Method for adjusting a projection objective

• US 9,715,177 B2
• Filed: 08/06/2014
• Issued: 07/25/2017
• Est. Priority Date: 04/09/2004
• Status: Active Grant

• Current Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Original Assignee: CARL Zeiss SMT GmbH (Carl-Zeiss-Stiftung)
• Inventors: Emer, Wolfgang
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US14/453,196
• Publication Number:
  US 20140347647A1
• Time in Patent Office: 1,084 Days
• Field of Search: 355 52, 355 53, 355 55, 355 67- 71, 250548, 356399-401, 430311
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70191 Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
• CPC Class Codes: G03F 7/70216 Mask projection systems

Abstract

A projection objective having a number of adjustable optical elements is optimized with respect to a number of aberrations by specifying a set of parameters describing imaging properties of the objective, each parameter in the set having an absolute value at each of a plurality of field points in an image plane of the projection objective. At least one of the optical elements is adjusted such that for each of the parameters in the set, the field maximum of its absolute value is minimized.

Claims

1. A method for adjusting a projection exposure machine used for microlithography in the fabrication of semiconductor components and having an illumination device for providing an illumination beam and a projection objective comprising a plurality of optical elements in the path of the illumination beam for projecting an image of structures on a reticle onto a substrate at an image plane, said method comprising the steps of:

(a) measuring initial values for two or more parameters at each of a plurality of points in a field at the image plane, each parameter corresponding to a respective imaging property of the projection objective, wherein for each parameter there are one or more corresponding points in the field having an initial value that has a largest absolute value compared to the initial values of the other points in the field; and

;

(b) adjusting the reticle and/or at least one of the optical elements of the projection objective such that, for each of the parameters, the largest absolute value for the points in the field is reduced compared to the initial values.

2. The method of claim 1 wherein at least one of said parameters comprises individual Zernike coefficients describing wave aberrations of an objective pupil of the projection objective.

3. The method of claim 1 wherein at least one of said parameters comprises a linear combination of Zernike coefficients.

4. The method of claim 1 wherein at least one of said parameters comprises an average of Zernike coefficients over a plurality of points in the field lying within a portion of the image plane defined by a scanner slit, said plurality of points lying along a line oriented in a scanning direction.

5. The method of claim 4 wherein said average is a weighted average.

6. The method of claim 1 wherein said parameters includes at least one parameter describing a centrable aberration, and said adjusting step comprises the step of tilting a reticle of the projection objective to adjust for said centrable aberration.

7. The method of claim 6 wherein said adjusting step comprises at least one of the following steps:

(i) displacing at least one of the optical elements in a direction perpendicular to an optical axis of the projection objective, and

(ii) tilting at least one of the optical elements in a direction perpendicular to said optical axis of the projection objective.

8. The method of claim 6 wherein said parameters further includes at least one parameter describing a tunable aberration, and said adjusting step comprises the step of adjusting at least one of the optical elements to adjust for said tunable aberration and said centrable aberration jointly.

9. The method of claim 8 wherein said adjusting step comprises at least one of the following steps:

(i) displacing at least one of the optical elements in a direction along the optical axis of the projection objective;

(ii) changing the wavelength of illumination of the projection exposure machine;

(iii) changing a temperature within the projection exposure machine;

(iv) changing an air pressure within the projection exposure machine, and

(v) changing the composition of a purge gas surrounding the optical elements.

10. The method of claim 1 further comprising applying a distortion optimization dependent upon an illumination setting of the projection exposure machine.

11. The method of claim 1 wherein said adjusting step is performed according to a nonlinear method.

12. The method of claim 11 wherein the nonlinear method comprising a nonlinear optimization of the parameter values.

13. The method of claim 12 wherein the nonlinear optimization comprises a nonlinear min-max optimization.