Semiconductor device having self-isolating bulk substrate and method therefor
First Claim
1. A semiconductor device structure comprising:
- a self-isolating bulk semiconductor substrate having first and second opposing major surfaces, wherein the self-isolating bulk semiconductor substrate includes;
a floating buried doped region of a first conductivity type;
a doped region of a second conductivity type opposite to the first conductivity type disposed between the floating buried doped region and the first major surface,wherein the doped region abuts the floating buried doped region; and
a semiconductor region of the second conductivity type disposed between the floating buried doped region and the second major surface;
a trench isolation region extending from the first major surface through the doped region, extending through the floating buried doped region, and extending into the semiconductor region, wherein the floating buried doped region abuts the trench isolation region; and
a semiconductor device disposed within the doped region.
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Abstract
In one embodiment, a semiconductor device comprises a bulk semiconductor substrate that includes a first conductivity type floating buried doped region bounded above by a second conductivity type doped region and bounded below by another second conductivity semiconductor region. Dielectric isolation regions extend through the second conductivity doped region and the first conductivity floating buried doped region into the semiconductor region. Functional devices are disposed within the second conductivity type doped region. The first conductivity type floating buried doped region is configured as a self-biased region that laterally extends between adjacent dielectric isolation regions.
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Citations
20 Claims
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1. A semiconductor device structure comprising:
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a self-isolating bulk semiconductor substrate having first and second opposing major surfaces, wherein the self-isolating bulk semiconductor substrate includes; a floating buried doped region of a first conductivity type; a doped region of a second conductivity type opposite to the first conductivity type disposed between the floating buried doped region and the first major surface, wherein the doped region abuts the floating buried doped region; and a semiconductor region of the second conductivity type disposed between the floating buried doped region and the second major surface; a trench isolation region extending from the first major surface through the doped region, extending through the floating buried doped region, and extending into the semiconductor region, wherein the floating buried doped region abuts the trench isolation region; and a semiconductor device disposed within the doped region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A semiconductor device structure comprising:
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a bulk semiconductor substrate having first and second opposing major surfaces, wherein the bulk semiconductor substrate comprises; a floating buried doped region of a first conductivity type; a doped region of a second conductivity type opposite to the first conductivity type disposed between the floating buried doped region and the first major surface, and wherein the doped region abuts the floating buried doped region; and a semiconductor region of the second conductivity type disposed between the floating buried doped region and the second major surface, wherein the doped region and the semiconductor region are provided absent any diffused contact structures or conductive contact structures making direct or low-ohmic contact to the floating buried doped region; a pair of laterally separated isolation trenches extending from the first major surface through the doped region, extending through the floating buried doped region, and extending into the semiconductor region, and wherein the floating buried doped region abuts the pair of laterally separated isolation trenches; and a semiconductor device disposed within the doped region between the least one pair of laterally separated isolation trenches. - View Dependent Claims (12, 13, 14, 15)
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16. A semiconductor device structure comprising:
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a self-isolating bulk semiconductor substrate having first and second opposing major surfaces, wherein the self-isolating bulk semiconductor substrate comprises; a floating buried doped region of a first conductivity type; a doped region of a second conductivity type opposite to the first conductivity type disposed between the floating buried doped region and the first major surface; and a semiconductor region of the second conductivity type disposed between the floating buried doped region and the second major surface, wherein the doped region and the semiconductor region are provided absent any diffused contact structures or conductive contact structures making direct or low-ohmic contact to the floating buried doped region, and wherein the doped region adjoins the floating buried doped region; a trench isolation structure extending from the first major surface through the doped region, extending through the floating buried doped region, and extending into the semiconductor region, wherein the trench isolation structure comprises a plurality of trench isolation portions in cross-sectional view, and wherein the floating buried doped region abuts each trench isolation portion, and wherein the trench isolation structure defines a plurality of device active regions within the doped region; and a plurality of semiconductor devices disposed within the device active regions. - View Dependent Claims (17, 18, 19, 20)
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Specification