AMOLED backplane structure and manufacturing method thereof
First Claim
1. A manufacturing method of an active matrix organic light emitting display (AMOLED) backplane, comprising the following steps:
- (1) manufacturing a thin-film transistor (TFT) substrate and forming a corrugation structure during the manufacturing of the TFT substrate, wherein the corrugation structure comprises a plurality of raised sections and a recessed section between every two adjacent ones of the raised sections;
(2) coating organic photoresist on the TFT substrate that comprises the corrugation structure formed thereon to form a planarization layer in such a way that an upper surface of a portion of the planarization layer corresponding to and located above the corrugation structure comprises a curved configuration corresponding to the corrugation structure;
(3) forming a pixel electrode on the planarization layer in such a way that the pixel electrode shows a curved configuration; and
(4) forming, in sequence, a pixel definition layer and a photo spacer on the pixel electrode and the planarization layer;
the pixel definition layer comprising an opening to expose the curved configuration of the pixel electrode.
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Abstract
A manufacturing method of an AMOLED backplane includes manufacturing a TFT substrate and forming a corrugation structure on the TFT substrate, which includes raised sections and recessed sections alternating each other; coating organic photoresist on the TFT substrate that includes the corrugation structure formed thereon to form a planarization layer in such a way that an upper surface of a portion of the planarization layer corresponding to and located above the corrugation structure includes a curved configuration corresponding to the corrugation structure; forming a pixel electrode on the planarization layer in such a way that the pixel electrode shows a curved configuration; and forming, in sequence, a pixel definition layer that has an opening to expose the curved configuration and a photo spacer on the pixel electrode and the planarization layer.
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Citations
10 Claims
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1. A manufacturing method of an active matrix organic light emitting display (AMOLED) backplane, comprising the following steps:
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(1) manufacturing a thin-film transistor (TFT) substrate and forming a corrugation structure during the manufacturing of the TFT substrate, wherein the corrugation structure comprises a plurality of raised sections and a recessed section between every two adjacent ones of the raised sections; (2) coating organic photoresist on the TFT substrate that comprises the corrugation structure formed thereon to form a planarization layer in such a way that an upper surface of a portion of the planarization layer corresponding to and located above the corrugation structure comprises a curved configuration corresponding to the corrugation structure; (3) forming a pixel electrode on the planarization layer in such a way that the pixel electrode shows a curved configuration; and (4) forming, in sequence, a pixel definition layer and a photo spacer on the pixel electrode and the planarization layer; the pixel definition layer comprising an opening to expose the curved configuration of the pixel electrode. - View Dependent Claims (2)
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3. A manufacturing method of an active matrix organic light emitting display (AMOLED) backplane, wherein the AMOLED backplane comprises multiple sub-pixels arranged in an array and each of the sub-pixels comprises:
- a thin-film transistor (TFT) substrate, the manufacturing method comprising the following steps;
(1) manufacturing the TFT substrate such that a corrugation structure is formed on the TFT substrate and comprises a plurality of raised sections and a recessed section between every two adjacent ones of the raised sections; (2) coating organic photoresist on the TFT substrate that comprises the corrugation structure formed thereon to form a planarization layer in such a way that an upper surface of a portion of the planarization layer corresponding to and located above the corrugation structure comprises a curved configuration corresponding to the corrugation structure; (3) forming a pixel electrode on the planarization layer in such a way that the pixel electrode shows a curved configuration; and (4) forming, in sequence, a pixel definition layer and a photo spacer on the pixel electrode and the planarization layer, wherein the pixel definition layer comprises an opening to expose the curved configuration of the pixel electrode. - View Dependent Claims (4, 5, 6, 7, 8, 9, 10)
- a thin-film transistor (TFT) substrate, the manufacturing method comprising the following steps;
Specification