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Semiconductor structure and manufacturing method thereof

  • US 9,780,251 B2
  • Filed: 03/06/2017
  • Issued: 10/03/2017
  • Est. Priority Date: 11/07/2013
  • Status: Active Grant
First Claim
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1. A manufacturing method of a semiconductor structure, the manufacturing method comprising:

  • providing a wafer structure having a silicon substrate, an electrical pad, and a protection layer, wherein the silicon substrate has a first surface and a second surface opposite to the first surface, the protection layer is located on the first surface, and the electrical pad is located in the protection layer;

    etching the silicon substrate to form a cutting trench and a through hole that is aligned with the electrical pad, wherein the silicon substrate has a first portion and a second portion surrounding the through hole, and the second portion is between the cutting trench and the through hole;

    forming a photoresist layer on the second surface of the first portion of the silicon substrate;

    etching the first and second portions of the silicon substrate, such that the first portion forms a step structure, the second portion forms a tooth structure, and the through hole forms a concave region surrounded by the step structure and the tooth structure, wherein the step structure has a first oblique surface, a third surface, and a second oblique surface facing the concave region and connected in sequence; and

    removing the photoresist layer.

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