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Lithographic apparatus and device manufacturing method

  • US 9,703,210 B2
  • Filed: 12/29/2014
  • Issued: 07/11/2017
  • Est. Priority Date: 12/20/2004
  • Status: Expired due to Fees
First Claim
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1. A lithographic apparatus, comprising:

  • a movable table;

    a projection system configured to project a patterned beam of radiation onto a substrate, the projection system comprising a final optical element adjacent the substrate;

    a liquid supply system configured to provide an immersion liquid to a space between the final optical element of the projection system and the table; and

    an outlet configured to remove immersion liquid from the space, wherein the outlet is further configured to supply a cleaning fluid, of different composition than the immersion liquid, to the space.

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