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Microwave plasma reactors and substrates for synthetic diamond manufacture

  • US 9,738,970 B2
  • Filed: 09/11/2014
  • Issued: 08/22/2017
  • Est. Priority Date: 12/23/2010
  • Status: Active Grant
First Claim
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1. A substrate for use in a microwave plasma reactor, the substrate comprising:

  • a cylindrical disc of a carbide forming refractory metal having a flat growth surface on which CVD diamond is to be grown and a flat supporting surface opposed to said growth surface,wherein the cylindrical disc has a diameter of 80 mm or more,wherein the growth surface has a flatness variation no more than 100 μ

    m, andwherein the supporting surface has a flatness variation no more than 100 μ

    m.

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