Substrate placement in immersion lithography
First Claim
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1. A lithographic projection apparatus comprising:
- a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;
a projection system configured to project a patterned beam onto a substrate target portion;
a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate table;
a sensor system configured to measure a position of the substrate when disposed inside the depression, to measure a characteristic of a gap between an edge of the substrate when disposed inside the depression and an edge of the depression, or to measure both the position and the characteristic of the gap; and
a substrate handling system configured to position, using the measurement by the sensor system or a parameter derived from the measurement, another substrate to inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression.
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Accused Products
Abstract
A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.
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Citations
66 Claims
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1. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate; a projection system configured to project a patterned beam onto a substrate target portion; a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate table; a sensor system configured to measure a position of the substrate when disposed inside the depression, to measure a characteristic of a gap between an edge of the substrate when disposed inside the depression and an edge of the depression, or to measure both the position and the characteristic of the gap; and a substrate handling system configured to position, using the measurement by the sensor system or a parameter derived from the measurement, another substrate to inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A non-transitory computer-readable medium comprising instructions thereon configured to cause a hardware processor to:
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(i) cause measurement of a gap between an edge of a substrate or of another substrate and an edge of a depression of a substrate table of a lithographic apparatus, or (ii) cause measurement of a position of the substrate or of another substrate, or (iii) cause measurement of the edge of the depression, or (iv) any combination selected from (i)-(iii); and using the measurement or a parameter derived from the measurement, cause positioning of the substrate inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression and/or cause positioning of the substrate so as to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19)
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20. A non-transitory computer-readable medium comprising instructions thereon configured to cause a hardware processor to:
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cause measurement of a parameter of the substrate or of another substrate and/or of a parameter of an edge of a depression of a substrate table of a lithographic apparatus; determine an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter; cause positioning, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27)
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28. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate; a projection system configured to project a patterned beam onto a substrate target portion; a sensor system configured to measure the substrate or another substrate; and a substrate handling system configured to determine, based on measurement by the sensor system, an offset of a portion of the substrate or of another substrate, with respect to a portion of the depression, and configured to position the substrate to inside the depression by shifting a position of the substrate to correct for the offset to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or an edge of the depression in the substrate table. - View Dependent Claims (29, 30, 31, 32, 33, 34, 35, 36)
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37. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate; a projection system configured to project a patterned beam onto a substrate target portion; a sensor system configured to measure (i) a characteristic of a gap between an edge of the substrate, or of another substrate, when disposed inside the depression and an edge of the depression, or (ii) measure the edge of the depression, or (iii) both (i) and (ii); and a substrate handling system configured to position, using the measurement by the sensor system, the substrate so as to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table. - View Dependent Claims (38, 39, 40, 41, 42, 43, 44, 45)
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46. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate; a projection system configured to project a patterned beam onto a substrate target portion; a sensor system configured to measure a parameter of an edge of the depression of the substrate table; and a substrate handling system configured to determine an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter and configured to position, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table. - View Dependent Claims (47, 48, 49, 50, 51, 52, 53, 54, 55)
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56. A lithographic projection apparatus comprising:
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a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate; a projection system configured to project a patterned beam onto a substrate target portion; a sensor system configured to measure a parameter of a position of a part of the substrate or another substrate, when disposed inside the depression of the substrate table; and a substrate handling system configured to determine an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter and configured to position, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table. - View Dependent Claims (57, 58, 59, 60, 61, 62, 63, 64, 65, 66)
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Specification