Arrangement for an analysis system, analysis system having the arrangement and method for use of the arrangement

• US 9,752,984 B2
• Filed: 10/17/2013
• Issued: 09/05/2017
• Est. Priority Date: 10/18/2012
• Status: Active Grant

• Current Assignee: Koninklijke Philips N.V.
• Original Assignee: Koninklijke Philips N.V.
• Inventors: Verstegen, Emile Johannes Karel, Mank, Adrianus Johannes Gerardus
• Primary Examiner(s): Ayub, Hina F
• Assistant Examiner(s): BOLOGNA, DOMINIC JOSEPH
• Application Number:
  US14/434,814
• Publication Number:
  US 20150260652A1
• Time in Patent Office: 1,419 Days
• CPC Class Codes: G01J 3/0224 using polarising or depolarising elements
• CPC Class Codes: G01J 3/44 Raman spectrometry; Scattering spectrometry ; Fluorescence spectrometry
• CPC Class Codes: G01N 21/49 within a body or fluid
• CPC Class Codes: G01N 21/64 Fluorescence; Phosphorescence
• CPC Class Codes: G01N 21/6445 Measuring fluorescence polarisation
• CPC Class Codes: G01N 21/645 Specially adapted constructive features of fluorimeters
• CPC Class Codes: G01N 21/6458 Fluorescence microscopy fluorescence microscopes per se G02B21/0076 and G02B21/16
• CPC Class Codes: G01N 21/65 Raman scattering
• CPC Class Codes: G01N 2201/0638 Refractive parts
• CPC Class Codes: G02B 21/0092 Polarisation microscopes
• CPC Class Codes: G02B 27/283 used for beam splitting or combining
• CPC Class Codes: G02B 5/06 Fluid-filled or evacuated prisms
• CPC Class Codes: G02B 5/3083 Birefringent or phase retarding elements G02B5/3008, G02B5/3016 take precedence; systems for polarisation control G02B27/286; manufacturing phase modulating patterns by lithographic processes G03F7/001
• CPC Class Codes: G02F 1/13306 Circuit arrangements or driving methods for the control of single liquid crystal cells G02F1/132, G02F1/133382 take precedence

Abstract

An arrangement having a birefringent component is provided for use in spatial offset measurements and analysis systems. The birefringent optical arrangement provides different directional control of the excitation signal relative to the emission signal, so that offset between an excitation and emission location on a sample can be controlled for both or only one of the excitation signal relative to the emission signal.

Claims

1. An arrangement for use in performing spatial offset analysis of a medium, wherein the arrangement comprises:

a birefringent component including a birefringent material, the birefringent component comprising a first side adjacent a detector and a second side adjacent the medium, the birefringent component configured to first manipulate a beam of primary radiation of a first polarization that is incident on the first side, the first manipulation directing the beam of primary radiation to a first location of the medium, the birefringent component further configured to second manipulate at least part of a beam of secondary radiation of a second polarization incident on the second side from a second location of the medium, the secondary radiation based on irradiation of the medium by the primary radiation, the second manipulation directing the at least part of the beam of secondary radiation to the detector, the second location being at least partially different from the first location, wherein the effect of the first manipulation is different from the effect of the second manipulation due to the first polarization being different from the second polarization.

2. The arrangement of claim 1, wherein the birefringent material comprises an ordinary refractive index and an extraordinary refractive index and a further material having a further refractive index that is different from at least one of the ordinary refractive index and the extraordinary refractive index, wherein the birefringent material and the further material define a birefringent surface for providing the first manipulation, the second manipulation, or a combination of the first and second manipulations.

3. The arrangement of claim 2, wherein the further material is part of the birefringent component and the further refractive index is equal to one of the ordinary refractive index and the extraordinary refractive index.

4. The arrangement of claim 2, wherein the birefringent surface comprises a plurality of birefringent sub-surfaces,

wherein each of the birefringent sub-surfaces contains an imaginary radial line extending radially from an axis, the axis being oriented perpendicular to an imaginary plane and each of the birefringent sub-surfaces is inclined with respect to the imaginary plane over an inclination angle, the inclination angle being defined between an imaginary line that is perpendicular to the imaginary radial line, and the line constructed by perpendicular projection of the imaginary line onto the imaginary plane.

5. The arrangement of claim 1, wherein the birefringent component is controllable for adjustment of the first manipulation the second manipulation, or a combination of the first and second manipulations.

6. The arrangement of claim 5, wherein the birefringent material comprises a liquid crystal material and at least one electrode for applying an electric field over at least a part of the liquid crystal material for controlling the adjustment of the first manipulation, the second manipulation, or a combination of the first and second manipulations.

7. The arrangement of claim 6, wherein the arrangement has an operating mode in which the birefringent component third manipulates a beam of primary radiation, the third manipulation directing the beam of primary radiation to the first location, the birefringent component further configured to fourth manipulate the at least part of a beam of secondary radiation from the second location, wherein the first location and the second location are the same, the birefringent component configured to be controlled such that the third manipulation and the fourth manipulation are the same.

8. The arrangement of claim 5, wherein the arrangement comprises a polarization adjustment component for adjusting the polarization of primary radiation of the beam of primary radiation before the primary radiation is incident on the birefringent component, therewith providing the controlling of the adjustment of the first manipulation, the second manipulation, or a combination of the first and second manipulations.

9. The arrangement of claim 5, wherein the birefringent material comprises an ordinary refractive index and an extraordinary refractive index and a further material having a further refractive index that is different from at least one of the ordinary refractive index and the extraordinary refractive index, wherein the birefringent material and the further material define a birefringent surface for providing the first manipulation, the second manipulation, or a combination of the first and second manipulations, wherein the further material comprises a solid material for defining the shape of the birefringent surface and wherein the birefringent material comprises a liquid crystal material and the arrangement comprises at least one electrode for applying an electric field over at least a part of the liquid crystal material for controlling the adjustment of the first manipulation, the second manipulation, or a combination of the first and second manipulations.

10. The arrangement of claim 5, wherein the birefringent material comprises an ordinary refractive index and an extraordinary refractive index and a further material having a further refractive index that is different from at least one of the ordinary refractive index and the extraordinary refractive index, wherein the birefringent material and the further material define a birefringent surface for providing the first manipulation, the second manipulation, or a combination of the first and second manipulations, wherein the birefringent material comprises a solid material for defining the shape of the birefringent surface and wherein the further material comprises a fluid material contained within a compartment having a boundary formed by the birefringent surface such that the fluid material is in contact with the birefringent material, wherein the composition of the fluid material in contact with the birefringent material is adjustable.

11. The arrangement claim 1, wherein the birefringent surface comprises a shape such that the first manipulation, the second manipulation, or a combination of the first and second manipulations comprise any one or a combination of deflection or change of parallelism of a beam of radiation.

12. The arrangement of claim 11, wherein the birefringent surface comprises a birefringent prism surface for providing any one or a combination of the deflection or a birefringent lens surface for providing the change of parallelism of a beam of radiation.

13. The arrangement of claim 1, wherein the arrangement comprises a further birefringent component, the further birefringent component configured to additionally manipulate the beam of primary radiation, the further birefringent component further configured to additionally manipulate the at least part of the beam of secondary radiation, wherein the effect of the additional manipulation of the beam of primary radiation is different from the effect of the additional manipulation of the at least part of the beam of secondary radiation due to the first polarization being different from the second polarization.

14. The arrangement of claim 1, further comprising a pinhole component comprising a pinhole for passing the at least part of the beam of secondary radiation.

15. The arrangement of claim 1, further comprising a collection component for convergence of the at least part of the beam of the secondary radiation.

16. The arrangement of claim 1, further comprising a beam splitter arranged in between the birefringent component and the detector, the beam splitter being arranged for passing the at least part of the beam of the secondary radiation towards the detector and for directing any primary radiation directed by the birefringent component to the beam splitter substantially away from the detector.

17. The arrangement of claim 1, wherein the arrangement further comprises a polarization selective filter arranged in between the birefringent component and the detector for controlling the intensity of the secondary radiation that is incident on the detector.

18. The arrangement claim 17, further comprising a holder for holding the birefringent component, the holder being removable from the arrangement.

19. The arrangement of claim 18, wherein the holder is moveable with respect to the arrangement such that one or more birefringent components can be positioned to provide the first manipulation, the second manipulation, or a combination of the first and second manipulations at any one time.

20. The arrangement of claim 1, wherein the birefringent component is removable from the arrangement.

21. The arrangement of claim 1, wherein the arrangement is an accessory for an analysis system that is configured to be detachable from the analysis system.

22. An analysis system comprising:

a radiation source configured to provide a beam of primary radiation of a first polarization;

a detector;

an arrangement comprising a birefringent component that includes a birefringent material, the birefringent component configured to first manipulate the beam of primary radiation, the first manipulation directing the beam of primary radiation to a medium at a first location, the birefringent component further configured to second manipulate at least part of a beam of secondary radiation of a second polarization collected from a second location of the medium, the secondary radiation based on irradiation of the medium by the primary radiation, the second manipulation directing the at least part of the beam of secondary radiation to the detector, the second location being at least partially different from the first location, wherein the effect of the first manipulation is different from the effect of the second manipulation due to the first polarization being different from the second polarization.

23. The analysis system of claim 22, wherein the arrangement is an accessory to the analysis system, wherein the accessory is configured to be detachable from the analysis system.

24. The analysis system of claim 22, wherein the analysis system is any one of, or a combination of:

a microscope, a backscatter microscope, a fluorescence detection system, a phosphorescence detection system, a RAMAN spectrometer, a near-IR and/or IR spectrometer, a UV spectrometer, a microwave detection system, wherein the microscope or the backscatter microscope can be a part of the detection systems or the spectrometers.

25. The analysis system of claim 22, further comprising:

a beam splitter arranged in between the birefringent component and the detector, the beam splitter being arranged for passing the at least part of the beam of the secondary radiation towards the detector and for directing any primary radiation directed by the birefringent component to the beam splitter substantially away from the detector and the beam splitter being further arranged for directing the primary radiation from the source to the birefringent component;

a polarization adjustment component for adjusting the polarization of the primary radiation before the primary radiation is incident on the birefringent component; and

a polarization selective filter arranged in between the birefringent component and the detector for controlling the intensity of the secondary radiation that is incident on the detector.

26. The analysis system of claim 22, further comprising a unit for data analysis of spatial offset detection measurements.

27. The analysis system of claim 22, further comprising a holder for holding the birefringent component, the holder being removable from the arrangement.

28. The analysis system of claim 27, wherein the birefringent component is removable from the arrangement, and wherein the holder is moveable with respect to the arrangement such that one or more birefringent components can be positioned to provide the first manipulation, the second manipulation, or a combination of the first and second manipulations at any one time.

29. A method for performing spatial offset detection, the method comprising:

manipulating at a birefringent component a beam of primary radiation that passes through birefringent material of the birefringent component, the manipulation directing the beam of primary radiation to a medium at a first location, the primary radiation comprising a first polarization, the birefringent component comprising birefringent material; and

manipulating at the birefringent component at least part of a beam of secondary radiation having a second polarization that is emitted from a second location of the medium, the emission based on irradiation of the medium by the primary radiation, the manipulation of the at least part of the beam of secondary radiation directing the at least part of the beam of secondary radiation to a detector, the second location being at least partially different from the first location,

wherein the effect of the manipulation of the beam of primary radiation is different from the effect of the manipulation of the at least part of the beam of secondary radiation due to the first polarization being different from the second polarization.

30. The method of claim 29, further comprising adjusting a relative contribution of secondary radiation of the first polarization and the secondary radiation of the second polarization incident on the detector, between consecutive detections of secondary radiation.

31. The method of claim 30, further comprising:

detecting the secondary radiation with the second polarization from the second location;

controlling the birefringent component to shift the second location while keeping the first location constant; and

detecting secondary radiation with the second polarization from the shifted second location.

32. The method of claim 29, further comprising adjusting the polarization of primary radiation of the beam of primary radiation before the primary radiation is incident on the birefringent component.

33. The method of claim 29, further comprising applying an electric field over at least a part of the birefringent material.

34. The method of claim 29, further comprising causing the convergence of the at least part of the beam of the secondary radiation.