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Semiconductor device having self-isolating bulk substrate and method therefor

  • US 9,748,330 B2
  • Filed: 04/27/2016
  • Issued: 08/29/2017
  • Est. Priority Date: 01/11/2016
  • Status: Active Grant
First Claim
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1. A semiconductor device structure comprising:

  • a self-isolating bulk semiconductor substrate having first and second opposing major surfaces, wherein the self-isolating bulk semiconductor substrate includes;

    a floating buried doped region of a first conductivity type;

    a doped region of a second conductivity type opposite to the first conductivity type disposed between the floating buried doped region and the first major surface,wherein the doped region abuts the floating buried doped region; and

    a semiconductor region of the second conductivity type disposed between the floating buried doped region and the second major surface;

    a trench isolation region extending from the first major surface through the doped region, extending through the floating buried doped region, and extending into the semiconductor region, wherein the floating buried doped region abuts the trench isolation region; and

    a semiconductor device disposed within the doped region.

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