Method for etching organic film
First Claim
1. A method for etching an organic film of an object to be processed (“
- workpiece”
) which includes a hard mask on the organic film, the method comprising;
generating plasma of a processing gas containing a hydrogen gas and a nitrogen gas within a processing container of a plasma processing apparatus that accommodates the workpiece, wherein a partial region of the organic film that is exposed from the hard mask is changed into a denatured region;
generating plasma of a rare gas within the processing container, wherein the denatured region is removed and a substance released from the denatured region is deposited on a surface of the hard mask; and
alternately repeating the generating the plasma of the processing gas and the generating the plasma of the rare gas.
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Accused Products
Abstract
Disclosed is a method for etching an organic film. Plasma of a processing gas containing hydrogen gas and nitrogen gas is generated within a processing container of a plasma processing apparatus that accommodates a workpiece. A partial region of the organic film that is exposed from a hard mask is changed into a denatured region by the generation of the plasma of the processing gas. Subsequently, plasma of a rare gas is generated within the processing container. The denatured region is removed by the plasma of the rare gas, and a substance released from the denatured region is deposited on the surface of the hard mask. In this method, the generation of the plasma of the processing gas and the generation of the plasma of the rare gas are repeated alternately.
16 Citations
5 Claims
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1. A method for etching an organic film of an object to be processed (“
- workpiece”
) which includes a hard mask on the organic film, the method comprising;generating plasma of a processing gas containing a hydrogen gas and a nitrogen gas within a processing container of a plasma processing apparatus that accommodates the workpiece, wherein a partial region of the organic film that is exposed from the hard mask is changed into a denatured region; generating plasma of a rare gas within the processing container, wherein the denatured region is removed and a substance released from the denatured region is deposited on a surface of the hard mask; and alternately repeating the generating the plasma of the processing gas and the generating the plasma of the rare gas. - View Dependent Claims (2, 3, 4, 5)
- workpiece”
Specification