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Sputtering apparatus including target mounting and control

  • US 9,738,967 B2
  • Filed: 09/25/2012
  • Issued: 08/22/2017
  • Est. Priority Date: 07/12/2006
  • Status: Active Grant
First Claim
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1. A sputtering target assembly for a single sputtering chamber of a sputter coating apparatus, comprising:

  • a lid to seal off an opening to the chamber, the lid including a first part and a second part, the first part being separable from the second part;

    a first pair of sputtering targets mounted to the first part of the lid for placement within the chamber, at a first distance from the lid, when the lid seals off the opening, each target of the first pair of sputtering targets being cylindrical and including a longitudinal axis about which the corresponding target of the first pair rotates, and both longitudinal axes of the first pair being located at the first distance, when the lid seals off the chamber; and

    a second pair of sputtering targets mounted to the second part of the lid for placement within the chamber, at a second distance from the lid, when the lid seals off the opening, each target of the second pair of sputtering targets being cylindrical and including a longitudinal axis about which the corresponding target of the second pair rotates, and both longitudinal axes of the second pair being located at the second distance, when the lid seals off the chamber;

    wherein the second distance is greater than the first distance such that the second pair of sputtering targets are spaced apart from the first pair of sputtering targets to allow conveyance of a substrate in between the first and second pairs of sputtering targets in a direction approximately parallel with the lid, when the lid seals off the opening; and

    the longitudinal axis of each of the first pair of sputtering targets is aligned with the longitudinal axis of the corresponding target of the second pair of sputtering targets in order that both/opposing sides of the substrate can be simultaneously coated by the first and second pairs of sputtering targets when conveyed therebetween.

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