Magnetic memory device and method of manufacturing the same
First Claim
Patent Images
1. A method of manufacturing a magnetic memory device, comprising:
- forming a nonmagnetic layer on a first magnetic layer;
forming a second magnetic layer on the nonmagnetic layer;
forming a mask on the second magnetic layer; and
etching the second magnetic layer using a gas;
wherein etching the second magnetic layer includes forming an amorphous state in the nonmagnetic layer.
5 Assignments
0 Petitions
Accused Products
Abstract
According to one embodiment, a magnetic memory device includes: a first magnetic layer; a nonmagnetic layer on the first magnetic layer; a second magnetic layer on the nonmagnetic layer; and an insulator film on the nonmagnetic layer surrounding a side surface of the second magnetic layer. The second magnetic layer has an area of a surface facing the nonmagnetic layer smaller than that of the nonmagnetic layer. The nonmagnetic layer includes a first region that is provided between the first magnetic layer and the insulator film. The first region includes an amorphous state.
13 Citations
13 Claims
-
1. A method of manufacturing a magnetic memory device, comprising:
-
forming a nonmagnetic layer on a first magnetic layer; forming a second magnetic layer on the nonmagnetic layer; forming a mask on the second magnetic layer; and etching the second magnetic layer using a gas; wherein etching the second magnetic layer includes forming an amorphous state in the nonmagnetic layer. - View Dependent Claims (2, 3, 4)
-
-
5. A method of manufacturing a magnetic memory device, comprising:
-
forming a nonmagnetic layer on a first magnetic layer; forming a second magnetic layer on the nonmagnetic layer; forming a first metal layer on the second magnetic layer; performing annealing after formation of the first metal layer; and etching the first metal layer and part of the second magnetic layer using a gas mainly containing neon after the annealing. - View Dependent Claims (6, 7, 8, 9, 10, 11, 12, 13)
-
Specification