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Microbolometer devices in CMOS and BiCMOS technologies

  • US 9,726,547 B2
  • Filed: 11/25/2014
  • Issued: 08/08/2017
  • Est. Priority Date: 11/25/2014
  • Status: Active Grant
First Claim
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1. A method of forming a microbolometer unit cell, comprising:

  • damaging a portion of a substrate to form a damaged region of the substrate;

    forming infrared (IR) absorbing material on the damaged region; and

    isolating the IR absorbing material by forming a cavity underneath the IR absorbing material.

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