Substrate placement in immersion lithography

• US 9,740,106 B2
• Filed: 11/03/2015
• Issued: 08/22/2017
• Est. Priority Date: 12/10/2004
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Hoogendam, Christiaan Alexander, Nijmeijer, Gerrit Johannes, Cuperus, Minne, Van Eijck, Petrus Anton Willem Cornelia Maria
• Primary Examiner(s): NGUYEN, HUNG
• Application Number:
  US14/931,560
• Publication Number:
  US 20160054665A1
• Time in Patent Office: 658 Days
• Field of Search: 355 30, 355 53, 355 72
• CPC Class Codes: G01B 11/14 for measuring distance or clearance between spaced objects or spaced apertures G01B11/26 takes precedence; rangefinders G01C3/00
• CPC Class Codes: G01B 11/26 for measuring angles or tapers; for testing the alignment of axes
• CPC Class Codes: G01B 11/272 using photoelectric detection means
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70716 Stages
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: G03F 9/7011 Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder

Abstract

A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.

Claims

1. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a substrate target portion;

a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate table;

a sensor system configured to measure a position of the substrate when disposed inside the depression, to measure a characteristic of a gap between an edge of the substrate when disposed inside the depression and an edge of the depression, or to measure both the position and the characteristic of the gap; and

a substrate handling system configured to position, using the measurement by the sensor system or a parameter derived from the measurement, another substrate to inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression.

2. The apparatus according to claim 1, wherein the substrate handling system or the sensor system is further configured to determine an offset between a center of the substrate and a center of the depression.

3. The apparatus according to claim 1, wherein the substrate is a test substrate and wherein the sensor system is further configured to measure a position of an alignment mark of the test substrate when disposed inside the depression, and wherein the substrate handling system or the sensor system is further configured to determine an offset between a center of the test substrate and a center of the depression from the position of the alignment mark measured by the sensor system.

4. The apparatus according to claim 1, wherein the substrate handling system or the sensor system is further configured to determine to what extent the other substrate should be translated in a plane substantially parallel to the substrate table to allow the other substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression.

5. The apparatus according to claim 1, wherein the substrate handling system or the sensor system is further configured to determine a center of the substrate using measurements of the gap and to determine a substrate offset of the substrate between a center of the depression and the determined center of the substrate.

6. The apparatus according to claim 5, further comprising a prealigner configured to measure a center of the other substrate at the prealigner and wherein the substrate handling system, the sensor system or the prealigner is further configured to determine a centering offset at the prealigner between a nominal center of the other substrate and the determined center of the other substrate at the prealigner.

7. The apparatus according to claim 6, wherein the substrate handling system or the sensor system is further configured to combine the substrate offset and the centering offset to obtain a global centering offset.

8. The apparatus according to claim 1, wherein the substrate handling system is further configured to be calibrated to correct for an offset between the substrate and the depression.

9. The apparatus according to claim 1, wherein the sensor system is configured measure a position of the substrate when disposed inside the depression.

10. The apparatus according to claim 1, wherein the sensor system is configured to measure a characteristic of a gap between an edge of the substrate when disposed inside the depression and an edge of the depression.

11. A non-transitory computer-readable medium comprising instructions thereon configured to cause a hardware processor to:

(i) cause measurement of a gap between an edge of a substrate or of another substrate and an edge of a depression of a substrate table of a lithographic apparatus, or (ii) cause measurement of a position of the substrate or of another substrate, or (iii) cause measurement of the edge of the depression, or (iv) any combination selected from (i)-(iii); and

using the measurement or a parameter derived from the measurement, cause positioning of the substrate inside the depression such that the gap between the edge of the substrate and the edge of the depression is substantially uniform inside the depression and/or cause positioning of the substrate so as to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table.

12. The non-transitory computer-readable medium according to claim 11, wherein the instructions are configured to cause measurement of the edge of the depression and further configured to calculate a center of the depression from the measured edge of the depression and cause the positioning using the calculated center of the depression.

13. The non-transitory computer-readable medium according to claim 11, wherein the instructions are further configured to determine a centering offset between a center of the depression and a center of the substrate or of the other substrate, and cause the positioning using the centering offset.

14. The non-transitory computer-readable medium according to claim 11, wherein the instructions are configured to cause measurement of the gap by scanning the gap across an optical beam and measuring an intensity variation in a reflection of the optical beam.

15. The non-transitory computer-readable medium according to claim 11, wherein the instructions are configured to measure the gap and further configured to determine a center of the substrate or of the other substrate using the measurements of the gap by determining a position of the edge of the substrate or the other substrate and calculating the position of the center of the substrate or the other substrate from the position of the edge.

16. The non-transitory computer-readable medium according to claim 11, wherein the instructions are configured to cause the substrate to be disposed inside the depression and removed from the depression using a substrate handler.

17. The non-transitory computer-readable medium according to claim 16, wherein the instructions are further configured to calibrate the substrate handler to take into account at least a centering offset between a center of the depression and a center of the substrate or the other substrate.

18. The non-transitory computer-readable medium according to claim 17, wherein the instructions are configured to calibrate the substrate handler by shifting positioning of substrates by the substrate handler by an offset to correct for the centering offset so that a subsequently positioned substrate is substantially centered inside the depression.

19. The non-transitory computer-readable medium according to claim 17, wherein the instructions are configured to calibrate the substrate handler by correcting for substrate positioning so that the gap of a subsequently positioned substrate is substantially equally wide inside the depression.

20. A non-transitory computer-readable medium comprising instructions thereon configured to cause a hardware processor to:

cause measurement of a parameter of the substrate or of another substrate and/or of a parameter of an edge of a depression of a substrate table of a lithographic apparatus;

determine an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter;

cause positioning, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table.

21. The non-transitory computer-readable medium according to claim 20, wherein the instructions are configured to measure the parameter of the substrate or the other substrate, the measurement comprising measurement of a mark on the substrate or the other substrate and the determination of the offset further comprising determination of a relative position between the substrate or other substrate and the depression based on the measured mark.

22. The non-transitory computer-readable medium according to claim 20, wherein the instructions are configured to measure the parameter of the substrate or the other substrate, the measurement comprising measurement of characteristic of a gap between the edge of the depression and an edge of the substrate or the other substrate and the determination of the offset further comprising determination of a position of the portion of the substrate or other substrate based on the measured characteristic of the gap.

23. The non-transitory computer-readable medium according to claim 20, wherein the instructions are configured to measure the parameter of the edge of the depression and the determination of the offset further comprises determination of a position of the portion of the depression based on the measured parameter of the edge of the depression.

24. The non-transitory computer-readable medium according to claim 20, wherein the instructions are further configured cause placement of the substrate substantially centered into the depression.

25. The non-transitory computer-readable medium according to claim 20, wherein the instructions are configured to determine the offset by determining an offset between a center of the substrate or the other substrate, and a center of the depression.

26. The non-transitory computer-readable medium according to claim 20, wherein the instructions are configured to cause the positioning by causing placement of the substrate into the depression with an upper surface of the substrate being at substantially a same level as an upper surface of the substrate table.

27. The non-transitory computer-readable medium according to claim 20, wherein the instructions are configured to cause the positioning by causing placement of the substrate inside the depression such that a gap around the substrate and between an edge of the substrate and the edge of the depression is substantially uniform inside the depression.

28. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a substrate target portion;

a sensor system configured to measure the substrate or another substrate; and

a substrate handling system configured to determine, based on measurement by the sensor system, an offset of a portion of the substrate or of another substrate, with respect to a portion of the depression, and configured to position the substrate to inside the depression by shifting a position of the substrate to correct for the offset to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or an edge of the depression in the substrate table.

29. The apparatus according to claim 28, wherein the substrate handling system is further configured to place the substrate substantially centered into the depression.

30. The apparatus according to claim 28, wherein the substrate handling system comprises a movable pin located at the substrate table.

31. The apparatus according to claim 28, wherein the substrate handling system is further configured to shift the position of the substrate by translating the substrate above the depression.

32. The apparatus according to claim 28, wherein the substrate handling system is further configured to determine a position of a central point of the depression.

33. The apparatus according to claim 32, wherein the sensor system is further configured to measure the edge of the depression and the substrate handling system is further configured to determine the position of the central point of the depression based on the measured edge of the depression.

34. The apparatus according to claim 28, wherein the substrate handling system is further configured to determine a position of a central portion of the substrate based on the measurement of the substrate.

35. The apparatus according to claim 28, wherein the substrate handling system is further configured to place the substrate into the depression with an upper surface of the substrate being at substantially a same level as an upper surface of the substrate table.

36. The apparatus according to claim 28, further comprising a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate table.

37. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a substrate target portion;

a sensor system configured to measure (i) a characteristic of a gap between an edge of the substrate, or of another substrate, when disposed inside the depression and an edge of the depression, or (ii) measure the edge of the depression, or (iii) both (i) and (ii); and

a substrate handling system configured to position, using the measurement by the sensor system, the substrate so as to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table.

38. The apparatus according to claim 37, wherein the sensor system is configured to measure the edge of the depression.

39. The apparatus according to claim 38, wherein the substrate handling system is further configured to position the substrate using a position of a point of the depression determined based on the measured edge of the depression.

40. The apparatus according to claim 37, wherein the sensor system is configured to measure the characteristic of the gap between an edge of the substrate, or of another substrate, when disposed inside the depression and an edge of the depression.

41. The apparatus according to claim 40, wherein the substrate handling system is further configured to position the substrate using a position of a point of the substrate or the other substrate determined based on the measured characteristic of the gap.

42. The apparatus according to claim 37, wherein the substrate handling system is further configured to determine an offset between a center of the substrate or the other substrate, and a center of the depression, and to position the substrate using the offset.

43. The apparatus according to claim 37, wherein the substrate handling system is configured to place the substrate substantially centered into the depression.

44. The apparatus according to claim 37, wherein the substrate handling system is further configured to determine to what extent the substrate should be translated in a plane substantially parallel to the substrate table to allow the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression.

45. The apparatus according to claim 37, further comprising a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate table.

46. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a substrate target portion;

a sensor system configured to measure a parameter of an edge of the depression of the substrate table; and

a substrate handling system configured to determine an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter and configured to position, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table.

47. The apparatus according to claim 46, wherein the sensor system is further configured to measure a mark on the substrate or the other substrate and the substrate handling system is further configured to determine a relative position between the substrate or other substrate and a part of the substrate table.

48. The apparatus according to claim 46, wherein the sensor system is further configured to measure a characteristic of a gap between the edge of the depression and an edge of the substrate or the other substrate and the substrate handling system is further configured to determine a position of the portion of the substrate or other substrate based on the measured characteristic of the gap.

49. The apparatus according to claim 46, wherein the substrate handling system is further configured to determine a position of the portion of the depression based on the measured parameter of the edge of the depression.

50. The apparatus according to claim 46, wherein the substrate handling system is further configured to place the substrate substantially centered into the depression.

51. The apparatus according to claim 46, wherein the substrate handling system is configured to determine an offset between a center of the substrate or the other substrate, and a center of the depression.

52. The apparatus according to claim 46, further comprising a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate.

53. The apparatus according to claim 46, wherein the substrate handling system is further configured to place the substrate into the depression with an upper surface of the substrate being at substantially a same level as an upper surface of the substrate table.

54. The apparatus according to claim 46, wherein the substrate handling system is further configured to place the substrate inside the depression such that a gap around the substrate and between an edge of the substrate and the edge of the depression is substantially uniform inside the depression.

55. The apparatus according to claim 46, wherein the substrate handling system comprises a movable pin located at the substrate table.

56. A lithographic projection apparatus comprising:

a substrate table configured to hold a substrate, the substrate table having a depression configured to receive the substrate;

a projection system configured to project a patterned beam onto a substrate target portion;

a sensor system configured to measure a parameter of a position of a part of the substrate or another substrate, when disposed inside the depression of the substrate table; and

a substrate handling system configured to determine an offset between a position of a portion of the substrate and a portion of the depression based on the measured parameter and configured to position, using the offset, the substrate to enter inside the depression without colliding with a surface of the substrate table or the edge of the depression in the substrate table.

57. The apparatus according to claim 56, wherein the sensor system is further configured to measure a characteristic of the substrate or the other substrate during exposure.

58. The apparatus according to claim 56, wherein the sensor system is configured to measure a characteristic of a gap between the edge of the depression and an edge of the substrate or the other substrate.

59. The apparatus according to claim 58, wherein the substrate handling system is further configured to determine a position of the portion of the substrate or other substrate based on the measured characteristic of the gap.

60. The apparatus according to claim 58, wherein the substrate handling system is further configured to determine a position of a portion of the depression based on the measured characteristic of the gap.

61. The apparatus according to claim 56, wherein the substrate handling system is further configured to place the substrate substantially centered into the depression.

62. The apparatus according to claim 56, wherein the substrate handling system is configured to determine an offset between a center of the substrate or the other substrate, and a center of the depression.

63. The apparatus according to claim 56, further comprising a liquid supply system configured to provide a liquid, through which the patterned beam is to be projected, in a space between the projection system and the substrate.

64. The apparatus according to claim 56, wherein the substrate handling system is further configured to place the substrate into the depression with an upper surface of the substrate being at substantially a same level as an upper surface of the substrate table.

65. The apparatus according to claim 56, wherein the substrate handling system is further configured to place the substrate inside the depression such that a gap around the substrate and between an edge of the substrate and the edge of the depression is substantially uniform inside the depression.

66. The apparatus according to claim 56, wherein the substrate handling system comprises a movable pin located at the substrate table.