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Lithographic apparatus and device manufacturing method

  • US 9,740,107 B2
  • Filed: 06/09/2016
  • Issued: 08/22/2017
  • Est. Priority Date: 11/12/2002
  • Status: Expired due to Fees
First Claim
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1. A device manufacturing method comprising:

  • projecting, with a projection system, a patterned beam of radiation onto a target portion of a substrate held by a substrate table, said substrate table includingan edge seal member configured to at least partly surround an edge of said substrate, an object positioned on said substrate table, or both, anda vacuum port, or a liquid supply port, or both, positioned to provide respectively vacuum or liquid to a gap between said edge seal member and said substrate, said object, or both, on a side opposite said projection system, andproviding a liquid, through which said patterned beam of radiation is projected, to a space between said projection system and said substrate, said object, or both.

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