Lithographic apparatus and device manufacturing method

• US 9,740,107 B2
• Filed: 06/09/2016
• Issued: 08/22/2017
• Est. Priority Date: 11/12/2002
• Status: Expired due to Fees

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Lof, Joeri, Butler, Hans, Donders, Sjoerd Nicolaas Lambertus, Kolesnychenko, Aleksey Yurievich, Loopstra, Erik Roelof, Meijer, Hendricus Johannes Maria, Mertens, Jeroen Johannes Sophia Maria, Mulkens, Johannes Catharinus Hubertus, Ritsema, Roelof Aeilko Siebrand, Van Schaik, Frank, Sengers, Timotheus Franciscus, Simon, Klaus, De Smit, Joannes Theodoor, Straaijer, Alexander, Van Santen, Helmar
• Primary Examiner(s): Kim, Peter B
• Application Number:
  US15/178,522
• Publication Number:
  US 20160282727A1
• Time in Patent Office: 439 Days
• Field of Search: 355 53, 355 30
• CPC Class Codes: G03F 7/70341 Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply chemical composition of immersion liquids G03F7/2041
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/7085 Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
• CPC Class Codes: G03F 7/70866 of mask or workpiece

Abstract

A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object.

Claims

1. A device manufacturing method comprising:

projecting, with a projection system, a patterned beam of radiation onto a target portion of a substrate held by a substrate table, said substrate table including

an edge seal member configured to at least partly surround an edge of said substrate, an object positioned on said substrate table, or both, and

a vacuum port, or a liquid supply port, or both, positioned to provide respectively vacuum or liquid to a gap between said edge seal member and said substrate, said object, or both, on a side opposite said projection system, and

providing a liquid, through which said patterned beam of radiation is projected, to a space between said projection system and said substrate, said object, or both.

2. The method according to claim 1, wherein said substrate table further comprises a channel positioned radially inwardly of said vacuum port, said channel being connected to a gas source such that on actuation of said vacuum a flow of gas radially outwardly from said channel towards said vacuum is established.

3. The method according to claim 2, wherein one or more burls configured to be in contact with said substrate, said object, or both, are present radially outwardly of said channel and inwardly of said vacuum port.

4. The method according to claim 1, wherein said substrate table comprises a portion which extends below said substrate, said object, or both, and is radially outwardly of said vacuum port.

5. The method according to claim 4, wherein said portion has one or more parts which are configured to extend up to said substrate, said object, or both, to at least partly support said substrate, said object, or both.

6. The method according to claim 4, wherein said portion is part of a pimple table configured to support said substrate.

7. The method according to claim 1, wherein the substrate table includes a compartment in fluid connection with said gap via said vacuum port and with said vacuum.

8. The method according to claim 1, wherein said vacuum port is annular.

9. The method according to claim 1, wherein said vacuum port is discontinuous.

10. The method according to claim 1, wherein said vacuum port is continuous.

11. The method according to claim 1, wherein said vacuum port is positioned adjacent an edge portion of the edge seal member.

12. The method according to claim 1, wherein said object comprises a sensor.

13. The method according to claim 1, wherein said edge seal member is glued to said substrate, said object, or both, around a periphery of said substrate, said object, or both.

14. A device manufacturing method comprising:

projecting, with a projection system, a patterned beam of radiation onto a target portion of a substrate held by a substrate table, said substrate table including

an edge seal member configured to at least partly surround an edge of the substrate, an object, or both, positioned on said substrate table and to provide a primary surface facing said projection system substantially co-planar with a primary surface of said substrate, said object, or both, and

providing a liquid, through which said patterned beam of radiation is projected, to a space between said projection system and said substrate, said object, or both, and to a localized area of (i) said object, (ii) said edge seal member, (iii) said substrate, or (iv) any combination of (i) (iii).

15. The method according to claim 14, wherein said edge seal member and said substrate, said object, or both, are moveably mounted relative to one another.

16. The method according to claim 14, further comprising moving said edge seal member in a plane substantially parallel to said primary surface of said edge seal member to vary a distance between said edge seal member and said substrate, said object, or both.

17. The method according to claim 14, further comprising moving, with an actuator, said edge seal member relative to a remainder of said substrate table in a direction substantially parallel to an optical axis of the projection system.

18. The method according to claim 17, wherein said actuator comprises a wedge member which, on movement in a direction substantially parallel to said primary surface of said edge seal member, is effective to move said edge seal member relative to a remainder of said substrate table in the direction substantially parallel to the optical axis.

19. The method according to claim 18, wherein said wedge is configured to lock in place on removal of an actuation force by virtue of a coefficient of friction of said wedge.

20. The method according to claim 14, wherein said substrate table comprises a hydrophobic layer adjacent an edge portion of said edge seal member and said substrate, said object, or both, on an opposite side of said edge seal member and said substrate, said object, or both, to said projection system.