Cleaning composition
First Claim
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1. A hard surface cleaning composition comprising:
- a) from about 1% to about 60% by weight of the composition of a surfactant system, wherein said surfactant system comprises an alkyl ethoxy sulfate and amphoteric/zwitterionic system wherein the amphoteric surfactant to zwitterionic surfactant weight ratio is from about 2;
1 to about 1;
2; and
wherein said amphoteric surfactant comprises an alkyl dimethyl amine oxide;
b) from about 0.1% to about 10% by weight of the composition of a cleaning amine of Formula(I);
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Abstract
A hard surface cleaning composition comprising:
- a) from 1% to 60% by weight of the composition of a surfactant system; and
- b) from 0.1% to 10% by weight of the composition of a cleaning amine of Formula (I):
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- wherein the radicals R1, R2, R3, R4 and R5 are independently selected from NH2, —H, linear or branched alkyl or alkenyl having from 1 to 10 carbon atoms and n is from 0 to 3 and wherein at least one of the radicals is NH2.
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25 Citations
9 Claims
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1. A hard surface cleaning composition comprising:
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a) from about 1% to about 60% by weight of the composition of a surfactant system, wherein said surfactant system comprises an alkyl ethoxy sulfate and amphoteric/zwitterionic system wherein the amphoteric surfactant to zwitterionic surfactant weight ratio is from about 2;
1 to about 1;
2; and
wherein said amphoteric surfactant comprises an alkyl dimethyl amine oxide;b) from about 0.1% to about 10% by weight of the composition of a cleaning amine of Formula(I); - View Dependent Claims (2, 3, 4, 5, 6, 7, 9)
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8. A hard surface cleaning composition comprising:
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a) from about 1% to about 60% by weight of the composition of a surfactant system, wherein said surfactant system comprises an alkyl ethoxylated sulfate surfactant, an alkyl ethoxylated nonionic surfactant and an amphoteric/zwitterionic system wherein the amphoteric surfactant to zwitterionic surfactant weight ratio is from about 2;
1 to about 1;
2; and
wherein said amphoteric surfactant comprises an alkyl dimethyl amine oxide;b) from about 0.1% to about 10% by weight of the composition of a cleaning amine of Formula(I);
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Specification