System, structure, and method of manufacturing a semiconductor substrate stack
First Claim
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1. A method comprising:
- etching a recess in a first side of a first substrate, the recess extending partially into the first substrate, the recess adjacent an active region in the first side of the first substrate;
lining the recess with a dielectric material;
filling the lined recess with a first material;
forming contacts over the first side of the first substrate with at least one contact coupled to the active region and at least another contact over and aligned with the first material in the recess;
forming an interconnect layer over the contacts and coupled to the at least one contact and the at least another contact;
forming a bond pad over the interconnect layer;
thinning a second side of the first substrate to expose the dielectric material;
removing the first material from the recess; and
filling the recess with a conductive material, the conductive material in the recess being coupled to the at least another contact.
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Abstract
A method of manufacturing a semiconductor substrate structure for use in a semiconductor substrate stack system is presented. The method includes a semiconductor substrate which includes a front-face, a backside, a bulk layer, an interconnect layer that includes a plurality of inter-metal dielectric layers sandwiched between conductive layers, a contact layer that is between the bulk layer and the interconnect layer, and a TSV structure commencing between the bulk layer and the contact layer and terminating at the backside of the substrate. The TSV structure is electrically coupled to the interconnect layer and the TSV structure is electrically coupled to a bonding pad on the backside.
103 Citations
21 Claims
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1. A method comprising:
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etching a recess in a first side of a first substrate, the recess extending partially into the first substrate, the recess adjacent an active region in the first side of the first substrate; lining the recess with a dielectric material; filling the lined recess with a first material; forming contacts over the first side of the first substrate with at least one contact coupled to the active region and at least another contact over and aligned with the first material in the recess; forming an interconnect layer over the contacts and coupled to the at least one contact and the at least another contact; forming a bond pad over the interconnect layer; thinning a second side of the first substrate to expose the dielectric material; removing the first material from the recess; and filling the recess with a conductive material, the conductive material in the recess being coupled to the at least another contact. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method comprising:
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forming an active region in a first surface of a first substrate; etching a recess from the first surface of the first substrate into the first substrate adjacent the active region; lining the recess with a dielectric material; filling the lined recess with a sacrificial material, the sacrificial material having a different material composition than the dielectric material; forming contacts over the first surface of the first substrate, a first contact being coupled to the active region and a second contact over and aligned with the sacrificial material; forming an interconnect layer over and coupled to the first and second contacts; forming a bond pad over the interconnect layer, the bond pad being coupled to at least one of the first contact and the second contact; bonding the first substrate to a second substrate using the bond pad; thinning the first substrate from a second surface of the first substrate, the second surface being opposite the first surface, the thinning step exposing a portion of the dielectric material lining the recess; removing the sacrificial material from the recess from the second surface of the first substrate; and filling the recess with a conductive material to form a through substrate via (TSV) in the first substrate, the second contact being directly coupled to the conductive material of the TSV. - View Dependent Claims (9, 10)
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11. A method comprising:
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etching a first side of a first substrate to create a recess adjacent an active region in the first side of the first substrate, at a step before contact etch; forming a liner layer lining sidewalls and a bottom of the recess, the liner layer comprising a dielectric material; filling the lined recess with a first material; forming a contact layer over the first side of the first substrate, the contact layer comprising a plurality of contacts, a first contact of the plurality of contacts being coupled to the active region, a second contact of the plurality of contacts being aligned with the first material in the recess; forming an interconnect layer over the contact layer, the interconnect layer being coupled to the first contact and the second contact; forming a bond pad over the interconnect layer, the bond pad being coupled to at least one of the plurality of contacts; thinning a second side of the first substrate to expose the line layer; removing the first material from the recess; and filling the recess with a conductive material to form a through substrate via (TSV), the TSV coupled to the second contact. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20, 21)
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Specification