the substrate with the plurality of finely segmented elements, the plurality of finely segmented elements being symmetrically positioned within each of the coarsely segmented lines.

64. The system as recited in claim 61 wherein the various separately generated working zones are oriented similarly within each of the quadrants such that each quadrant is rotationally symmetric at 0, 90, 180, 270 and 360 degrees around a center of the multidirectional overlay mark.