Lithographic apparatus and device manufacturing method

• US 9,703,210 B2
• Filed: 12/29/2014
• Issued: 07/11/2017
• Est. Priority Date: 12/20/2004
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Stavenga, Marco Koert, Grouwstra, Cedric Desire, Van Der Hoeven, Jan Cornelis, Baselmans, Johannes Jacobus Matheus, Donders, Sjoerd Nicolaas Lambertus, Mertens, Jeroen Johannes Sophia Maria, Streefkerk, Bob, Jansen, Hans, Hoogendam, Christiaan Alexander, Mulkens, Johannes Catharinus Hubertus
• Primary Examiner(s): ASFAW, MESFIN T
• Application Number:
  US14/584,826
• Publication Number:
  US 20150116675A1
• Time in Patent Office: 925 Days
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/70925 Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning

Abstract

A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.

Claims

1. A lithographic apparatus, comprising:

a movable table;

a projection system configured to project a patterned beam of radiation onto a substrate, the projection system comprising a final optical element adjacent the substrate;

a liquid supply system configured to provide an immersion liquid to a space between the final optical element of the projection system and the table; and

an outlet configured to remove immersion liquid from the space, wherein the outlet is further configured to supply a cleaning fluid, of different composition than the immersion liquid, to the space.

2. The apparatus according to claim 1, further comprising an ultrasonic transmitter configured to turn liquid in the space into an ultrasonic cleaning liquid.

3. The apparatus according to claim 2, wherein the ultrasonic transmitter is attached to the table.

4. The apparatus according to claim 1, further comprising a cleaning device attached to the table.

5. The apparatus according to claim 1, comprising a further outlet configured to remove at least part of the cleaning fluid.

6. The apparatus according to claim 5, wherein the further outlet is at or adjacent a bottom surface of a liquid confinement structure configured to at least partly confine the immersion liquid in the space such that the immersion liquid is in direct contact with the final optical element and the liquid confinement structure.

7. The apparatus according to claim 5, further comprising a liquid confinement structure configured to at least partly confine the immersion liquid in the space such that the immersion liquid is in direct contact with the final optical element and the liquid confinement structure, the liquid confinement structure having the outlet and the further outlet.

8. The apparatus according to claim 1, wherein the cleaning fluid comprises heptane, hexane, alcohol or acetone and further comprising a source having the heptane, hexane, alcohol or acetone.

9. The apparatus according to claim 1, further comprising a control system configured to cause supply of immersion liquid to contact cleaning fluid supplied to the space.

10. The apparatus according to claim 1, further comprising a control system configured to cause supply of radiation from the projection system during a period of time that the cleaning fluid is in the space.

11. A device manufacturing method, comprising:

projecting a patterned beam of radiation, using a projection system, onto a substrate;

providing an immersion liquid to a space between the projection system and the substrate;

removing immersion liquid from the space using an outlet; and

supplying a cleaning fluid of different composition than the immersion liquid, to the space using the outlet.

12. The method according to claim 11, wherein the cleaning fluid comprises heptane, hexane, alcohol or acetone.

13. The method according to claim 11, further comprising removing at least part of the cleaning fluid using a further outlet.

14. The method according to claim 13, further comprising at least partly confining the immersion liquid in the space using a liquid confinement structure such that the immersion liquid is in direct contact with the final optical element and a bottom surface of the liquid confinement structure and wherein the further outlet is at or adjacent a bottom surface of the liquid confinement structure.

15. The method according to claim 13, further comprising at least partly confining the immersion liquid in the space using a liquid confinement structure such that the immersion liquid is in direct contact with the final optical element and the liquid confinement structure and wherein the liquid confinement structure has the outlet and the further outlet.

16. A lithographic apparatus, comprising:

a projection system configured to project a patterned beam of radiation onto a radiation-sensitive substrate, the projection system comprising a final optical element adjacent the substrate;

a liquid supply system configured to provide a liquid to a space between the projection system and the substrate, the liquid supply system comprising a liquid confinement structure configured to at least partly confine the liquid in the space such that the liquid is in direct contact with the final optical element and the liquid confinement structure, the liquid confinement structure having an outlet configured to remove liquid from the space, the outlet being in a bottom surface of the liquid confinement structure;

an outlet to supply a cleaning fluid different from the liquid, the outlet to supply the cleaning fluid being part of the liquid confinement structure; and

a structure movable with respect to the liquid confinement structure, the structure having a flat upper surface of at least same width as a cross-sectional width of the outlet and the structure having a cleaning device configured to clean a surface of the final optical element, of the liquid confinement structure, or of both the final optical element and the liquid confinement structure, the cleaning device located in or under the upper surface.

17. The apparatus according to claim 16, wherein the cleaning device comprises an ultrasonic transmitter.

18. The apparatus according to claim 16, wherein the cleaning device further comprises an outlet, in the upper surface, to supply cleaning fluid.