Methods of forming patterns using photoresists

• US 9,772,555 B2
• Filed: 02/19/2016
• Issued: 09/26/2017
• Est. Priority Date: 06/02/2015
• Status: Active Grant

• Current Assignee: Samsung Electronics Co. Ltd.
• Original Assignee: Samsung Electronics Co. Ltd.
• Inventors: Park, Cheol-Hong, Woo, Sang-Yoon, Koh, Cha-Won, Kim, Hyun-Woo, Park, Sang-Min
• Primary Examiner(s): Walke, Amanda C
• Application Number:
  US15/047,659
• Publication Number:
  US 20160358778A1
• Time in Patent Office: 585 Days
• Field of Search: 4302701, 4302711, 4302731, 430322, 430325, 430329, 430330, 430331
• CPC Class Codes: G03F 7/091 characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
• CPC Class Codes: G03F 7/11 having cover layers or intermediate layers, e.g. subbing layers G03F7/091 - G03F7/093, B41N3/03 take precedence
• CPC Class Codes: G03F 7/20 Exposure; Apparatus therefor photographic printing apparatus for making copies G03B27/00
• CPC Class Codes: G03F 7/32 Liquid compositions therefor, e.g. developers
• CPC Class Codes: H01L 21/0276 using an anti-reflective coating anti-reflective coating for lithography in general G03F7/09
• CPC Class Codes: H01L 21/0335 characterised by their behaviour during the process, e.g. soluble masks, redeposited masks
• CPC Class Codes: H01L 21/0337 characterised by the process involved to create the mask, e.g. lift-off masks, sidewalls, or to modify the mask, e.g. pre-treatment, post-treatment
• CPC Class Codes: H01L 21/0338 Process specially adapted to improve the resolution of the mask
• CPC Class Codes: H01L 21/3081 characterised by their composition, e.g. multilayer masks, materials
• CPC Class Codes: H01L 21/31144 using masks
• CPC Class Codes: H01L 21/32139 using masks
• CPC Class Codes: H01L 21/76802 by forming openings in dielectrics
• CPC Class Codes: H10B 12/053 the transistor being at least partially in a trench in the substrate vertical transistor in combination with a capacitor formed in a substrate trench H10B12/0383

Abstract

In a method of forming a pattern, a lower coating layer and a photoresist layer are sequentially formed on an object layer. An exposure process may be performed such that the photoresist layer is divided into an exposed portion and a non-exposed portion. A portion of the lower coating layer overlapping or contacting the exposed portion is at least partially transformed into a polarity conversion portion that has a polarity substantially identical to that of the exposed portion. The non-exposed portion of the photoresist layer is selectively removed.

Claims

1. A method of forming a pattern, the method comprising:

sequentially forming a lower coating layer and a photoresist layer on an object layer that is on a substrate, the photoresist layer being formed of a photoresist composition including a negative-tone photoresist polymer and a photoacid generator;

performing an exposure process such that the photoresist layer is divided into an exposed portion and a non-exposed portion;

transforming a portion of the lower coating layer overlapping or contacting the exposed portion at least partially into a polarity conversion portion that has a polarity substantially identical to that of the exposed portion such that the polarity conversion portion is formed by diffusing acid generated from the photoacid generator into the portion of the lower coating layer under the exposed portion; and

selectively removing the non-exposed portion of the photoresist layer.

2. The method of claim 1, wherein the lower coating layer and the photoresist layer are initially hydrophilic.

3. The method of claim 2, wherein:

performing the exposure process includes converting the polarity of the exposed portion to be hydrophobic by the acid generated from the photoacid generator.

4. The method of claim 1, wherein the lower coating layer includes a polymer having a repeating unit to which a polarity conversion group is combined.

5. The method of claim 4, wherein transforming the portion of the lower coating layer includes inducing a dehydration reaction in the polarity conversion group by the acid diffused into the portion of the lower coating layer.

6. The method of claim 5, wherein:

the polarity conversion group includes a tertiary alcohol group, and

a hydroxyl group included in the tertiary alcohol group is replaced with a double bond.

7. The method of claim 6, wherein the polarity conversion group includes an alicyclic hydrocarbon group or an aromatic hydrocarbon group which is combined with the tertiary alcohol group.

8. The method of claim 4, wherein the polarity conversion group is represented by one of the following formulae:

9. The method of claim 1, further comprising partially removing the object layer using the exposed portion as an etching mask.

10. A method of forming a pattern, the method comprising:

forming a lower coating layer on an object layer that is on a substrate, the lower coating layer including a polymer to which a polarity conversion group is combined;

forming a photoresist layer on the lower coating layer;

performing an exposure process on the photoresist layer such that the photoresist layer is divided into an exposed portion having a converted polarity and a non-exposed portion retaining a polarity thereof;

inducing a dehydration reaction in the polarity conversion group included in a portion of the lower coating layer under the exposed portion; and

removing the non-exposed portion of the photoresist layer,

wherein the polarity conversion group is represented by one of the following formulae;

11. The method of claim 10, wherein the lower coating layer includes a bottom anti-reflection coating polymer and a polarity conversion polymer having a repeating unit to which the polarity conversion group is combined.

12. The method of claim 11, wherein the bottom anti-reflection coating polymer is represented by Chemical Formula 7 or Chemical Formula 8:

13. The method of claim 10, wherein the lower coating layer includes a bottom anti-reflection coating polymer in which the polarity conversion group is incorporated.

14. The method of claim 10, wherein:

inducing the dehydration reaction includes forming a polarity conversion portion at the portion of the lower coating layer under the exposed portion, and

the polarity conversion portion and the exposed portion are hydrophobic.

15. The method of claim 10, wherein the exposed portion includes a double bond created by removal of a hydroxyl group through a dehydration reaction.

16. A method of forming a pattern, the method comprising:

forming an isolation layer on a substrate such that an active pattern is defined by the isolation layer;

sequentially forming a lower coating layer and a photoresist layer on the active pattern and the isolation layer, the photoresist layer being formed of a photoresist composition including a negative-tone photoresist polymer and a photoacid generator;

performing an exposure process such that the photoresist layer is divided into an exposed portion and a non-exposed portion;

transforming a portion of the lower coating layer overlapping or contacting the exposed portion at least partially into a polarity conversion portion that has a polarity substantially identical to that of the exposed portion such that the polarity conversion portion is formed by diffusing acid generated from the photoacid generator into the portion of the lower coating layer under the exposed portion;

selectively removing the non-exposed portion of the photoresist layer; and

partially removing the active pattern using the exposed portion as an etching mask.

17. The method of claim 16, wherein the lower coating layer includes a polymer represented by Chemical Formula 3:

18. The method of claim 16, wherein:

the lower coating layer includes a polymer having a repeating unit to which a polarity conversion group is combined, and

the polarity conversion group is represented by one of the following formulae;