Compound semiconductor transistor with gate overvoltage protection
First Claim
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1. A transistor device, comprising:
- a compound semiconductor body;
a drain disposed in the compound semiconductor body;
a source disposed in the compound semiconductor body and spaced apart from the drain by a channel region;
a gate operable to control the channel region; and
a gate overvoltage protection device electrically connected between the source and the gate and comprising alternating regions of p-type and n-type silicon disposed in a first trench formed in the compound semiconductor body.
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Abstract
A transistor device includes a compound semiconductor body, a drain disposed in the compound semiconductor body and a source disposed in the compound semiconductor body and spaced apart from the drain by a channel region. A gate is provided for controlling the channel region. The transistor device further includes a gate overvoltage protection device connected between the source and the gate, the gate overvoltage protection device including p-type and n-type silicon-containing semiconductor material.
29 Citations
23 Claims
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1. A transistor device, comprising:
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a compound semiconductor body; a drain disposed in the compound semiconductor body; a source disposed in the compound semiconductor body and spaced apart from the drain by a channel region; a gate operable to control the channel region; and a gate overvoltage protection device electrically connected between the source and the gate and comprising alternating regions of p-type and n-type silicon disposed in a first trench formed in the compound semiconductor body. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12)
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13. A transistor device, comprising:
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a compound semiconductor body comprising a doped substrate, a first compound semiconductor material on the doped substrate and a second compound semiconductor material on the first compound semiconductor material; a drain disposed in the compound semiconductor body; a source disposed in the compound semiconductor body and spaced apart from the drain by a channel region;
a gate operable to control the channel region; anda gate overvoltage protection device electrically connected between the source and the gate and comprising alternating regions of p-type and n-type silicon disposed on a dielectric material formed on the second compound semiconductor material, wherein one of the p-type or n-type silicon regions is electrically connected to the gate and a different one of the p-type or n-type silicon regions is electrically connected to the source through a first conductive via disposed in a first trench extending through the dielectric material to the source. - View Dependent Claims (14, 15)
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16. A transistor device, comprising:
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a compound semiconductor body comprising a doped substrate, a first compound semiconductor material on the doped substrate and a second compound semiconductor material on the first compound semiconductor material; a drain disposed in the compound semiconductor body; a source disposed in the compound semiconductor body and spaced apart from the drain by a channel region; a gate operable to control the channel region; and a gate overvoltage protection device electrically connected between the source and the gate and comprising; a first series of alternating regions of p-type and n-type silicon disposed in a first trench which extends through the first and second compound semiconductor materials to the doped substrate, the source being connected to the doped substrate through the first series of alternating p-type and n-type silicon regions; and a second series of alternating regions of p-type and n-type silicon disposed in a second trench laterally spaced apart from the first trench and extending through the first and second compound semiconductor materials to the doped substrate, the gate being connected to the doped substrate through the second series of alternating p-type and n-type silicon regions. - View Dependent Claims (17, 18, 19, 20)
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21. A transistor device, comprising:
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a compound semiconductor body comprising an n-type doped substrate, a first compound semiconductor material on the n-type doped substrate and a second compound semiconductor material on the first compound semiconductor material; a drain disposed in the compound semiconductor body; a source disposed in the compound semiconductor body and spaced apart from the drain by a channel region; a gate operable to control the channel region; and a gate overvoltage protection device electrically connected between the source and the gate and comprising; a first trench extending from the source to the n-type doped substrate and filled with a p-type silicon-containing semiconductor material; a second trench spaced apart from the first trench and extending through the first and second compound semiconductor materials to the n-type doped substrate, the second trench filled with a p-type silicon-containing semiconductor material; and a region of the n-type doped substrate disposed between the first and second trenches.
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22. A transistor device, comprising:
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a compound semiconductor body comprising a doped substrate and at least one epitaxial layer on the doped substrate; a source disposed in the compound semiconductor body and spaced apart from the drain by a channel region; a gate operable to control the channel region; and a gate overvoltage protection device electrically connected between the source and the gate and comprising; a first trench extending from the source to the doped substrate and filled with a doped silicon-containing semiconductor material of the same doping type as the doped substrate; a second trench spaced apart from the first trench and extending through the at least one epitaxial layer to the doped substrate, the second trench filled with a doped silicon-containing semiconductor material of the same doping type as the doped substrate; and an implanted region formed in the doped substrate underneath and in contact with at least one of the first and second filled trenches, the implanted region having the opposite doping type as the doped substrate. - View Dependent Claims (23)
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Specification