Gas injection apparatus and substrate processing apparatus using same
First Claim
1. A gas injection device comprising:
- a plurality of gas injection units disposed above a plurality of substrate seat parts on a support plate rotatably disposed within a chamber to support a plurality of substrates, wherein the plurality of substrate seat parts are disposed on an upper portion of the support plate along a circumference direction of the support plate, wherein the plurality of gas injection units are disposed along the circumference direction with respect to a center point of the support plate to inject a process gas onto the substrates, and wherein an area covered by the plurality of gas injection units is larger than an area of the upper portion of the support plate,wherein each of the plurality of gas injection units comprises;
a top plate having a plurality of inlets formed therein and arranged along a radial direction of the support plate, wherein the plurality of inlets are configured to introduce the process gas; and
an injection plate having a linear portion of a first groove recessed within an upper portion thereof and extending linearly along a radius direction of the support plate, wherein the injection plate is disposed under the top plate and attached to the top plate to define a gas diffusion space between the linear portion of the first groove in the injection plate and a bottom surface of the top plate, wherein a plurality of first gas injection holes are disposed along the linear portion of the first groove and configured to inject the process gas introduced through the at least one of the plurality of inlets and diffused in the gas diffusion space onto the substrate, and wherein a diameter of the first gas injection holes increases linearly outward from a central side of the support plate such that the first gas injection holes have at least three different diameters,wherein, in at least one gas injection unit of the plurality of gas injection units, the process gas is introduced into the gas diffusion space at a plurality of points,wherein an amount of process gas introduced through the plurality of inlets disposed adjacent to the central side of the support plate is less than an amount of process gas introduced through the inlets disposed at a peripheral side of the support plate, wherein the central side and the peripheral side are separated from one another along the radial direction of the support plate, andwherein a circumference portion of a first groove is recessed in the upper portion of injection plate, wherein the circumference portion of the first groove extends from an end of the linear portion of the first groove along the circumference direction of the support plate to define a second gas diffusion space between the circumference portion of the first groove in the injection plate and a bottom surface of the top plate, and wherein a plurality of second gas injection holes are disposed along the circumference portion of the first groove.
2 Assignments
0 Petitions
Accused Products
Abstract
Provided are a gas injection device and substrate processing apparatus using the same. The gas injection device includes a plurality of gas injection units disposed above a substrate support part rotatably disposed within a chamber to support a plurality of substrates, the plurality of gas injection units being disposed along a circumference direction with respect to a center point of the substrate support part to inject a process gas onto the substrates. Wherein each of the plurality of gas injection units includes a top plate in which an inlet configured to introduce the process gas is provided and an injection plate disposed under the top plate to define a gas diffusion space between the injection plate and the top plate along a radius direction of the substrate support part, the injection plate having a plurality of gas injection holes under the gas diffusion space to inject the process gas introduced through the inlet and diffused in the gas diffusion space onto the substrate. In at least one gas injection unit of the plurality of gas injection units, the process gas is introduced into the gas diffusion space at a plurality of points.
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Citations
13 Claims
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1. A gas injection device comprising:
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a plurality of gas injection units disposed above a plurality of substrate seat parts on a support plate rotatably disposed within a chamber to support a plurality of substrates, wherein the plurality of substrate seat parts are disposed on an upper portion of the support plate along a circumference direction of the support plate, wherein the plurality of gas injection units are disposed along the circumference direction with respect to a center point of the support plate to inject a process gas onto the substrates, and wherein an area covered by the plurality of gas injection units is larger than an area of the upper portion of the support plate, wherein each of the plurality of gas injection units comprises; a top plate having a plurality of inlets formed therein and arranged along a radial direction of the support plate, wherein the plurality of inlets are configured to introduce the process gas; and an injection plate having a linear portion of a first groove recessed within an upper portion thereof and extending linearly along a radius direction of the support plate, wherein the injection plate is disposed under the top plate and attached to the top plate to define a gas diffusion space between the linear portion of the first groove in the injection plate and a bottom surface of the top plate, wherein a plurality of first gas injection holes are disposed along the linear portion of the first groove and configured to inject the process gas introduced through the at least one of the plurality of inlets and diffused in the gas diffusion space onto the substrate, and wherein a diameter of the first gas injection holes increases linearly outward from a central side of the support plate such that the first gas injection holes have at least three different diameters, wherein, in at least one gas injection unit of the plurality of gas injection units, the process gas is introduced into the gas diffusion space at a plurality of points, wherein an amount of process gas introduced through the plurality of inlets disposed adjacent to the central side of the support plate is less than an amount of process gas introduced through the inlets disposed at a peripheral side of the support plate, wherein the central side and the peripheral side are separated from one another along the radial direction of the support plate, and wherein a circumference portion of a first groove is recessed in the upper portion of injection plate, wherein the circumference portion of the first groove extends from an end of the linear portion of the first groove along the circumference direction of the support plate to define a second gas diffusion space between the circumference portion of the first groove in the injection plate and a bottom surface of the top plate, and wherein a plurality of second gas injection holes are disposed along the circumference portion of the first groove. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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Specification