×

Micromechanical pressure sensor device and corresponding manufacturing method

  • US 9,709,451 B2
  • Filed: 01/08/2015
  • Issued: 07/18/2017
  • Est. Priority Date: 01/14/2014
  • Status: Active Grant
First Claim
Patent Images

1. A micromechanical pressure sensor device, comprising:

  • an MEMS wafer having a front side and a rear side;

    a first micromechanical functional layer formed above the front side of the MEMS wafer;

    a second micromechanical functional layer formed above the first micromechanical functional layer;

    a deflectable first pressure detection electrode formed in one of the first and second micromechanical functional layers;

    a fixed second pressure detection electrode formed spaced apart from and opposite the deflectable first pressure detection electrode; and

    an elastically deflectable diaphragm area formed above the front side of the MEMS wafer, wherein an external pressure is applied to the diaphragm area via an access opening in the MEMS wafer, wherein the wafer is joined to the deflectable first pressure detection electrode via a plug-like joining area, and wherein the deflectable first pressure detection electrode is spatially separated from the elastically deflectable diaphragm in a vertical direction by a distance delimited by the plug-like joining area.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×