Method and apparatus for maintaining parallelism of layers and/or achieving desired thicknesses of layers during the electrochemical fabrication of structures
First Claim
1. In a batch fabrication process for forming a plurality of multi-layer three-dimensional structures including:
- (a) forming and adhering a first multi-material layer to a substrate;
(b) forming and adhering one or more successive multi-material layers to the first multi-material layer or to a previously formed successive multi-material layer, wherein each multi-material layer comprises planarized patterns of at least one deposited structural material and at least one deposited sacrificial material, and (c) after formation of the plurality of multi-material layers separating the deposited sacrificial material from the deposited structural material to reveal the plurality of multi-layer three-dimensional structures formed from the at least one deposited structural material, wherein the improvement comprises;
(i) during formation of a given multi-material layer, and after deposition of the at least one deposited structural material and the at least one deposited sacrificial material for the given layer and with one or more measurement pads existing on a surface of the substrate or on a surface of a previously formed multi-material layer, mounting the substrate to a fixture in a fly cutting machine;
(ii) while the substrate is mounted to the fixture, subjecting the at least one deposited structural material and at least one deposited sacrificial material, but not the one or more measurement pads, to a rotating cutting tool to planarize a surface of the at least one deposited structural material and at least one deposited sacrificial material for the given multi-material layer and to bring the height of the at least one deposited structural material and at least one deposited sacrificial material for the given multi-material layer to a reduced level;
(iii) after the planarization operation, locating a measurement device in contact with the one or more measurement pads and locating the measurement device in contact with one or more points on at least one of the at least one deposited structural material and at least one deposited sacrificial material for the given layer that were subject to the planarization operation;
(iv) extracting data from the measurement device concerning a measured height of at least one point relative to a reference point or plane that is based at least in part on the one or more measurement pads;
(v) comparing the measured height to a target structure height for the given layer; and
(vi) if the measured height and the target structure height are not within a desired tolerance, repeating operations (ii)-(v) until the measured height and target structure height are with the desired tolerance.
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Abstract
Some embodiments of the present invention provide processes and apparatus for electrochemically fabricating multilayer structures (e.g. mesoscale or microscale structures) with improved endpoint detection and parallelism maintenance for materials (e.g. layers) that are planarized during the electrochemical fabrication process. Some methods involve the use of a fixture during planarization that ensures that planarized planes of material are parallel to other deposited planes within a given tolerance. Some methods involve the use of an endpoint detection fixture that ensures precise heights of deposited materials relative to an initial surface of a substrate, relative to a first deposited layer, or relative to some other layer formed during the fabrication process. In some embodiments planarization may occur via lapping while other embodiments may use a diamond fly cutting machine.
30 Citations
20 Claims
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1. In a batch fabrication process for forming a plurality of multi-layer three-dimensional structures including:
- (a) forming and adhering a first multi-material layer to a substrate;
(b) forming and adhering one or more successive multi-material layers to the first multi-material layer or to a previously formed successive multi-material layer, wherein each multi-material layer comprises planarized patterns of at least one deposited structural material and at least one deposited sacrificial material, and (c) after formation of the plurality of multi-material layers separating the deposited sacrificial material from the deposited structural material to reveal the plurality of multi-layer three-dimensional structures formed from the at least one deposited structural material, wherein the improvement comprises;(i) during formation of a given multi-material layer, and after deposition of the at least one deposited structural material and the at least one deposited sacrificial material for the given layer and with one or more measurement pads existing on a surface of the substrate or on a surface of a previously formed multi-material layer, mounting the substrate to a fixture in a fly cutting machine; (ii) while the substrate is mounted to the fixture, subjecting the at least one deposited structural material and at least one deposited sacrificial material, but not the one or more measurement pads, to a rotating cutting tool to planarize a surface of the at least one deposited structural material and at least one deposited sacrificial material for the given multi-material layer and to bring the height of the at least one deposited structural material and at least one deposited sacrificial material for the given multi-material layer to a reduced level; (iii) after the planarization operation, locating a measurement device in contact with the one or more measurement pads and locating the measurement device in contact with one or more points on at least one of the at least one deposited structural material and at least one deposited sacrificial material for the given layer that were subject to the planarization operation; (iv) extracting data from the measurement device concerning a measured height of at least one point relative to a reference point or plane that is based at least in part on the one or more measurement pads; (v) comparing the measured height to a target structure height for the given layer; and (vi) if the measured height and the target structure height are not within a desired tolerance, repeating operations (ii)-(v) until the measured height and target structure height are with the desired tolerance. - View Dependent Claims (2, 3, 4, 5, 6, 8, 9, 10, 11, 12, 13)
- (a) forming and adhering a first multi-material layer to a substrate;
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7. In a batch fabrication process for forming a plurality of multi-layer three-dimensional structures including:
- (a) forming and adhering a first multi-material layer to a substrate;
(b) forming and adhering one or more successive multi-material layers to the first multi-material layer or to a previously formed successive multi-material layer, wherein each multi-material layer comprises planarized patterns of at least one deposited structural material and at least one deposited sacrificial material, and (c) after formation of the plurality of multi-material layers separating the deposited sacrificial material from the deposited structural material to reveal the plurality of multi-layer three-dimensional structures formed from the at least one deposited structural material, wherein the improvement comprises;(i) during formation of a given multi-material layer, and after deposition of the at least one deposited structural material and the at least one deposited sacrificial material for the given layer and with one or more measurement pads existing on the substrate or a previously formed multi-material layer, subjecting the at least one deposited structural material and the at least one deposited sacrificial material of the given multi-material layer to a planarization operation without subjecting the one or more measurement pads to planarization; (ii) after the planarization operation, locating at least one measurement probe in contact with the one or more measurement pads and locating the at least one measurement probe in contact with one or more points on at least one of the at least one deposited structural material and the at least one deposited sacrificial material for the given layer that were subject to the planarization operation; (iii) extracting data from the measurement probe concerning a measured height of the at least one deposited structural material and the at least one deposited sacrificial material for the given layer relative to a reference point or plane based on the at least one or more measurement pads; (iv) comparing the measured height to a target structure height for the given layer; and (v) if the measured height and target structure height are not within a desired tolerance, repeating operations (i)-(iv) until the measured height and target height or layer thickness are within the desired tolerance. - View Dependent Claims (14, 15, 16, 17, 18)
- (a) forming and adhering a first multi-material layer to a substrate;
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19. A batch fabrication process for forming a plurality of multi-layer three-dimensional structures, the process comprising:
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(a) forming a plurality of multi-material layers, with a first multi-material layer formed on and adhered to a substrate and at least one subsequent multi-material layer formed on and adhered to a previously formed multi-material layer to the plurality of multi-layer three-dimensional structures, and wherein each multi-material layer comprises patterns of at least two deposited materials and wherein during formation of a given one of the multi-material layers one or more measurement pads exist on the substrate or a previously formed multi-material layer, and wherein the given multi-material is selected from the group consisting of the first multi-material layer and the at least one subsequent multi-material layer; (b) subjecting the at least two deposited materials of the given multi-material layer to a planarization operation, without subjecting the one or more measurement pads to planarization, to provide a planarized surface of the at least two materials; and (c) subjecting the planarized surface to inspection to determine at least two parameters selected from the group consisting of (1) a height of the deposition relative to the one or more measurement pads, (2) a planarity of the deposition, and (3) an orientation of the deposition relative to a desired reference defined at least in part by the one or more measurement pads. - View Dependent Claims (20)
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Specification