Semiconductor structure and manufacturing method thereof
First Claim
1. A manufacturing method of a semiconductor structure, the manufacturing method comprising:
- providing a wafer structure having a silicon substrate, an electrical pad, and a protection layer, wherein the silicon substrate has a first surface and a second surface opposite to the first surface, the protection layer is located on the first surface, and the electrical pad is located in the protection layer;
etching the silicon substrate to form a cutting trench and a through hole that is aligned with the electrical pad, wherein the silicon substrate has a first portion and a second portion surrounding the through hole, and the second portion is between the cutting trench and the through hole;
forming a photoresist layer on the second surface of the first portion of the silicon substrate;
etching the first and second portions of the silicon substrate, such that the first portion forms a step structure, the second portion forms a tooth structure, and the through hole forms a concave region surrounded by the step structure and the tooth structure, wherein the step structure has a first oblique surface, a third surface, and a second oblique surface facing the concave region and connected in sequence; and
removing the photoresist layer.
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Accused Products
Abstract
A semiconductor structure includes a silicon substrate, a protection layer, an electrical pad, an isolation layer, a redistribution layer, a conductive layer, a passivation layer, and a conductive structure. The silicon substrate has a concave region, a step structure, a tooth structure, a first surface, and a second surface opposite to the first surface. The step structure and the tooth structure surround the concave region. The step structure has a first oblique surface, a third surface, and a second oblique surface facing the concave region and connected in sequence. The protection layer is located on the first surface of the silicon substrate. The electrical pad is located in the protection layer and exposed through the concave region. The isolation layer is located on the first and second oblique surfaces, the second and third surfaces of the step structure, and the tooth structure.
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Citations
9 Claims
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1. A manufacturing method of a semiconductor structure, the manufacturing method comprising:
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providing a wafer structure having a silicon substrate, an electrical pad, and a protection layer, wherein the silicon substrate has a first surface and a second surface opposite to the first surface, the protection layer is located on the first surface, and the electrical pad is located in the protection layer; etching the silicon substrate to form a cutting trench and a through hole that is aligned with the electrical pad, wherein the silicon substrate has a first portion and a second portion surrounding the through hole, and the second portion is between the cutting trench and the through hole; forming a photoresist layer on the second surface of the first portion of the silicon substrate; etching the first and second portions of the silicon substrate, such that the first portion forms a step structure, the second portion forms a tooth structure, and the through hole forms a concave region surrounded by the step structure and the tooth structure, wherein the step structure has a first oblique surface, a third surface, and a second oblique surface facing the concave region and connected in sequence; and removing the photoresist layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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Specification